Volgen
Johann W. Bartha
Johann W. Bartha
Professor für Halbleitertechnik, Technische Universität Dresden
Geverifieerd e-mailadres voor tu-dresden.de - Homepage
Titel
Geciteerd door
Geciteerd door
Jaar
Crystallization behavior of thin ALD-Al2O3 films
S Jakschik, U Schroeder, T Hecht, M Gutsche, H Seidl, JW Bartha
Thin solid films 425 (1-2), 216-220, 2003
3662003
Chemical bonding and reaction at metal/polymer interfaces
PS Ho, PO Hahn, JW Bartha, GW Rubloff, FK LeGoues, BD Silverman
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985
3271985
Doped organic transistors operating in the inversion and depletion regime
B Lüssem, ML Tietze, H Kleemann, C Hoßbach, JW Bartha, A Zakhidov, ...
Nature communications 4 (1), 2775, 2013
2192013
PET/MRI in head and neck cancer: initial experience
I Platzek, B Beuthien-Baumann, M Schneider, V Gudziol, J Langner, ...
European journal of nuclear medicine and molecular imaging 40, 6-11, 2013
166*2013
Photoemission spectroscopy study of aluminum–polyimide interface
JW Bartha, PO Hahn, F LeGoues, PS Ho
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 3 (3 …, 1985
1611985
Low temperature etching of Si in high density plasma using SF6/O2
JW Bartha, J Greschner, M Puech, P Maquin
Microelectronic Engineering 27 (1-4), 453-456, 1995
1201995
Physical characterization of thin ALD–Al2O3 films
S Jakschik, U Schroeder, T Hecht, D Krueger, G Dollinger, A Bergmaier, ...
Applied Surface Science 211 (1-4), 352-359, 2003
1052003
Thickness dependent barrier performance of permeation barriers made from atomic layer deposited alumina for organic devices
H Klumbies, P Schmidt, M Hähnel, A Singh, U Schroeder, C Richter, ...
Organic Electronics 17, 138-143, 2015
1032015
Atomic Layer Deposition for Coating of High Aspect Ratio TiO2 Nanotube Layers
R Zazpe, M Knaut, H Sopha, L Hromadko, M Albert, J Prikryl, ...
Langmuir 32 (41), 10551-10558, 2016
982016
Interaction of metals with model polymer surfaces: Core level photoemission studies
PN Sanda, JW Bartha, JG Clabes, JL Jordan, C Feger, BD Silverman, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (3 …, 1986
911986
Structure and thermal stability of graded Ta–TaN diffusion barriers between Cu and SiO2
R Hübner, M Hecker, N Mattern, V Hoffmann, K Wetzig, C Wenger, ...
Thin Solid Films 437 (1-2), 248-256, 2003
882003
Anisotropy of thermal expansion of thin polyimide films
G Elsner, J Kempf, JW Bartha, HH Wagner
Thin Solid Films 185 (1), 189-197, 1990
851990
Molecular orbital analysis of the XPS spectra of PMDA‐ODA polymide and its polyamic acid precursor
BD Silverman, JW Bartha, JG Clabes, PS Ho, AR Rossi
Journal of Polymer Science Part A: Polymer Chemistry 24 (12), 3325-3333, 1986
661986
Atomic Layer Deposition of Titanium Dioxide Thin Films from Cp*Ti(OMe)3 and Ozone
M Rose, J Niinistö, P Michalowski, L Gerlich, L Wilde, I Endler, ...
The Journal of Physical Chemistry C 113 (52), 21825-21830, 2009
652009
Temperature dependence of the reflectivity of silicon with surface oxide at wavelengths of 633 and 1047 nm
J Heller, JW Bartha, CC Poon, AC Tam
Applied Physics Letters 75 (1), 43-45, 1999
631999
PECVD (plasma enhanced chemical vapor deposition) method for depositing of tungsten or layers containing tungsten by in situ formation of tungsten fluorides
JW Bartha, T Bayer, J Greschner, G Kraus, G Schmid
US Patent 4,918,033, 1990
631990
Breakdown and protection of ALD moisture barrier thin films
F Nehm, H Klumbies, C Richter, A Singh, U Schroeder, T Mikolajick, ...
ACS applied materials & interfaces 7 (40), 22121-22127, 2015
612015
Temperature dependence of the sticking coefficient in atomic layer deposition
M Rose, JW Bartha, I Endler
Applied surface science 256 (12), 3778-3782, 2010
612010
Method to determine the sticking coefficient of precursor molecules in atomic layer deposition
M Rose, JW Bartha
Applied surface science 255 (13-14), 6620-6623, 2009
572009
Atomic layer deposition for high aspect ratio through silicon vias
M Knaut, M Junige, V Neumann, H Wojcik, T Henke, C Hossbach, A Hiess, ...
Microelectronic Engineering 107, 80-83, 2013
562013
Het systeem kan de bewerking nu niet uitvoeren. Probeer het later opnieuw.
Artikelen 1–20