| A Fortran computer code package for the evaluation of gas-phase multicomponent transport properties RJ Kee, G Dixon-Lewis, J Warnatz, ME Coltrin, JA Miller Sandia National Laboratories Report SAND86-8246 13, 80401-1887, 1986 | 1711 | 1986 |
| Ultrawide‐bandgap semiconductors: research opportunities and challenges JY Tsao, S Chowdhury, MA Hollis, D Jena, NM Johnson, KA Jones, ... Advanced Electronic Materials 4 (1), 1600501, 2018 | 1416 | 2018 |
| Chemically reacting flow: theory and practice RJ Kee, ME Coltrin, P Glarborg John Wiley & Sons, 2005 | 1257 | 2005 |
| A mathematical model of the coupled fluid mechanics and chemical kinetics in a chemical vapor deposition reactor ME Coltrin, RJ Kee, JA Miller Journal of the Electrochemical Society 131 (2), 425, 1984 | 532 | 1984 |
| Research challenges to ultra‐efficient inorganic solid‐state lighting JM Phillips, ME Coltrin, MH Crawford, AJ Fischer, MR Krames, ... Laser & Photonics Reviews 1 (4), 307-333, 2007 | 478 | 2007 |
| CHEMKIN collection, release 3.6, reaction design RJ Kee, FM Rupley, JA Miller, ME Coltrin, JF Grcar, E Meeks, HK Moffat, ... Inc., San Diego, CA 20 (0), 0, 2000 | 450 | 2000 |
| CHEMKIN Release 4.1 RJ Kee, FM Rupley, JA Miller, ME Coltrin, JF Grcar, E Meeks, HK Moffat, ... Reaction Design, San Diego, CA 115, 2006 | 419 | 2006 |
| Toward smart and ultra‐efficient solid‐state lighting JY Tsao, MH Crawford, ME Coltrin, AJ Fischer, DD Koleske, ... Advanced Optical Materials 2 (9), 809-836, 2014 | 413 | 2014 |
| A mathematical model of silicon chemical vapor deposition: further refinements and the effects of thermal diffusion ME Coltrin, RJ Kee, JA Miller Journal of The Electrochemical Society 133 (6), 1206, 1986 | 401 | 1986 |
| A new tunneling path for reactions such as H+ H2→ H2+ H RA Marcus, ME Coltrin The Journal of Chemical Physics 67 (6), 2609-2613, 1977 | 373 | 1977 |
| A mathematical model of the fluid mechanics and gas‐phase chemistry in a rotating disk chemical vapor deposition reactor ME Coltrin, RJ Kee, GH Evans Journal of the Electrochemical Society 136 (3), 819, 1989 | 372 | 1989 |
| Surface chemkin-iii: A fortran package for analyzing heterogeneous chemical kinetics at a solid-surface-gas-phase interface ME Coltrin, RJ Kee, FM Rupley, E Meeks Sandia National Lab.(SNL-NM), Albuquerque, NM (United States), 1996 | 282 | 1996 |
| Solid-state lighting: an energy-economics perspective JY Tsao, HD Saunders, JR Creighton, ME Coltrin, JA Simmons Journal of Physics D: Applied Physics 43 (35), 354001, 2010 | 252 | 2010 |
| A model of elementary chemistry and fluid mechanics in the combustion of hydrogen on platinum surfaces J Warnatz, MD Allendorf, RJ Kee, ME Coltrin Combustion and Flame 96 (4), 393-406, 1994 | 248 | 1994 |
| Reactive sticking coefficients for silane and disilane on polycrystalline silicon RJ Buss, P Ho, WG Breiland, ME Coltrin Journal of Applied Physics 63 (8), 2808-2819, 1988 | 233 | 1988 |
| Modeling the thermal DENOx process in flow reactors. Surface effects and Nitrous Oxide formation P Glarborg, K Dam‐Johansen, JA Miller, RJ Kee, ME Coltrin International Journal of Chemical Kinetics 26 (4), 421-436, 1994 | 232 | 1994 |
| A theoretical study of the heats of formation of silicon hydride (SiHn), silicon chloride (SiCln), and silicon hydride chloride (SiHnClm) compounds P Ho, ME Coltrin, JS Binkley, CF Melius The Journal of Physical Chemistry 89 (21), 4647-4654, 1985 | 231 | 1985 |
| Surface chemkin: A general formalism and software for analyzing heterogeneous chemical kinetics at a gas‐surface interface ME Coltrin, RJ Kee, FM Rupley International Journal of Chemical Kinetics 23 (12), 1111-1128, 1991 | 214 | 1991 |
| Analysis of diamond growth in subatmospheric dc plasma‐gun reactors ME Coltrin, DS Dandy Journal of Applied Physics 74 (9), 5803-5820, 1993 | 206 | 1993 |
| Solid-state lighting: an integrated human factors, technology, and economic perspective JY Tsao, ME Coltrin, MH Crawford, JA Simmons Proceedings of the IEEE 98 (7), 1162-1179, 2010 | 202 | 2010 |
Robert KeeProfessor, Mechanical Engineering, Colorado School of Mines確認したメール アドレス: mines.edu