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Andre Anders
Andre Anders
Leibniz Institute of Surface Engineering (IOM)
Zweryfikowany adres z iom-leipzig.de - Strona główna
Tytuł
Cytowane przez
Cytowane przez
Rok
A structure zone diagram including plasma-based deposition and ion etching
A Anders
Thin Solid Films 518 (15), 4087-4090, 2010
11542010
Cathodic Arcs: From Fractal Spots to Energetic Condensation
A Anders
Cathodic Arcs: From Fractal Spots to Energetic Condensation. New York …, 2008
10972008
Handbook of plasma immersion ion implantation and deposition
A Anders
Wiley, 2000
7752000
Dynamically modulating the surface plasmon resonance of doped semiconductor nanocrystals
G Garcia, R Buonsanti, EL Runnerstrom, RJ Mendelsberg, A Llordes, ...
Nano letters 11 (10), 4415-4420, 2011
6612011
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field
A Anders, GY Yushkov
Journal of Applied Physics 91 (8), 4824-4832, 2002
4892002
Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks
TY Tsui, GM Pharr, WC Oliver, CS Bhatia, RL White, S Anders, A Anders, ...
MRS Online Proceedings Library (OPL) 383, 447, 1995
4821995
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
A Anders, J Andersson, A Ehiasarian
Journal of applied physics 102 (11), 2007
4592007
Ion charge state distributions of vacuum arc plasmas: The origin of species
A Anders
Physical Review E 55 (1), 969, 1997
4441997
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
A Anders
Journal of Applied Physics 121 (17), 2017
4052017
Discharge physics of high power impulse magnetron sputtering
A Anders
Surface and Coatings Technology 205, S1-S9, 2011
3672011
Metal plasma immersion ion implantation and deposition: a review
A Anders
Surface and Coatings Technology 93 (2-3), 158-167, 1997
3651997
Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing
GM Pharr, DL Callahan, SD McAdams, TY Tsui, S Anders, A Anders, ...
Applied physics letters 68 (6), 779-781, 1996
3471996
Approaches to rid cathodic arc plasmas of macro-and nanoparticles: a review
A Anders
Surface and Coatings Technology 120, 319-330, 1999
3421999
A discussion on the absence of plasma in spark plasma sintering
DM Hulbert, A Anders, J Andersson, EJ Lavernia, AK Mukherjee
Scripta Materialia 60 (10), 835-838, 2009
3342009
A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
A Anders
Surface and Coatings Technology 257, 308-325, 2014
3222014
Review of cathodic arc deposition technology at the start of the new millennium
DM Sanders, A Anders
Surface and Coatings Technology 133, 78-90, 2000
3222000
Ion velocities in vacuum arc plasmas
GY Yushkov, A Anders, EM Oks, IG Brown
Journal of Applied Physics 88 (10), 5618-5622, 2000
3172000
The absence of plasma in “spark plasma sintering”
DM Hulbert, A Anders, DV Dudina, J Andersson, D Jiang, C Unuvar, ...
Journal of Applied Physics 104 (3), 2008
2912008
Plasma-based ion implantation and deposition: A review of physics, technology, and applications
J Pelletier, A Anders
IEEE Transactions on Plasma Science 33 (6), 1944-1959, 2005
2672005
Deposition rates of high power impulse magnetron sputtering: Physics and economics
A Anders
Journal of Vacuum Science & Technology A 28 (4), 783-790, 2010
2572010
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