| Plasma frequency measurements for absolute plasma density by means of wave cutoff method JH Kim, DJ Seong, JY Lim, KH Chung Applied physics letters 83 (23), 4725-4727, 2003 | 137 | 2003 |
| Wave cutoff method to measure absolute electron density in cold plasma JH Kim, SC Choi, YH Shin, KH Chung Review of scientific instruments 75 (8), 2706-2710, 2004 | 97 | 2004 |
| The effects of radio-frequency bias on electron density in an inductively coupled plasma reactor MA Sobolewski, JH Kim Journal of Applied Physics 102, 113302, 2007 | 75 | 2007 |
| The deposition of SiOF film with low dielectric constant in a helicon plasma source JH Kim, SH Seo, SM Yun, HY Chang, KM Lee, CK Choi Applied physics letters 68 (11), 1507-1509, 1996 | 65 | 1996 |
| An analysis on transmission microwave frequency spectrum of cut-off probe DW Kim, SJ You, BK Na, JH Kim, HY Chang Applied Physics Letters 99 (13), 2011 | 47 | 2011 |
| Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias MY Yoon, HJ Yeom, JH Kim, W Chegal, YJ Cho, DC Kwon, JR Jeong, ... Physics of Plasmas 28 (6), 2021 | 46 | 2021 |
| A study on ion energy distribution functions and plasma potentials in helicon wave plasmas JH Kim, HY Chang Physics of Plasmas 3 (4), 1462-1469, 1996 | 43 | 1996 |
| Frequency dependence of helicon wave plasmas near lower hybrid resonance frequency SM Yun, JH Kim, HY Chang Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (3 …, 1997 | 40 | 1997 |
| Plasma etching of the trench pattern with high aspect ratio mask under ion tilting MY Yoon, HJ Yeom, JH Kim, JR Jeong, HC Lee Applied Surface Science 595, 153462, 2022 | 38 | 2022 |
| Evolution of electron temperature in inductively coupled plasma HC Lee, BH Seo, DC Kwon, JH Kim, DJ Seong, SJ Oh, CW Chung, ... Applied Physics Letters 110 (1), 2017 | 37 | 2017 |
| Role of transverse magnetic field in the capacitive discharge SJ You, TT Hai, M Park, DW Kim, JH Kim, DJ Seong, YH Shin, SH Lee, ... Thin Solid Films 519 (20), 6981-6989, 2011 | 34 | 2011 |
| Flat cutoff probe for real-time electron density measurement in industrial plasma processing HJ Yeom, JH Kim, DH Choi, ES Choi, MY Yoon, DJ Seong, SJ You, ... Plasma Sources Science and Technology 29 (3), 035016, 2020 | 31 | 2020 |
| Analysis of the uncertainty in the measurement of electron densities in plasmas using the wave cutoff method JH Kim, KH Chung, YH Shin Metrologia 42 (2), 110, 2005 | 30 | 2005 |
| Measurement and analysis of electron-neutral collision frequency in the calibrated cutoff probe KH You, SJ You, DW Kim, BK Na, BH Seo, JH Kim, HY Chang Physics of Plasmas 23 (3), 2016 | 27 | 2016 |
| Computational characterization of cutoff probe system for the measurement of electron density BK Na, DW Kim, JH Kwon, HY Chang, JH Kim, SJ You Physics of Plasmas 19 (5), 2012 | 27 | 2012 |
| m=/spl plusmn/1 and m=/spl plusmn/2 mode helicon wave excitation JH Kim, SM Yun, HY Chang IEEE transactions on plasma science 24 (6), 1364-1370, 1996 | 27 | 1996 |
| Computational comparative study of microwave probes for plasma density measurement DW Kim, SJ You, JH Kim, HY Chang, WY Oh Plasma Sources Science and Technology 25 (3), 035026, 2016 | 26 | 2016 |
| Plasma density measurements by phase resolved cutoff JH Kwon, SJ You, JH Kim, YH Shin Applied Physics Letters 96, 081502, 2010 | 26 | 2010 |
| Sheath width effect on the determination of plasma frequency in the cutoff probe DW Kim, SJ You, JH Kim, HY Chang, WY Oh Applied Physics Letters 100 (24), 2012 | 24 | 2012 |
| A transmission line model of the cutoff probe SJ Kim, JJ Lee, DW Kim, JH Kim, SJ You Plasma Sources Science and Technology 28 (5), 055014, 2019 | 23 | 2019 |
Hyo-Chang Lee (이효창)Korea Research Institute of Standards and ScienceZweryfikowany adres z hanyang.ac.kr