Memory improvement with high-k buffer layer in metal/SrBi2Nb2O9/Al2O3/silicon gate stack for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh
Superlattices and Microstructures 121, 55-63, 2018
22 2018 Preparation and characterization of Al2O3 film deposited by RF sputtering and plasma enhanced atomic layer deposition P Singh, RK Jha, RK Singh, BR Singh
Journal of Vacuum Science & Technology B 36 (4), 2018
20 2018 Mobility modeling of rush hour traffic for location area design in cellular networks A Kumar, MN Umesh, R Jha
Proceedings of the 3rd ACM international workshop on Wireless mobile …, 2000
18 2000 LoRa DL: A deep learning model for enhancing the data transmission over LoRa using autoencoder B Shilpa, PR Kumar, RK Jha
The Journal of Supercomputing 79 (15), 17079-17097, 2023
17 2023 Spreading factor optimization for interference mitigation in dense indoor LoRa networks B Shilpa, PR Kumar, RK Jha
2023 IEEE IAS Global Conference on Emerging Technologies (GlobConET), 1-5, 2023
17 2023 Brain disorders: Impact of mild SARS-CoV-2 may shrink several parts of the brain PR Kumar, B Shilpa, RK Jha
Neuroscience & Biobehavioral Reviews 149, 105150, 2023
15 2023 On the structural and electrical properties of metal–ferroelectric–high k dielectric–silicon structure for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh
Bulletin of Materials Science 41, 1-7, 2018
13 2018 Electrical properties of Pb[Zr0.35 Ti0.65 ]O3 on PEALD Al2 O3 for NVM applications P Singh, RK Jha, RK Singh, BR Singh
Microelectronics International 35 (4), 189-196, 2018
11 2018 Integration of perovskite Pb[Zr0.35 Ti0.65 ]O3 /HfO2 ferroelectric-dielectric composite film on Si substrate P Singh, RK Jha, M Goswami, BR Singh
Microelectronics International 37 (3), 155-162, 2020
9 2020 Electrical and ferroelectric properties of RF sputtered PZT/SBN on silicon for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh
Materials Research Express 5 (2), 026301, 2018
9 2018 Impact of plasma enhanced atomic layer deposited HfO2 buffer layer on the structural, electrical and ferroelectric properties of metal/ferroelectric/insulator … RK Jha, P Singh, M Goswami, BR Singh
Journal of Materials Science: Materials in Electronics 30, 15224-15235, 2019
8 2019 Impact of process parameters on the structural and electrical properties of metal/PZT/Al2 O3 /silicon gate stack for non-volatile memory applications P Singh, RK Jha, RK Singh, BR Singh
Applied Physics A 124, 1-9, 2018
8 2018 A novel end-to-end approach for epileptic seizure classification from scalp EEG data using deep learning technique PR Kumar, B Shilpa, RK Jha, SN Mohanty
International Journal of Information Technology 15 (8), 4223-4231, 2023
7 2023 Optimization of ALD A Bansal, P Singh, RK Jha, BR Singh
Applied Physics B 125 (6), 114, 2019
7 2019 Integration of Sr0.8 Bi2.2 Ta2 O9 /HfO2 ferroelectric/dielectric composite film on Si substrate for nonvolatile memory applications RK Jha, P Singh, M Goswami, BR Singh
Ferroelectrics Letters Section 46 (4-6), 82-89, 2019
6 2019 Integration of ferroelectric BIT and dielectric HfO2 on silicon substrate with high data retention and endurance for ferroelectric FET applications RK Jha, P Singh, M Goswami, BR Singh
Applied Physics A 125, 1-12, 2019
6 2019 Brain tissue segmentation in neurosurgery: a systematic analysis for quantitative tractography approaches PR Kumar, RK Jha, A Katti
Acta Neurologica Belgica 124 (1), 1-15, 2024
5 2024 Impact of HfO2 buffer layer on the electrical characteristics of ferroelectric/high-k gate stack for nonvolatile memory applications RK Jha, P Singh, U Kashniyal, M Goswami, BR Singh
Applied Physics A 126, 1-11, 2020
5 2020 Impact of HfO2 as a passivation layer in the solar cell efficiency enhancement in passivated emitter rear cell type RK Jha, P Singh, M Goswami, BR Singh
Journal of Nanoscience and Nanotechnology 20 (6), 3718-3723, 2020
5 2020 Plasma Enhanced Atomic Layer Deposited HfO2 Ferroelectric Films for Non-volatile Memory Applications RK Jha, P Singh, M Goswami, BR Singh
Journal of Electronic Materials 49, 1445-1453, 2020
5 2020 
Dr. Prashant SinghEngineer-CELL FILM-NAND at Micron Technology Inc.Geverifieerd e-mailadres voor micron.com