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Anil G. Khairnar
Anil G. Khairnar
K.R.T. Arts, B.H. Commerce and A.M. Science College, Nashik and North Maharashtra University
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Structural and electrical characteristics of RF-sputtered HfO< sub> 2</sub> high-k based MOS capacitors
PM Tirmali, AG Khairnar, BN Joshi, AM Mahajan
Solid-State Electronics 62 (1), 44-47, 2011
932011
Effect of post-deposition annealing temperature on RF-Sputtered HfO< sub> 2</sub> thin film for advanced CMOS technology
AG Khairnar, AM Mahajan
Solid State Sciences 15, 24-28, 2012
86*2012
Sol–gel deposited ceria thin films as gate dielectric for CMOS technology
AG Khairnar, AM Mahajan
Bulletin of Materials Science 36 (2), 259-263, 2013
372013
Electrical properties of MOS capacitors formed by PEALD grown Al2O3 on silicon
AM Mahajan, AG Khairnar, BJ Thibeault
Semiconductors Физика и техника полупроводников 48 (4), 2014
332014
High Dielectric Constant ZrO2 Films by Atomic Layer Deposition Technique on Germanium Substrates
AM Mahajan, AG Khairnar, BJ Thibeault
Silicon 8 (3), 345-350, 2016
242016
HfO2 gate dielectric on Ge (1 1 1) with ultrathin nitride interfacial layer formed by rapid thermal NH3 treatment
KS Agrawal, VS Patil, AG Khairnar, AM Mahajan
Applied Surface Science 364, 747-751, 2016
232016
Structural and electrical properties of ultra-thin high-k ZrO2 film on nitride passivated Ge (100) prepared by PEALD
VS Patil, KS Agrawal, AG Khairnar, BJ Thibeault, AM Mahajan
Materials Science in Semiconductor Processing 56, 277-281, 2016
202016
Preparation of rare earth CeO2 thin films using metal organic decomposition method for metal-oxide–semiconductor capacitors
KS Agrawal, VS Patil, AG Khairnar, AM Mahajan
Journal of Materials Science: Materials in Electronics 28, 12503-12508, 2017
142017
Electrical properties of HfO2 high-k thin-film MOS capacitors for advanced CMOS technology
AG Khairnar, LS Patil, RS Salunke, AM Mahajan
Indian Journal of Physics 89 (11), 1177-1181, 2015
92015
Synthesis of cerium dioxide high-k thin films as a gate dielectric in MOS capacitor
AG Khairnar, YS Mhaisagar, AM Mahajan
Сумський державний університет, 2013
72013
Pt-Ti/ALD-Al 2 O 3/p-Si MOS Capacitors for Future ULSI Technology
AM Mahajan, AG Khairnar, BJ Thibeault
J. Nano- Electron. Phys. 3 (1), 647-650, 2011
52011
Deposition and characterization of high k dielectric thin films for mos capacitors
AG Khairnar
North Maharashtra University Jalgaon, 0
5*
Interfacial and electrical properties of Al2O3/HfO2 bilayer deposited by atomic layer deposition on GeON passivated germanium surface
VS Patil, KS Agrawal, AG Khairnar, BJ Thibeault, AM Mahajan
Materials Research Bulletin 87, 208-213, 2017
42017
accepted in Semiconductors
AM Mahajan, AG Khairnar, BJ Thibeault
Springer) July, 2013
42013
Enhancement in mechanical properties of silica low-k thin films using wet chemical technique
YS Mhaisagar, AS Gaikad, AG Khairnar, AM Mahajan
Indian Journal of Pure & Applied Physics (IJPAP) 54 (7), 439-442, 2016
32016
Investigation of Current Conduction Mechanism in HfO2 Thin Film on Silicon Substrate
AG Khairnar, KS Agrawal, VS Patil, AM Mahajan
Physics of Semiconductor Devices: 17th International Workshop on the Physics …, 2014
22014
PEALD grown high-k ZrO2 thin films on SiC group IV compound semiconductor
AG Khairnar, VS Patil, KS Agrawal, RS Salunke, AM Mahajan
Semiconductors 51, 131-133, 2017
12017
Capacitance-Voltage Measurement of SiO2/GeOxNy Gate Stack on Surface Passivated Germanium
AG Khairnar, VS Patil, AM Mahajan
Physics of Semiconductor Devices: 17th International Workshop on the Physics …, 2014
12014
Surface Passivation of Germanium Using NH3 Ambient in RTP for High Mobility MOS Structure
AG Khairnar, YS Mhaisagar, AM Mahajan
J. Nano- Electron. Phys. 5 (2), 02009-1-02009-3, 2013
12013
Development of Low Cost and Efficient Automated Spin Coating System for Effective Deposition of Thin Films
US Sonawane, AG Khairnar, PA Pandit
Journal homepage: www. ijrpr. com ISSN 2582, 7421, 0
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