| Selective photoresist hardening to facilitate lateral trimming CT Gabriel, HJ Levinson, U Okoroanyanwu US Patent 6,716,571, 2004 | 489 | 2004 |
| Alicyclic polymers for 193 nm resist applications: Synthesis and characterization U Okoroanyanwu, T Shimokawa, J Byers, CG Willson Chemistry of materials 10 (11), 3319-3327, 1998 | 108 | 1998 |
| Stacked organic memory devices and methods of operating and fabricating NH Tripsas, U Okoroanyanwu, SK Pangrle, MA VanBuskirk US Patent 6,870,183, 2005 | 86 | 2005 |
| Alicyclic polymers for 193 nm resist applications: Lithographic evaluation U Okoroanyanwu, J Byers, T Shimokawa, CG Willson Chemistry of materials 10 (11), 3328-3333, 1998 | 85 | 1998 |
| Integration of EUV lithography in the fabrication of 22-nm node devices O Wood, CS Koay, K Petrillo, H Mizuno, S Raghunathan, J Arnold, ... Alternative lithographic technologies 7271, 50-59, 2009 | 78 | 2009 |
| Protecting groups for 193-nm photoresists RD Allen, R Sooriyakumaran, J Opitz, GM Wallraff, RA Di Pietro, G Breyta, ... Advances in Resist Technology and Processing XIII 2724, 334-343, 1996 | 77 | 1996 |
| Chemistry and lithography U Okoroanyanwu (No Title), 2010 | 73 | 2010 |
| New single-layer positive photoresists for 193-nm photolithography U Okoroanyanwu, T Shimokawa, JD Byers, DR Medeiros, CG Willson, ... Advances in Resist Technology and Processing XIV 3049, 92-103, 1997 | 72 | 1997 |
| Comparison of the lithographic properties of positive resists upon exposure to deep-and extreme-ultraviolet radiation RL Brainard, C Henderson, J Cobb, V Rao, JF Mackevich, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 68 | 1999 |
| Printed microfluidic sweat sensing platform for cortisol and glucose detection AR Naik, Y Zhou, AA Dey, DLG Arellano, U Okoroanyanwu, EB Secor, ... Lab on a Chip 22 (1), 156-169, 2022 | 67 | 2022 |
| Progress in 193nm Positive Resists RD Allen, R Sooriyakumaran, J Opitz, GM Wallraff, G Breyta, RA DiPietro, ... Journal of Photopolymer Science and Technology 9 (3), 465-474, 1996 | 66 | 1996 |
| The use of EUV lithography to produce demonstration devices B LaFontaine, Y Deng, RH Kim, HJ Levinson, S McGowan, ... Emerging Lithographic Technologies XII 6921, 212-221, 2008 | 55 | 2008 |
| Improving the performance of 193-nm photoresists based on alicyclic polymers K Patterson, U Okoroanyanwu, T Shimokawa, S Cho, JD Byers, ... Advances in Resist Technology and Processing XV 3333, 425-437, 1998 | 50 | 1998 |
| Interconnect structure with silicon containing alicyclic polymers and low-k dielectric materials and method of making same with single and dual damascene techniques U Okoroanyanwu, R Subramanian US Patent 6,475,904, 2002 | 48 | 2002 |
| Planar polymer memory device NH Tripsas, MS Buynoski, U Okoroanyanwu, SK Pangrle US Patent 6,977,389, 2005 | 45 | 2005 |
| Photoresist compositions comprising norbornene derivative polymers with acid labile groups CG Willson, U Okoroanyanwu, D Medieros US Patent 6,103,445, 2000 | 45 | 2000 |
| Polymer memory device formed in via opening NH Tripsas, MS Buynoski, SK Pangrle, U Okoroanyanwu, AT Hui, ... US Patent 6,787,458, 2004 | 44 | 2004 |
| Mask structures and methods of manufacturing SK Patil, S Singh, U Okoroanyanwu, PJS Mangat US Patent 9,195,132, 2015 | 43 | 2015 |
| EUV pellicle and method for fabricating semiconductor dies using same U Okoroanyanwu, R Kim US Patent 7,767,985, 2010 | 43 | 2010 |
| Process for reducing the critical dimensions of integrated circuit device features U Okoroanyanwu, CY Yang, JA Shields US Patent 6,653,231, 2003 | 42 | 2003 |
