Supersonic metal cluster beams: laser photoionization studies of copper cluster (Cu2) DE Powers, SG Hansen, ME Geusic, AC Puiu, JB Hopkins, TG Dietz, ...
The Journal of Physical Chemistry 86 (14), 2556-2560, 1982
374 1982 Supersonic copper clusters DE Powers, SG Hansen, ME Geusic, DL Michalopoulos, RE Smalley
The Journal of Chemical Physics 78 (6), 2866-2881, 1983
316 1983 Formation of polymer films by pulsed laser evaporation SG Hansen, TE Robitaille
Applied physics letters 52 (1), 81-83, 1988
214 1988 The bond length of chromium dimer DL Michalopoulos, ME Geusic, SG Hansen, DE Powers, RE Smalley
The Journal of Physical Chemistry 86 (20), 3914-3916, 1982
197 1982 Lithographic apparatus and method for optimizing an illumination source using photolithographic simulations SG Hansen
US Patent 7,030,966, 2006
105 2006 Lithographic apparatus and method for optimizing illumination using a photolithographic simulation SG Hansen
US Patent 7,245,356, 2007
103 2007 SOURCE-MASK OPTIMIZATION IN LITHOGRAPHIC APPARATUS
US Patent 8,786,824, 0
86 * An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging S Hsu, L Chen, Z Li, S Park, K Gronlund, H Liu, N Callan, R Socha, ...
Lithography Asia 2008 7140, 220-229, 2008
82 2008 EUV resolution enhancement techniques (RETs) for k1 0.4 and below S Hsu, R Howell, J Jia, HY Liu, K Gronlund, S Hansen, J Zimmermann
Extreme Ultraviolet (EUV) Lithography VI 9422, 480-495, 2015
76 2015 EUV simulation extension study for mask shadowing effect and its correction H Kang, S Hansen, J van Schoot, K van Ingen Schenau
Emerging Lithographic Technologies XII 6921, 978-988, 2008
76 2008 Study of ultraviolet‐laser ablation products of several polymers using time‐of‐flight mass spectroscopy SG Hansen
Journal of applied physics 66 (3), 1411-1422, 1989
73 1989 Polarization effects associated with hyper-numerical-aperture D Flagello, B Geh, S Hansen, M Totzeck
Journal of Micro/Nanolithography, MEMS and MOEMS 4 (3), 031104-031104-17, 2005
68 2005 Velocity profiles of species ejected in ultraviolet laser ablation of several polymers examined by time‐of‐flight mass spectroscopy SG Hansen
Journal of applied physics 66 (7), 3329-3336, 1989
67 1989 EUV source-mask optimization for 7nm node and beyond X Liu, R Howell, S Hsu, K Yang, K Gronlund, F Driessen, HY Liu, ...
Extreme Ultraviolet (EUV) Lithography V 9048, 171-181, 2014
58 2014 Measurements of F*, CF, and CF2 formation and decay in pulsed fluorocarbon discharges SG Hansen, G Luckman, SD Colson
Applied physics letters 53 (17), 1588-1590, 1988
57 1988 Source mask optimization to reduce stochastic effects SG Hansen
US Patent 9,213,783, 2015
48 2015 Exposure with intensity balancing to mimic complex illuminator shape SG Hansen
US Patent 7,180,576, 2007
48 2007 Lithographic apparatus and method for optimizing an illumination source using isofocal compensation SG Hansen
US Patent 7,016,017, 2006
48 2006 Method for optimizing an illumination source using full resist simulation and process window response metric SG Hansen
US Patent 6,839,125, 2005
44 2005 Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process S Hansen
US Patent 8,050,898, 2011
43 2011 