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Ondrej Pohorelec
Ondrej Pohorelec
Postdoc at Institute of Electrical Engineering SAS
Zweryfikowany adres z savba.sk - Strona główna
Tytuł
Cytowane przez
Cytowane przez
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GaAs nanomembranes in the high electron mobility transistor technology
D Gregušová, E Dobročka, P Eliáš, R Stoklas, M Blaho, O Pohorelec, ...
Materials 14 (13), 3461, 2021
62021
Investigation of interfaces and threshold voltage instabilities in normally-off MOS-gated InGaN/AlGaN/GaN HEMTs
O Pohorelec, M Ťapajna, D Gregušová, F Gucmann, S Hasenöhrl, ...
Applied Surface Science 528, 146824, 2020
52020
Creation of two‐dimensional electron gas and role of surface donors in iii‐n metal‐oxide‐semiconductor high‐electron mobility transistors
F Gucmann, M Ťapajna, O Pohorelec, Š Haščík, K Hušeková, J Kuzmík
physica status solidi (a) 215 (24), 1800090, 2018
52018
InGaN/(GaN)/AlGaN/GaN normally-off metal-oxide-semiconductor high-electron mobility transistors with etched access region
D Gregušová, L Tóth, O Pohorelec, S Hasenöhrl, Š Haščík, I Cora, ...
Japanese Journal of Applied Physics 58 (SC), SCCD21, 2019
42019
Mg Doping of N-Polar, In-Rich InAlN
J Kuzmík, O Pohorelec, S Hasenöhrl, M Blaho, R Stoklas, E Dobročka, ...
Materials 16 (6), 2250, 2023
32023
Technology and application of in-situ AlOx layers on III-V semiconductors
R Kúdela, J Šoltýs, M Kučera, R Stoklas, F Gucmann, M Blaho, M Mičušík, ...
Applied Surface Science 461, 33-38, 2018
22018
Effect of HCl pretreatment on the oxide/semiconductor interface state density in AlGaN/GaN MOS-HEMT structures with MOCVD grown A12O3 gate dielectric
M Ťapajna, K Hušeková, O Pohorelec, L Válik, S Haščík, F Gucmann, ...
2016 11th International Conference on Advanced Semiconductor Devices …, 2016
12016
Growth and performance of n++ GaN cap layer for HEMTs applications
J Kuzmík, M Blaho, D Gregušová, P Eliáš, O Pohorelec, S Hasenöhrl, ...
Materials Science in Semiconductor Processing 185, 108959, 2025
2025
Polarization engineering in GaN-based normally-off transistors
D Gregušová, O Pohorelec, M Ťapajna, M Blaho, F Gucmann, R Stoklas, ...
2021 IEEE International Meeting for Future Electron Devices, Kansai (IMFEDK …, 2021
2021
GaAs Nanomembranes in the High Electron Mobility Transistor Technology. Materials 2021, 14, 3461
D Gregušová, E Dobrocka, P Eliáš, R Stoklas, M Blaho, O Pohorelec, ...
s Note: MDPI stays neutral with regard to jurisdictional claims in published …, 2021
2021
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