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Roman REBOUD
Roman REBOUD
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Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition
L Tian, S Ponton, M Benz, A Crisci, R Reboud, G Giusti, F Volpi, ...
Surface and Coatings Technology 347, 181-190, 2018
362018
A chemical vapor deposition route to epitaxial superconducting NbTiN thin films
N Tsavdaris, D Harza, S Coindeau, G Renou, F Robaut, E Sarigiannidou, ...
Chemistry of Materials 29 (14), 5824-5830, 2017
182017
Growth of boron nitride on (0001) AlN templates by high temperature-hydride vapor phase epitaxy (HT-HVPE)
N Coudurier, R Boichot, F Mercier, R Reboud, S Lay, E Blanquet, M Pons
Physics Procedia 46, 102-106, 2013
182013
Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing
L Tian, I Bottala-Gambetta, V Marchetto, M Jacquemin, A Crisci, ...
Thin Solid Films 709, 138232, 2020
142020
Growth of boron nitride films on w‐AlN (0001), 4° off‐cut 4H‐SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Deposition
N Coudurier, M Chubarov, R Boichot, F Mercier, E Blanquet, R Reboud, ...
Crystal research and technology 51 (3), 231-238, 2016
122016
Growth of aluminum nitride on flat and patterned Si (111) by high temperature halide CVD
M Chubarov, F Mercier, S Lay, F Charlot, A Crisci, S Coindeau, T Encinas, ...
Thin Solid Films 623, 65-71, 2017
62017
Investigation of liquid oxide interactions with refractory substrates via sessile drop method
A Tandjaoui, M Cherif, L Carroz, J Sanchez, R Reboud, C Garnier, ...
Journal of Materials Science 51, 1701-1712, 2016
62016
Method for functionalizing a polymer-based substrate by chemical deposition of a thin layer
E Gicquel, F Mercier, R Boichot, E Blanquet, E Mauret, R Reboud, J Bras
US Patent App. 18/006,335, 2023
2023
Stress control of AlN-based multilayer coatings with amorphous intermediate layers
V Tabouret, R Reboud, A Crisci, F Mercier
48th International Conference on Metallurgical Coatings and Thin Films …, 2022
2022
Superconducting properties of NbN thin films deposited by plasma enhanced atomic layer deposition using a metalorganic precursor
F Mercier, L Tian, E Blanquet, I Bottala-Gambetta, V Marchetto, ...
EuroCVD 22-Baltic ALD 16 Conference, 2019
2019
Grain structure of multi-crystalline silicon: x-ray synchrotron imaging characterization
A Tandjaoui, R Reboud, C Garnier, T Duffar
International Workshop of Crystal Growth Technology, 2014
2014
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Artikler 1–11