Real space soft x-ray imaging at 10 nm spatial resolution W Chao, P Fischer, T Tyliszczak, S Rekawa, E Anderson, P Naulleau
Optics express 20 (9), 9777-9783, 2012
284 2012 Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy PP Naulleau, KA Goldberg, SH Lee, C Chang, D Attwood, J Bokor
Applied Optics 38 (35), 7252-7263, 1999
147 1999 Hartmann wave-front measurement at 13.4 nm with λ EUV /120 accuracy P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ...
Optics letters 28 (17), 1534-1536, 2003
129 2003 Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ...
Emerging Lithographic Technologies VIII 5374, 881-891, 2004
117 2004 Directly patterned inorganic hardmask for EUV lithography JK Stowers, A Telecky, M Kocsis, BL Clark, DA Keszler, A Grenville, ...
Extreme ultraviolet (EUV) lithography II 7969, 386-396, 2011
104 2011 Nanofabrication handbook S Cabrini, S Kawata
CRC press, 2012
99 2012 Extreme ultraviolet carrier-frequency shearing interferometry of a lithographic four-mirror optical system PP Naulleau, KA Goldberg, J Bokor
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
96 2000 Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa
Applied Optics 42 (5), 820-826, 2003
92 2003 Need for LWR metrology standardization: the imec roughness protocol GF Lorusso, T Sutani, V Rutigliani, F Van Roey, A Moussa, AL Charley, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 17 (4), 041009-041009, 2018
90 2018 Critical challenges for EUV resist materials PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ...
Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011
90 2011 System integration and performance of the EUV engineering test stand DA Tichenor, AK Ray-Chaudhuri, WC Replogle, RH Stulen, GD Kubiak, ...
Emerging Lithographic Technologies V 4343, 19-37, 2001
85 2001 Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source MA Le Gros, G McDermott, BP Cinquin, EA Smith, M Do, WL Chao, ...
Synchrotron Radiation 21 (6), 1370-1377, 2014
83 2014 Fundamental limits to EUV photoresist GM Gallatin, P Naulleau, R Brainard
Advances in Resist Materials and Processing Technology XXIV 6519, 387-396, 2007
83 2007 Resolution, LER, and sensitivity limitations of photoresists GM Gallatin, P Naulleau, D Niakoula, R Brainard, E Hassanein, R Matyi, ...
Emerging Lithographic Technologies XII 6921, 417-427, 2008
82 2008 Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization PP Naulleau, GM Gallatin
Applied Optics 42 (17), 3390-3397, 2003
81 2003 EUV engineering test stand DA Tichenor, GD Kubiak, WC Replogle, LE Klebanoff, JB Wronosky, ...
Emerging Lithographic Technologies IV 3997, 48-69, 2000
81 2000 Spatial coherence characterization of undulator radiation C Chang, P Naulleau, E Anderson, D Attwood
Optics communications 182 (1-3), 25-34, 2000
79 2000 Tunable coherent radiation in the soft X-ray and extreme ultraviolet spectral regions DT Attwood, P Naulleau, KA Goldberg, E Tejnil, C Chang, R Beguiristain, ...
IEEE Journal of Quantum Electronics 35 (5), 709-720, 1999
77 1999 Microscopy of extreme ultraviolet lithography masks with F Brizuela, Y Wang, CA Brewer, F Pedaci, W Chao, EH Anderson, Y Liu, ...
Optics letters 34 (3), 271-273, 2009
73 2009 Resist Materials for Extreme Ultraviolet Lithography: Toward Low‐Cost Single‐Digit‐Nanometer Patterning PD Ashby, DL Olynick, DF Ogletree, PP Naulleau
Advanced Materials 27 (38), 5813-5819, 2015
69 2015 