Urmăriți
Ali Razavieh
Ali Razavieh
pSemi Corporation
Adresă de e-mail confirmată pe psemi.com
Titlu
Citat de
Citat de
Anul
Mimicking Neurotransmitter Release in Chemical Synapses via Hysteresis Engineering in MoS2 Transistors
AJ Arnold, A Razavieh, JR Nasr, DS Schulman, CM Eichfeld, S Das
ACS nano 11 (3), 3110-3118, 2017
2822017
14nm ferroelectric FinFET technology with steep subthreshold slope for ultra low power applications
Z Krivokapic, U Rana, R Galatage, A Razavieh, A Aziz, J Liu, J Shi, ...
2017 IEEE International Electron Devices Meeting (IEDM), 15.1. 1-15.1. 4, 2017
2622017
Challenges and limitations of CMOS scaling for FinFET and beyond architectures
A Razavieh, P Zeitzoff, EJ Nowak
IEEE Transactions on Nanotechnology 18, 999-1004, 2019
2432019
Sub-kT/q Switching in Strong Inversion in PbZr0.52Ti0.48O3 Gated Negative Capacitance FETs
S Dasgupta, A Rajashekhar, K Majumdar, N Agrawal, A Razavieh, ...
IEEE Journal on Exploratory Solid-State Computational Devices and Circuits 1 …, 2015
1542015
Channel geometry impact and narrow sheet effect of stacked nanosheet
CW Yeung, J Zhang, R Chao, O Kwon, R Vega, G Tsutsui, X Miao, ...
2018 IEEE international electron devices meeting (IEDM), 28.6. 1-28.6. 4, 2018
942018
Complementary FETs with wrap around contacts and method of forming same
J Frougier, R Xie, PH Suvarna, H Niimi, SJ Bentley, A Razavieh
US Patent 10,192,867, 2019
632019
Methods of forming a nano-sheet transistor device with a thicker gate stack and the resulting device
J Frougier, A Razavieh, R Xie, S Bentley
US Patent 9,991,352, 2018
472018
The prospect of two-dimensional heterostructures: a review of recent breakthroughs
DS Schulman, AJ Arnold, A Razavieh, J Nasr, S Das
IEEE Nanotechnology Magazine 11 (2), 6-17, 2017
372017
Effect of diameter variation on electrical characteristics of Schottky barrier indium arsenide nanowire field-effect transistors
A Razavieh, PK Mohseni, K Jung, S Mehrotra, S Das, S Suslov, X Li, ...
ACS nano 8 (6), 6281-6287, 2014
332014
Scaling challenges of FinFET architecture below 40nm contacted gate pitch
A Razavieh, P Zeitzoff, DE Brown, G Karve, EJ Nowak
2017 75th Annual Device Research Conference (DRC), 1-2, 2017
232017
Effective drive current in scaled FinFET and NSFET CMOS inverters
A Razavieh, Y Deng, P Zeitzoff, MR Na, J Frougier, G Karve, DE Brown, ...
2018 76th Device Research Conference (DRC), 1-2, 2018
212018
Complementary FETs with wrap around contacts and methods of forming same
J Frougier, R Xie, PH Suvarna, H Niimi, SJ Bentley, A Razavieh
US Patent 10,236,292, 2019
172019
FinFET with contact over active-gate for 5G ultra-wideband applications
A Razavieh, V Mahajan, WL Oo, S Cimino, SV Khokale, K Nagahiro, ...
2020 IEEE Symposium on VLSI Technology, 1-2, 2020
152020
Utilizing the unique properties of nanowire MOSFETs for RF applications
A Razavieh, S Mehrotra, N Singh, G Klimeck, D Janes, J Appenzeller
Nano letters 13 (4), 1549-1554, 2013
152013
Transconductance linearity analysis of 1-D, nanowire FETs in the quantum capacitance limit
A Razavieh, DB Janes, J Appenzeller
IEEE transactions on electron devices 60 (6), 2071-2076, 2013
122013
Negative-capacitance steep-switch field effect transistor with integrated bi-stable resistive system
J Frougier, N Loubet, R Xie, D Chanemougame, A Razavieh, K Cheng
US Patent 10,170,520, 2019
112019
Extremely-low threshold voltage FinFET for 5G mmWave applications
A Razavieh, Y Chen, T Ethirajan, M Gu, S Cimino, T Shimizu, MK Hassan, ...
IEEE Journal of the Electron Devices Society 9, 165-169, 2020
102020
A new method to achieve RF linearity in SOI nanowire MOSFETs
A Razavieh, N Singh, A Paul, G Klimeck, D Janes, J Appenzeller
2011 IEEE Radio Frequency Integrated Circuits Symposium, 1-4, 2011
102011
Steep-switch field effect transistor with integrated bi-stable resistive system
J Frougier, N Loubet, R Xie, D Chanemougame, A Razavieh, K Cheng
US Patent 10,256,316, 2019
42019
Titanium dioxide nanowire sensor array integration on CMOS platform using deterministic assembly
OZ Gall, X Zhong, DS Schulman, M Kang, A Razavieh, TS Mayer
Nanotechnology 28 (26), 265501, 2017
42017
Sistemul nu poate realiza operația în acest moment. Încercați din nou mai târziu.
Articole 1–20