| Deformation reduction at the main chamber E Lenz, AR Ellingboe, F Hao US Patent 6,949,204, 2005 | 373 | 2005 |
| Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices PC Boyle, AR Ellingboe, MM Turner Journal of Physics D: Applied Physics 37 (5), 697, 2004 | 293 | 2004 |
| Semiconductor processing using an efficiently coupled gas source C Sorensen, A Ellingboe, Q Shang, W Blonigan, J White US Patent App. 10/231,867, 2003 | 239 | 2003 |
| Capacitive, inductive and helicon‐wave modes of operation of a helicon plasma source AR Ellingboe, RW Boswell Physics of Plasmas 3 (7), 2797-2804, 1996 | 232 | 1996 |
| Plasma production from helicon waves AW Degeling, CO Jung, RW Boswell, AR Ellingboe Physics of Plasmas 3 (7), 2788-2796, 1996 | 215 | 1996 |
| Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas T Gans, J Schulze, D O’connell, U Czarnetzki, R Faulkner, AR Ellingboe, ... Applied physics letters 89 (26), 2006 | 195 | 2006 |
| Electrostatic modelling of dual frequency rf plasma discharges PC Boyle, AR Ellingboe, MM Turner Plasma Sources Science and Technology 13 (3), 493, 2004 | 164 | 2004 |
| Analytical model of a dual frequency capacitive sheath J Robiche, PC Boyle, MM Turner, AR Ellingboe Journal of Physics D: Applied Physics 36 (15), 1810, 2003 | 154 | 2003 |
| Space and phase resolved plasma parameters in an industrial dual-frequency capacitively coupled radio-frequency discharge J Schulze, T Gans, D O'Connell, U Czarnetzki, AR Ellingboe, MM Turner Journal of Physics D: Applied Physics 40 (22), 7008, 2007 | 146 | 2007 |
| Electron beam pulses produced by helicon‐wave excitation AR Ellingboe, RW Boswell, JP Booth, N Sadeghi Physics of Plasmas 2 (6), 1807-1809, 1995 | 133 | 1995 |
| Method and apparatus for producing plasma L Oksuz, AR Ellingboe US Patent 7,589,470, 2009 | 102 | 2009 |
| Plasma processor with electrode simultaneously responsive to plural frequencies V Vahedi, P Loewenhardt, A Ellingboe, A Kuthi, A Fischer US Patent 6,841,943, 2005 | 101 | 2005 |
| Electrode for plasma processes and method for manufacture and use thereof JS Hubacek, AR Ellingboe, D Benzing US Patent 8,845,855, 2014 | 95* | 2014 |
| Hot-electron production and wave structure in a helicon plasma source AW Molvik, AR Ellingboe, TD Rognlien Physical Review Letters 79 (2), 233, 1997 | 90 | 1997 |
| Effect of radio-frequency power levels on electron density in a confined two-frequency capacitively-coupled plasma processing tool SK Karkari, AR Ellingboe Applied physics letters 88 (10), 2006 | 80 | 2006 |
| Comparison of measurements and particle-in-cell simulations of ion energy distribution functions in a capacitively coupled radio-frequency discharge D O’Connell, R Zorat, AR Ellingboe, MM Turner Physics of Plasmas 14 (10), 2007 | 72 | 2007 |
| A floating hairpin resonance probe technique for measuring time-resolved electron density in pulse discharge SK Karkari, C Gaman, AR Ellingboe, I Swindells, JW Bradley Measurement Science and Technology 18 (8), 2649, 2007 | 72 | 2007 |
| Wafer area pressure control for plasma confinement T Han, DW Benzing, AR Ellingboe US Patent 6,823,815, 2004 | 72 | 2004 |
| Effect of driving frequency on the electron energy distribution function and electron-sheath interaction in a low pressure capacitively coupled plasma S Sharma, N Sirse, PK Kaw, MM Turner, AR Ellingboe Physics of Plasmas 23 (11), 2016 | 69 | 2016 |
| Plasma cleaned Si analyzed in situ by x‐ray photoelectron spectroscopy, secondary ion mass spectrometry, and actinometry M Delfino, S Salimian, D Hodul, A Ellingboe, W Tsai Journal of applied physics 71 (2), 1001-1009, 1992 | 62 | 1992 |
Shantanu KarkariInstitute for Plasma Research (IPR)כתובת אימייל מאומתת בדומיין ipr.res.in