Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ...
Thin solid films 513 (1-2), 1-24, 2006
1409 2006 High power impulse magnetron sputtering discharge JT Gudmundsson, N Brenning, D Lundin, U Helmersson
Journal of Vacuum Science & Technology A 30 (3), 2012
792 2012 On the film density using high power impulse magnetron sputtering M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ...
Surface and Coatings Technology 205 (2), 591-596, 2010
481 2010 Physics and technology of magnetron sputtering discharges JT Gudmundsson
Plasma Sources Science and Technology 29 (11), 113001, 2020
458 2020 The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ...
Thin Solid Films 515 (4), 1522-1526, 2006
401 2006 Oxygen discharges diluted with argon: dissociation processes JT Gudmundsson, EG Thorsteinsson
Plasma Sources Science and Technology 16 (2), 399, 2007
347 2007 Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ...
Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005
310 2005 Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson
Surface and Coatings Technology 161 (2-3), 249-256, 2002
280 2002 The low pressure Cl EGTJT Gudmundsson
Plasma Sources Science and Technology 19 (5), 055008, 2010
262 * 2010 Electronegativity of low-pressure high-density oxygen discharges JT Gudmundsson, IG Kouznetsov, KK Patel, MA Lieberman
Journal of Physics D: Applied Physics 34 (7), 1100, 2001
262 2001 On the effect of the electron energy distribution on the plasma parameters of an argon discharge: a global (volume-averaged) model study JT Gudmundsson
Plasma Sources Science and Technology 10 (1), 76, 2001
210 2001 Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson
Applied Physics Letters 78 (22), 3427-3429, 2001
189 2001 Variable sensitivity of plant communities in Iceland to experimental warming IS Jónsdóttir, B Magnusson, J Gudmundsson, A Elmarsdottir, H Hjartarson
Global Change Biology 11 (4), 553-563, 2005
183 2005 Organic carbon in Icelandic Andosols: geographical variation and impact of erosion H Óskarsson, Ó Arnalds, J Gudmundsson, G Gudbergsson
Catena 56 (1-3), 225-238, 2004
171 2004 Improved volume-averaged model for steady and pulsed-power electronegative discharges S Kim, MA Lieberman, AJ Lichtenberg, JT Gudmundsson
Journal of Vacuum Science & Technology A 24 (6), 2025-2040, 2006
158 2006 Spatial electron density distribution in a high-power pulsed magnetron discharge J Bohlmark, JT Gudmundsson, J Alami, M Latteman, U Helmersson
IEEE Transactions on Plasma Science 33 (2), 346-347, 2005
156 2005 Experimental studies of O2/Ar plasma in a planar inductive discharge JT Gudmundsson, T Kimura, MA Lieberman
Plasma Sources Science and Technology 8 (1), 22, 1999
148 1999 Plasma dynamics in a highly ionized pulsed magnetron discharge J Alami, JT Gudmundsson, J Bohlmark, J Birch, U Helmersson
Plasma Sources Science and Technology 14 (3), 525, 2005
142 2005 The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool JT Gudmundsson
Vacuum 84 (12), 1360-1364, 2010
140 2010 High power impulse magnetron sputtering: fundamentals, technologies, challenges and applications D Lundin, T Minea, JT Gudmundsson
Elsevier, 2019
138 2019 