| Evolution of metastable phases in silicon during nanoindentation: mechanism analysis and experimental verification K Mylvaganam, LC Zhang, P Eyben, J Mody, W Vandervorst Nanotechnology 20 (30), 305705, 2009 | 136 | 2009 |
| Atom-probe for FinFET dopant characterization AK Kambham, J Mody, M Gilbert, S Koelling, W Vandervorst Ultramicroscopy 111 (6), 535-539, 2011 | 68 | 2011 |
| Experimental studies of dose retention and activation in FinFet-based structures J Mody, R Duffy, P Eyben, J Goossens, A Moussa, W Polspoel, ... Proceedings of the International Workshop on INSIGHT in Semiconductor Device …, 2009 | 59* | 2009 |
| Analysis and modeling of the high vacuum scanning spreading resistance microscopy nanocontact on silicon P Eyben, F Clemente, K Vanstreels, G Pourtois, T Clarysse, E Duriau, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2010 | 54 | 2010 |
| Observation of diameter dependent carrier distribution in nanowire-based transistors A Schulze, T Hantschel, P Eyben, AS Verhulst, R Rooyackers, ... Nanotechnology 22 (18), 185701, 2011 | 52 | 2011 |
| Dopant/carrier profiling for 3D‐structures W Vandervorst, A Schulze, AK Kambham, J Mody, M Gilbert, P Eyben physica status solidi (c) 11 (1), 121-129, 2014 | 38 | 2014 |
| Conformal doping of FINFETs: A fabrication and metrology challenge W Vandervorst, JL Everaert, E Rosseel, M Jurczak, T Hoffman, P Eyben, ... AIP Conference Proceedings 1066 (1), 449-456, 2008 | 37 | 2008 |
| Fundamentals of picoscience KD Sattler CRC Press, 2013 | 35 | 2013 |
| 3D-carrier profiling in FinFETs using scanning spreading resistance microscopy J Mody, G Zschätzsch, S Kölling, A De Keersgieter, G Eneman, ... 2011 International Electron Devices Meeting, 6.1. 1-6.1. 4, 2011 | 26 | 2011 |
| Dopant and carrier profiling in FinFET-based devices with sub-nanometer resolution J Mody, AK Kambham, G Zschätzsch, P Schatzer, T Chiarella, N Collaert, ... 2010 Symposium on VLSI Technology, 195-196, 2010 | 22 | 2010 |
| Two-dimensional carrier mapping at the nanometer-scale on 32 nm node targeted p-MOSFETs using high vacuum scanning spreading resistance microscopy P Eyben, T Clarysse, J Mody, A Nazir, A Schulze, T Hantschel, ... Solid-state electronics 71, 69-73, 2012 | 21 | 2012 |
| Physical degradation of gate dielectrics induced by local electrical stress using conductive atomic force microscopy W Polspoel, P Favia, J Mody, H Bender, W Vandervorst Journal of Applied Physics 106 (2), 2009 | 21 | 2009 |
| Nanosecond laser anneal for BEOL performance boost in advanced FinFETs RTP Lee, N Petrov, J Kassim, M Gribelyuk, J Yang, L Cao, KB Yeap, ... 2018 IEEE Symposium on VLSI Technology, 61-62, 2018 | 17 | 2018 |
| Impact of the environmental conditions on the electrical characteristics of scanning spreading resistance microscopy P Eyben, J Mody, SC Vemula, W Vandervorst Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 17 | 2008 |
| Toward extending the capabilities of scanning spreading resistance microscopy for fin field-effect-transistor-based structures J Mody, P Eyben, E Augendre, O Richard, W Vandervorst Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 14 | 2008 |
| High performance n-MOS finFET by damage-free, conformal extension doping G Zschätzsch, Y Sasaki, S Hayashi, M Togo, T Chiarella, AK Kambham, ... 2011 International Electron Devices Meeting, 35.6. 1-35.6. 4, 2011 | 13 | 2011 |
| Atom probe tomography for 3D-dopant analysis in FinFET devices AK Kambham, G Zschaetzsch, Y Sasaki, M Togo, N Horiguchi, J Mody, ... 2012 Symposium on VLSI Technology (VLSIT), 77-78, 2012 | 9 | 2012 |
| Wafer backside cleaning for defect reduction and litho hot spots mitigation: DI: Defect inspection and reduction E Balu, WT Tseng, D Jayez, J Mody, K Donegan 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2018 | 8 | 2018 |
| Sample preparation by focused ion beam without argon ion milling for quantitative electron holography of pn junctions MA Gribelyuk, J Mody, E Kaganer, SS Furkay, J Miller, A Charsky Journal of Applied Physics 126 (6), 2019 | 7 | 2019 |
| Dopant and carrier profiling for 3D-device architectures J Mody, AK Kambham, G Zschätzsch, T Chiarella, N Collaert, L Witters, ... 11th International Workshop on Junction Technology (IWJT), 108-113, 2011 | 6 | 2011 |
Pierre EybenIMECZweryfikowany adres z imec.be
