| Atomic layer deposition for graphene device integration RHJ Vervuurt, WMM Kessels, AA Bol Advanced Materials Interfaces 4 (18), 1700232, 2017 | 124 | 2017 |
| Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation AJM Mackus, MJ Weber, NFW Thissen, D Garcia-Alonso, RHJ Vervuurt, ... Nanotechnology 27 (3), 034001, 2015 | 117 | 2015 |
| High‐efficiency InP‐based photocathode for hydrogen production by interface energetics design and photon management L Gao, Y Cui, RHJ Vervuurt, D van Dam, RPJ van Veldhoven, ... Advanced functional materials 26 (5), 679-686, 2016 | 96 | 2016 |
| Uniform Atomic Layer Deposition of Al2O3 on Graphene by Reversible Hydrogen Plasma Functionalization RHJ Vervuurt, B Karasulu, MA Verheijen, WEMM Kessels, AA Bol Chemistry of Materials 29 (5), 2090-2100, 2017 | 87 | 2017 |
| Stability of CoPx Electrocatalysts in Continuous and Interrupted Acidic Electrolysis of Water A Goryachev, L Gao, Y Zhang, RY Rohling, RHJ Vervuurt, AA Bol, ... ChemElectroChem 5 (8), 1230-1239, 2018 | 50 | 2018 |
| Continuous and ultrathin platinum films on graphene using atomic layer deposition: a combined computational and experimental study B Karasulu, RHJ Vervuurt, WMM Kessels, AA Bol Nanoscale 8 (47), 19829-19845, 2016 | 50 | 2016 |
| Area-selective atomic layer deposition of platinum using photosensitive polyimide RHJ Vervuurt, A Sharma, Y Jiao, WEMM Kessels, AA Bol Nanotechnology 27 (40), 405302, 2016 | 49 | 2016 |
| In Situ Monitoring of Surface Reactions during Atomic Layer Etching of Silicon Nitride Using Hydrogen Plasma and Fluorine Radicals K Nakane, RHJ Vervuurt, T Tsutsumi, N Kobayashi, M Hori ACS applied materials & interfaces 11 (40), 37263-37269, 2019 | 36 | 2019 |
| In-situ Raman spectroscopy to elucidate the influence of adsorption in graphene electrochemistry WTE van den Beld, M Odijk, RHJ Vervuurt, JW Weber, AA Bol, ... Scientific reports 7 (1), 45080, 2017 | 31 | 2017 |
| Graphene devices with bottom-up contacts by area-selective atomic layer deposition NFW Thissen, RHJ Vervuurt, AJM Mackus, JJL Mulders, JW Weber, ... 2D Materials 4 (2), 025046, 2017 | 30 | 2017 |
| Mechanistic studies of hydrogen transport through Mo2C/V composite membranes CA Wolden, K Adeyemo, RHJ Vervuurt, M Ostwal, JD Way Journal of membrane science 427, 150-154, 2013 | 29 | 2013 |
| The effect of residual gas scattering on Ga ion beam patterning of graphene NFW Thissen, RHJ Vervuurt, JJL Mulders, JW Weber, WMM Kessels, ... Applied Physics Letters 107 (21), 2015 | 23 | 2015 |
| Broadband optical response of graphene measured by terahertz time-domain spectroscopy and FTIR spectroscopy K Arts, R Vervuurt, A Bhattacharya, J Gómez Rivas, JW Oosterbeek, ... Journal of Applied Physics 124 (7), 2018 | 15 | 2018 |
| Pt–graphene contacts fabricated by plasma functionalization and atomic layer deposition RHJ Vervuurt, B Karasulu, NFW Thissen, Y Jiao, JW Weber, ... Advanced Materials Interfaces 5 (13), 1800268, 2018 | 14 | 2018 |
| Reaction Mechanism and Selectivity Control of Si Compound ALE Based on Plasma Modification and F-Radical Exposure RHJ Vervuurt, B Mukherjee, K Nakane, T Tsutsumi, M Hori, N Kobayashi Langmuir 37 (43), 12663-12672, 2021 | 8 | 2021 |
| Diffraction enhanced transparency in a hybrid gold-graphene THz metasurface NJJ van Hoof, SET ter Huurne, RHJ Vervuurt, AA Bol, A Halpin, ... APL Photonics 4 (3), 2019 | 8 | 2019 |
| Bottom-up meets top-down: tailored raspberry-like Fe 3 O 4–Pt nanocrystal superlattices F Qiu, RHJ Vervuurt, MA Verheijen, EW Zaia, EB Creel, Y Kim, JJ Urban, ... Nanoscale 10 (13), 5859-5863, 2018 | 5 | 2018 |
| Methods and systems for filling a gap E Färm, S Iwashita, C Dezelah, JW Maes, T Blanquart, RHJ Vervuurt, ... US Patent App. 17/680,711, 2022 | 4 | 2022 |
| Photelectrodes: High-Efficiency InP-Based Photocathode for Hydrogen Production by Interface Energetics Design and Photon Management (Adv. Funct. Mater. 5/2016). L Gao, Y Cui, RHJ Vervuurt, D van Dam, RPJ van Veldhoven, ... Advanced Functional Materials 26 (5), 2016 | 4 | 2016 |
| Methods and apparatuses for flowable gap-fill S Yoshimoto, T Onuma, M Igarashi, Y Mori, H Fukuda, RHJ Vervuurt, ... US Patent 12,129,546, 2024 | 2 | 2024 |
Ageeth A. BolUniversity of Michiganumich.edu의 이메일 확인됨
