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Eknath Sarkar
Eknath Sarkar
Adresă de e-mail confirmată pe gatech.edu - Pagina de pornire
Titlu
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Mobility enhancement and abnormal humps in top-gate self-aligned double-layer amorphous InGaZnO TFTs
MX Lee, JC Chiu, SL Li, E Sarkar, YC Chen, CC Yen, TL Chen, CH Chou, ...
IEEE Journal of the Electron Devices Society 10, 301-308, 2022
52022
First Demonstration of a-IGZO GAA Nanosheet FETs Featuring Achievable SS=61mV/dec,Ioff <-7 μA/μm, DIBL =44mV/V, Positive VT, and Process Temp. of 300 °C
JC Chiu, E Sarkar, YM Liu, YC Chen, YC Fan, CW Liu
2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2023
42023
Amorphous Oxide Semiconductors for Monolithic 3D Integrated Circuits
S Datta, E Sarkar, K Aabrar, S Deng, J Shin, A Raychowdhury, S Yu, ...
2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2024
32024
On the Reliability of High-Performance Dual Gate (DG) W-Doped In2O3 FET
KA Aabrar, H Park, SG Kirtania, E Sarkar, MA Al Mamun, S Deng, ...
2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2024
22024
Mobility Enhancement of BCE-Type Amorphous InGaZnO TFTs Using Triple-Layer Channels
JC Chiu, YM Liu, E Sarkar, YC Chen, YC Fan, CC Yen, TL Chen, ...
IEEE Transactions on Electron Devices 70 (8), 4194-4197, 2023
12023
Effects of Deep Trench Isolation Shape and Microlens Radius of Curvature on Optical and Electrical crosstalk in Backside Illuminated CMOS Image Sensors
E Sarkar, Y Ma, YC Lee, CW Liu
2023 International VLSI Symposium on Technology, Systems and Applications …, 2023
12023
(Digital Presentation) Negative Bias Illumination Stress on a-Igzo TFT with a Top Barrier
JC Chiu, E Sarkar, YM Liu, SL Li, MX Lee, YC Chen, CC Yen, TL Chen, ...
Electrochemical Society Meeting Abstracts 242, 1259-1259, 2022
12022
INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD THEREOF
J Chiu, Y Liu, E Sarkar, C Liu
US Patent App. 18/447,795, 2025
2025
First Demonstration of High-Performance and Extremely Stable W-Doped In2O3 Gate-All-Around (GAA) Nanosheet FET
E Sarkar, C Zhang, D Chakraborty, SG Kirtania, KA Aabrar, H Park, J Shin, ...
IEEE Transactions on Electron Devices, 2025
2025
Amorphous Indium Oxide Channel FeFETs with Write Voltage of 0.9V and Endurance >1012 for Refresh-Free 1T-1FeFET Embedded Memory
SG Kirtania, O Phadke, E Sarker, KA Aabrar, D Chakraborty, F Waqar, ...
2024 IEEE International Electron Devices Meeting (IEDM), 1-4, 2024
2024
First Demonstration of W-Doped In2O3 Gate-All-Around (GAA) Nanosheet FET with Improved Performance and Record Threshold Voltage Stability
E Sarkar, C Zhang, D Chakraborty, FG Waqar, S Kirtania, KA Aabrar, ...
2024 IEEE International Electron Devices Meeting (IEDM), 1-4, 2024
2024
Self-Healing Ferroelectric Capacitors with∼ 1000x Endurance Improvement at High Temperatures (85–125° C)
N Afroze, A Padovani, J Choi, PG Ravikumar, YH Kuo, C Zhang, T Song, ...
2024 IEEE International Electron Devices Meeting (IEDM), 1-4, 2024
2024
Photosensor
E Sarkar, Y Ma, YC Lee, CW Liu
US Patent App. 17/969,663, 2024
2024
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