A polynomial time triple patterning algorithm for cell based row-structure layout H Tian, H Zhang, Q Ma, Z Xiao, MDF Wong Proceedings of the International Conference on Computer-Aided Design, 57-64, 2012 | 81 | 2012 |
Triple patterning aware routing and its comparison with double patterning aware routing in 14nm technology Q Ma, H Zhang, MDF Wong Proceedings of the 49th Annual Design Automation Conference, 591-596, 2012 | 73 | 2012 |
Block copolymer directed self-assembly (DSA) aware contact layer optimization for 10 nm 1D standard cell library Y Du, D Guo, MDF Wong, H Yi, HSP Wong, H Zhang, Q Ma 2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 186-193, 2013 | 64 | 2013 |
Hybrid lithography optimization with e-beam and immersion processes for 16nm 1D gridded design Y Du, H Zhang, MDF Wong, KY Chao 17th Asia and South Pacific Design Automation Conference, 707-712, 2012 | 57 | 2012 |
Thermal-driven analog placement considering device matching PH Lin, H Zhang, MDF Wong, YW Chang Proceedings of the 46th Annual Design Automation Conference, 593-598, 2009 | 55 | 2009 |
Self-aligned double patterning decomposition for overlay minimization and hot spot detection H Zhang, Y Du, MDF Wong, R Topaloglu Proceedings of the 48th Design Automation Conference, 71-76, 2011 | 45 | 2011 |
DSA template mask determination and cut redistribution for advanced 1D gridded design Z Xiao, Y Du, MDF Wong, H Zhang Photomask Technology 2013 8880, 155-162, 2013 | 40 | 2013 |
Directed self-assembly (DSA) template pattern verification Z Xiao, Y Du, H Tian, MDF Wong, H Yi, HSP Wong, H Zhang Proceedings of the 51st Annual Design Automation Conference, 1-6, 2014 | 39 | 2014 |
Constrained pattern assignment for standard cell based triple patterning lithography H Tian, Y Du, H Zhang, Z Xiao, MDF Wong 2013 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 178-185, 2013 | 33 | 2013 |
Layout small-angle rotation and shift for EUV defect mitigation H Zhang, Y Du, MDF Wong, Y Deng, P Mangat Proceedings of the International Conference on Computer-Aided Design, 43-49, 2012 | 33 | 2012 |
Contact layer decomposition to enable DSA with multi-patterning technique for standard cell based layout Z Xiao, CX Lin, MDF Wong, H Zhang 2016 21st Asia and South Pacific Design Automation Conference (ASP-DAC), 95-102, 2016 | 31 | 2016 |
A polynomial time exact algorithm for self-aligned double patterning layout decomposition Z Xiao, Y Du, H Zhang, MDF Wong Proceedings of the 2012 ACM international symposium on International …, 2012 | 30 | 2012 |
On process-aware 1-D standard cell design H Zhang, MDF Wong, KY Chao 2010 15th Asia and South Pacific Design Automation Conference (ASP-DAC), 838-842, 2010 | 30 | 2010 |
A polynomial time exact algorithm for overlay-resistant self-aligned double patterning (SADP) layout decomposition Z Xiao, Y Du, H Zhang, MDF Wong IEEE Transactions on Computer-Aided Design of Integrated Circuits and …, 2013 | 28 | 2013 |
Mask cost reduction with circuit performance consideration for self-aligned double patterning H Zhang, Y Du, MDF Wong, KY Chao 16th Asia and South Pacific Design Automation Conference (ASP-DAC 2011), 787-792, 2011 | 27 | 2011 |
Triple patterning aware detailed placement with constrained pattern assignment H Tian, Y Du, H Zhang, Z Xiao, MDF Wong 2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD), 116-123, 2014 | 24 | 2014 |
Characterization and decomposition of self-aligned quadruple patterning friendly layout H Zhang, Y Du, MDF Wong, RO Topaloglu Optical Microlithography XXV 8326, 146-156, 2012 | 24 | 2012 |
Efficient pattern relocation for EUV blank defect mitigation H Zhang, Y Du, MDF Wong, RO Topalaglu 17th Asia and South Pacific Design Automation Conference, 719-724, 2012 | 24 | 2012 |
Effective decomposition algorithm for self-aligned double patterning lithography H Zhang, Y Du, MDF Wong, R Topaloglu, W Conley Optical Microlithography XXIV 7973, 176-186, 2011 | 23 | 2011 |
Edge-based full chip mask topography modeling Q Yan, H Zhang, E Croffie, L Zhang, Y Fan, P Brooker, Q Ren US Patent 8,918,743, 2014 | 22 | 2014 |