| Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO2 SK Song, H Saare, GN Parsons Chemistry of Materials 31 (13), 4793-4804, 2019 | 95 | 2019 |
| Effect of reactant dosing on selectivity during area-selective deposition of TiO2 via integrated atomic layer deposition and atomic layer etching H Saare, SK Song, JS Kim, GN Parsons Journal of applied physics 128 (10), 2020 | 30 | 2020 |
| Comparative In Situ Study of the Initial Growth Trends of Atomic Layer-Deposited Al2O3 Films H Saare, G Dianat, GN Parsons The Journal of Physical Chemistry C 126 (16), 7036-7046, 2022 | 22 | 2022 |
| Characterization of EJ-200 plastic scintillators as active background shield for cosmogenic radiation AH Tkaczyk, H Saare, C Ipbüker, F Schulte, P Mastinu, J Paepen, ... Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2018 | 17 | 2018 |
| Characterisation of plastic scintillators used as an active background shield for neutron detection J Paepen, F Schulte, P Mastinu, B Pedersen, H Saare, P Schillebeeckx, ... JRC Tech Rep, 2016 | 4 | 2016 |
| Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride H Saare, W Xie, GN Parsons Journal of Vacuum Science & Technology A 41 (4), 2023 | 3 | 2023 |
| Methods for filling a recessed feature on a substrate and related structures YC Byun, H Saare, S Luiso, LEE Jaebeom US Patent App. 18/381,232, 2024 | | 2024 |
| Plasma-enhanced method of depositing molybdenum YC Byun, H Saare, S Datta US Patent App. 18/545,183, 2024 | | 2024 |
| Methods and assemblies for selectively depositing transition metals E Färm, JW Maes, C Dezelah, S Iwashita, A Saha, E Tois, M Tuominen, ... US Patent App. 18/367,500, 2024 | | 2024 |
| Atomic layer etching of metal oxides using novel co-reactants as halogenating agents for semiconductor fabrication R Kanjolia, J Woodruff, M Moinpour, C Dezelah, XIE Wenyi, H Saare, ... US Patent App. 18/187,055, 2023 | | 2023 |
| Metal-on-metal deposition methods for filling a gap feature on a substrate surface S Luiso, YC Byun, H Saare, LEE Jaebeom, S Datta, J Kim, P Raisanen, ... US Patent App. 18/148,687, 2023 | | 2023 |
| Investigations of Atomic Layer Deposition and Thermal Atomic Layer Etching: Nucleation Trends, Area-Selectivity, and Phase Change Memory Materials H Saare North Carolina State University, 2021 | | 2021 |
