| Leveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes N Rana, Y Zhang, T Kagalwala, T Bailey Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (4), 041415-041415, 2014 | 31 | 2014 |
| Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes D Dixit, N Keller, Y Lifshitz, T Kagalwala, A Elia, V Todi, J Fronheiser, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (3), 034001-034001, 2018 | 25 | 2018 |
| Advanced applications of scatterometry based optical metrology D Dixit, N Keller, T Kagalwala, F Recchia, Y Lifshitz, A Elia, V Todi, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 15 | 2017 |
| Scatterometry-based metrology for SAQP pitch walking using virtual reference T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ... SPIE Advanced Lithography, 2016 | 15 | 2016 |
| Implementation of machine learning for high-volume manufacturing metrology challenges P Timoney, T Kagalwala, E Reis, H Lazkani, J Hurley, H Liu, C Kang, ... Metrology, Inspection, and Process Control for Microlithography XXXII 10585 …, 2018 | 13 | 2018 |
| Measurement system and method for measuring in thin films C Bozdog, A Vaid, S Mahendrakar, M Hossain, T Kagalwala US Patent 10,030,971, 2018 | 12 | 2018 |
| Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 044004-044004, 2016 | 10 | 2016 |
| A combined gas cluster ion beam (GCIB) and chemical-mechanical polish (CMP) planarization scheme for tungsten replacement metal gate (W-RMG) WT Tseng, J Long, K Mohan, T Kagalwala, C Wu, C Truong ECS Journal of Solid State Science and Technology 5 (7), P404, 2016 | 9 | 2016 |
| Characterization of overlay and tilt in advanced technology nodes using scatterometry D Dixit, S Dey, T Kagalwala, P Timoney, Y Ramnath, A Elia, N Paranjape, ... 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2019 | 7 | 2019 |
| Integrated metrology's role in Gas Cluster Ion Beam etch T Kagalwala, R Dasaka, M Aquilino, L Economikos, A Cepler, C Kang, ... 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2015 | 7 | 2015 |
| Self-referenced and self-calibrated MoiréOVL target design and applications CW Wong, N Rathi, T Kagalwala, K Gutjahr, P Snow, T Joung, T Vuong, ... Metrology, Inspection, and Process Control for Semiconductor Manufacturing …, 2021 | 6 | 2021 |
| High throughput and dense sampling metrology for process control L Sun, T Kohyama, K Takeda, H Nozawa, Y Asakawa, T Kagalwala, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 5 | 2017 |
| System and method for estimating spatial characteristics of integrated circuits TE Kagalwala, N Rana, Y Zhang US Patent 9,262,819, 2016 | 4 | 2016 |
| Continuous size-based separation of Microparticles in straight channels T Kagalwala, J Zhou, I Papautsky University of Cincinnati, 2011 | 4 | 2011 |
| Measuring complex structures in semiconductor fabrication T Kagalwala, S Mahendrakar, M Sendelbach, A Vaid US Patent 10,664,638, 2020 | 3 | 2020 |
| SAQP pitch walk metrology using single target metrology F Fang, P Herrera, T Kagalwala, J Camp, A Vaid, S Pandev, F Zach Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 3 | 2017 |
| Complex metrology on 3D structures using multi-channel OCD T Kagalwala, S Mahendrakar, A Vaid, PK Isbester, A Cepler, C Kang, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 3 | 2017 |
| Improving Metrology Fleet KPIs for Advanced Foundry Manufacturing T Kagalwala, P Timoney, R Fiege, J Emans, T Hughes, A Elia, A Vaid, ... 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2019 | 2 | 2019 |
| Optical metrology strategies for inline 7nm CMOS logic product control M Lenahan, S Mahendrakar, A Vaid, T Kagalwala, K Venkataraman, D Hu, ... Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017 | 2 | 2017 |
| Conducting a metrology measurement using M-FOUP system in fab environment Y Lifshitz, J Wood, D Novack, J Downey, D Dash, S Chakravorty, ... Metrology, Inspection, and Process Control XXXVI 12053, 693-699, 2022 | 1 | 2022 |
Sridhar MahendrakarSenior Manager- Metrology at Western Digital Corp.wdc.com의 이메일 확인됨