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Atsushi OKADA
Atsushi OKADA
Samsung Advanced Institute of Technology
Zweryfikowany adres z samsung.com
Tytuł
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Electric-field effects on magnetic anisotropy and damping constant in Ta/CoFeB/MgO investigated by ferromagnetic resonance
A Okada, S Kanai, M Yamanouchi, S Ikeda, F Matsukura, H Ohno
Applied Physics Letters 105 (5), 2014
1352014
Spin-orbit torques in high-resistivity-W/CoFeB/MgO
Y Takeuchi, C Zhang, A Okada, H Sato, S Fukami, H Ohno
Applied Physics Letters 112 (19), 2018
1052018
Magnetization dynamics and its scattering mechanism in thin CoFeB films with interfacial anisotropy
A Okada, S He, B Gu, S Kanai, A Soumyanarayanan, ST Lim, M Tran, ...
Proceedings of the National Academy of Sciences 114 (15), 3815-3820, 2017
652017
Effect of electric-field modulation of magnetic parameters on domain structure in MgO/CoFeB
T Dohi, S Kanai, A Okada, F Matsukura, H Ohno
AIP Advances 6 (7), 2016
362016
Spin-pumping-free determination of spin-orbit torque efficiency from spin-torque ferromagnetic resonance
A Okada, Y Takeuchi, K Furuya, C Zhang, H Sato, S Fukami, H Ohno
Physical Review Applied 12 (1), 014040, 2019
332019
Electric-field effect on the easy cone angle of the easy-cone state in CoFeB/MgO investigated by ferromagnetic resonance
A Okada, S Kanai, S Fukami, H Sato, H Ohno
Applied Physics Letters 112 (17), 2018
152018
Non-linear variation of domain period under electric field in demagnetized CoFeB/MgO stacks with perpendicular easy axis
N Ichikawa, T Dohi, A Okada, H Sato, S Fukami, H Ohno
Applied Physics Letters 112 (20), 2018
72018
Highly reliable STT-MRAM adopting advanced MTJs with controlled domain wall pinning
JH Park, JH Kim, JM Kim, J Kim, D Apalkov, A Okada, H Sato, JH Jeong, ...
2022 International Electron Devices Meeting (IEDM), 10.6. 1-10.6. 4, 2022
52022
Performance Improvement of Magnet Temperature Estimation using Kernel Method based Non-Linear Parameter Estimator for Variable leakage flux IPMSMs
A Okada, AS Koshikawa, K Yonaga, K Sasaki, T Kato, M Ohzeki
IEEJ Journal of Industry Applications 10 (6), 618-623, 2021
32021
14nm FinFET node embedded MRAM technology for automotive non-volatile RAM applications with endurance over 1E12-cycles
J Oh, J Park, K Suh, K Lee, S Hwang, M Bak, H Kim, B Kwon, DK Lee, ...
2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2024
12024
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