| The science and engineering of microelectronic fabrication SA Campbell (No Title), 2001 | 1705 | 2001 |
| MOSFET transistors fabricated with high permitivity TiO/sub 2/dielectrics SA Campbell, DC Gilmer, XC Wang, MT Hsieh, HS Kim, WL Gladfelter, ... IEEE Transactions on Electron Devices 44 (1), 104-109, 1997 | 581 | 1997 |
| Titanium dioxide (TiO 2)-based gate insulators SA Campbell, HS Kim, DC Gilmer, B He, T Ma, WL Gladfelter IBM journal of research and development 43 (3), 383-392, 1999 | 403 | 1999 |
| Fabrication engineering at the micro-and nanoscale SA Campbell (No Title), 2008 | 342 | 2008 |
| Imaging and phase identification of Cu2ZnSnS4 thin films using confocal Raman spectroscopy AJ Cheng, M Manno, A Khare, C Leighton, SA Campbell, ES Aydil Journal of Vacuum Science & Technology A 29 (5), 2011 | 306 | 2011 |
| Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high‐k materials in microelectronic devices. A carbon‐free precursor for the … RC Smith, T Ma, N Hoilien, LY Tsung, MJ Bevan, L Colombo, J Roberts, ... Advanced Materials for Optics and Electronics 10 (3‐5), 105-114, 2000 | 292 | 2000 |
| Doping efficiency, dopant location, and oxidation of Si nanocrystals XD Pi, R Gresback, RW Liptak, SA Campbell, U Kortshagen Applied Physics Letters 92 (12), 2008 | 287* | 2008 |
| Internal photoemission of electrons and holes from (100)Si into VV Afanas’ ev, A Stesmans, F Chen, X Shi, SA Campbell Applied Physics Letters 81 (6), 1053-1055, 2002 | 236 | 2002 |
| Leakage current and electrical breakdown in metal‐organic chemical vapor deposited TiO2 dielectrics on silicon substrates HS Kim, DC Gilmer, SA Campbell, DL Polla Applied Physics Letters 69 (25), 3860-3862, 1996 | 219 | 1996 |
| The impact of genetic counselling about breast cancer risk on women’s risk perceptions and levels of distress A Cull, EDC Anderson, S Campbell, J Mackay, E Smyth, M Steel British journal of cancer 79 (3), 501-508, 1999 | 218 | 1999 |
| Does chemistry really matter in the chemical vapor deposition of titanium dioxide? Precursor and kinetic effects on the microstructure of polycrystalline films CJ Taylor, DC Gilmer, DG Colombo, GD Wilk, SA Campbell, J Roberts, ... Journal of the American Chemical Society 121 (22), 5220-5229, 1999 | 205 | 1999 |
| Air-stable full-visible-spectrum emission from silicon nanocrystals synthesized by an all-gas-phase plasma approach XD Pi, RW Liptak, JD Nowak, NP Wells, CB Carter, SA Campbell, ... Nanotechnology 19 (24), 245603, 2008 | 197 | 2008 |
| Structural and electrical characterization of TiO2 grown from titanium tetrakis‐isopropoxide (TTIP) and TTIP/H2O ambients J Yan, DC Gilmer, SA Campbell, WL Gladfelter, PG Schmid Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1996 | 173 | 1996 |
| Plasma synthesis of single-crystal silicon nanoparticles for novel electronic device applications A Bapat, C Anderson, CR Perrey, CB Carter, SA Campbell, U Kortshagen Plasma physics and controlled fusion 46 (12B), B97, 2004 | 154 | 2004 |
| Approaching nanoxerography: The use of electrostatic forces to position nanoparticles with 100 nm scale resolution HO Jacobs, SA Campbell, MG Steward Advanced Materials 14 (21), 1553-1557, 2002 | 152 | 2002 |
| Room-temperature atmospheric oxidation of Si nanocrystals after HF etching XD Pi, L Mangolini, SA Campbell, U Kortshagen Physical Review B—Condensed Matter and Materials Physics 75 (8), 085423, 2007 | 147 | 2007 |
| A study of mixtures of HfO2 and TiO2 as high-k gate dielectrics F Chen, X Bin, C Hella, X Shi, WL Gladfelter, SA Campbell Microelectronic Engineering 72 (1-4), 263-266, 2004 | 131 | 2004 |
| Revealing the origins of 3D anisotropic thermal conductivities of black phosphorus J Zhu, H Park, JY Chen, X Gu, H Zhang, S Karthikeyan, N Wendel, ... Advanced Electronic Materials 2 (5), 1600040, 2016 | 129 | 2016 |
| -based insulating stacks on 4H–SiC(0001) VV Afanas’ Ev, A Stesmans, F Chen, SA Campbell, R Smith Applied physics letters 82 (6), 922-924, 2003 | 114 | 2003 |
| Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV DC Gilmer, DG Colombo, CJ Taylor, J Roberts, G Haugstad, SA Campbell, ... Chemical Vapor Deposition 4 (1), 9-11, 1998 | 101 | 1998 |
