Kenneth A. Goldberg

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Patrick NaulleauEUV Tech Inc. and Berkeley LabVerifisert e-postadresse på euvtech.com
Jeffrey Bokor Professor of electrical engineering and computer sciences, University of California, BerkeleyVerifisert e-postadresse på eecs.berkeley.edu
Iacopo MochiPaul Scherrer InstitutVerifisert e-postadresse på psi.ch
Eric GulliksonLawrence Berkeley National LaboratoryVerifisert e-postadresse på lbl.gov
Antoine Islegen-WojdylaLawrence Berkeley National LaboratoryVerifisert e-postadresse på lbl.gov
Sungmin HuhSamsung electronicsVerifisert e-postadresse på samsung.com
Wayne R. McKinneyLawrence Berkeley National LaboratoryVerifisert e-postadresse på lbl.gov
H A PadmoreLawrence Berkekely National LabVerifisert e-postadresse på lbl.gov
James Alexander LiddleChief, Microsystems and Nanotechnology Division, NISTVerifisert e-postadresse på nist.gov
mourad idirBNL / NSLS IIVerifisert e-postadresse på bnl.gov
Yow-Gwo WangIntelVerifisert e-postadresse på intel.com
Laura WallerUC BerkeleyVerifisert e-postadresse på alum.mit.edu
Lahsen AssoufidSenior Physicist and Optics Group Leader, Argonne National LaboratoryVerifisert e-postadresse på anl.gov
Samuel BucourtImagine OpticVerifisert e-postadresse på imagine-optic.com
Xavier LevecqImagine OpticVerifisert e-postadresse på imagine-optic.com
Philippe ZeitounCNRSVerifisert e-postadresse på ensta.fr
Ted LiangIntel CorporationVerifisert e-postadresse på intel.com
Manuel Sanchez Del RioESRFVerifisert e-postadresse på esrf.eu
Rashi GargGlobal FoundriesVerifisert e-postadresse på globalfoundries.com
Bruce W. SmithProfessor, Microsystems Engineering, Rochester Institute of TechnologyVerifisert e-postadresse på rit.edu

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Kenneth A. Goldberg

Optical Physicist, Advanced Light Source, Lawrence Berkeley National Laboratory

Verifisert e-postadresse på lbl.gov - Startside

Optics Adaptive X-Ray Optics Wavefront Sensors X-Ray Beamlines Extreme Ultraviolet


Tittel Sorter etter sitater Sorter etter år Sorter etter tittel	Sitert av Sitert av	År
Phase-shifting point diffraction interferometer H Medecki, E Tejnil, KA Goldberg, J Bokor Optics letters 21 (19), 1526-1528, 1996	226	1996
Fourier-transform method of phase-shift determination KA Goldberg, J Bokor Applied optics 40 (17), 2886-2894, 2001	166	2001
Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor Applied Optics 38 (35), 7252-7263, 1999	147	1999
Hartmann wave-front measurement at 13.4 nm with λ_EUV/120 accuracy P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ... Optics letters 28 (17), 1534-1536, 2003	129	2003
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ... Emerging Lithographic Technologies VIII 5374, 881-891, 2004	117	2004
Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system PP Naulleau, KA Goldberg, J Bokor Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000	96	2000
Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa Applied Optics 42 (5), 820-826, 2003	92	2003
Critical challenges for EUV resist materials PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011	90	2011
System integration and performance of the EUV engineering test stand DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ... Emerging Lithographic Technologies V 4343, 19-37, 2001	85	2001
EUV engineering test stand DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ... Emerging Lithographic Technologies IV 3997, 48-69, 2000	81	2000
Modal wavefront reconstruction from its gradient I Mochi, KA Goldberg Applied Optics 54 (12), 3780-3785, 2015	79	2015
Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ... IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999	77	1999
At-wavelength interferometry for extreme ultraviolet lithography E Tejnil, KA Goldberg, SH Lee, H Medecki, PJ Batson, PE Denham, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1997	74	1997
Microscopy of extreme ultraviolet lithography masks with tabletop laser illumination F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ... Optics letters 34 (3), 271-273, 2009	73	2009
Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements KA Goldberg, A Barty, Y Liu, P Kearney, Y Tezuka, T Terasawa, JS Taylor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006	64	2006
Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002	64	2002
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004	63	2004
At-wavelength alignment and testing of the 0.3 NA MET optic KA Goldberg, PP Naulleau, PE Denham, SB Rekawa, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004	62	2004
EUV microexposures at the ALS using the 0.3-NA MET projection optics P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ... Emerging Lithographic Technologies IX 5751, 56-63, 2005	59	2005
Printability of native blank defects and programmed defects and their stack structures HJ Kwon, J Harris-Jones, R Teki, A Cordes, T Nakajima, I Mochi, ... Photomask Technology 2011 8166, 60-69, 2011	57	2011

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