フォロー
Fan Gao
Fan Gao
確認したメール アドレス: vt.edu
タイトル
引用先
引用先
All electrospray printed perovskite solar cells
Y Jiang, C Wu, L Li, K Wang, Z Tao, F Gao, W Cheng, J Cheng, XY Zhao, ...
Nano Energy 53, 440-448, 2018
632018
Weakly charged droplets fundamentally change impact dynamics on flat surfaces
F Gao, H Yi, L Qi, R Qiao, W Deng
Soft Matter 15 (28), 5548-5553, 2019
242019
Combined susceptor, support, and lift system
P Gao, W Wang, X Lin, H Ye, IH Chao, S Luan, A Demos, GAO Fan
US Patent App. 29/760,951, 2024
12024
The impact dynamics of weakly charged droplets
F Gao
Virginia Tech, 2019
12019
Liquid precursor containers, liquid precursor systems and semiconductor processing systems having liquid precursor containers, and methods of depositing material layers using …
K Mahadevan, GAO Fan, P Gao, X Lin
US Patent App. 18/660,652, 2024
2024
Liquid precursor containers, liquid precursor systems and semiconductor processing systems having liquid precursor containers, and methods of depositing material layers using …
GAO Fan, K Mahadevan, P Gao, X Lin, J Lyu
US Patent App. 18/660,759, 2024
2024
Systems and methods for controlling pressure in substrate processing systems
GAO Fan, P Gao, X Lin, A Murali, G Deye, F Aryeetey, A Kajbafvala, ...
US Patent App. 18/518,393, 2024
2024
Chamber Arrangements with Laser Sources, Semiconductor Processing Systems, and Material Layer Deposition Methods
AD Fan Gao, Peipei Gao, Wentao Wang, Kai Zhou, Kishor Patil, Han Ye, Xing Lin
US Patent US20240112930A1, 2024
2024
Method, assembly and system for gas injection and control
XL Peipei Gao, Wentao Wang, Han Ye, Kai Zhou, Fan Gao
US Patent US20240071804A1, 2024
2024
Systems and methods for controlling accretion in semiconductor processing system exhaust arrangements
G Deye, C Miskin, GAO Fan, P Gao
US Patent App. 18/187,468, 2023
2023
Dual pyrometer systems for substrate temperature control during film deposition
H Ye, K Zhou, P Gao, W Wang, K Patil, GAO Fan, K Mahadevan, X Lin, ...
US Patent App. 17/697,145, 2022
2022
High performance susceptor apparatus
FGAO Peipei Gao, Wentao Wang, Xing Lin, Han Ye, Ion Hong Chao, Siyao Luan ...
US Patent US 2022/0181193 A1, 2022
2022
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