Analysis of the parasitic S/D resistance in multiple-gate FETs A Dixit, A Kottantharayil, N Collaert, M Goodwin, M Jurczak, K De Meyer
IEEE Transactions on Electron Devices 52 (6), 1132-1140, 2005
449 2005 Bulk planar junctionless transistor (BPJLT): An attractive device alternative for scaling S Gundapaneni, S Ganguly, A Kottantharayil
IEEE Electron device letters 32 (3), 261-263, 2011
286 2011 Effect of band-to-band tunneling on junctionless transistors S Gundapaneni, M Bajaj, RK Pandey, KVRM Murali, S Ganguly, ...
IEEE Transactions on Electron Devices 59 (4), 1023-1029, 2012
259 2012 Multiple gate semiconductor device and method for forming same A Kottantharayil, R Loo
US Patent App. 10/899,659, 2005
192 2005 Enhanced Electrostatic Integrity of Short-Channel Junctionless Transistor With High- S Gundapaneni, S Ganguly, A Kottantharayil
IEEE Electron Device Letters 32 (10), 1325-1327, 2011
175 2011 Visual degradation in field-aged crystalline silicon PV modules in India and correlation with electrical degradation S Chattopadhyay, R Dubey, V Kuthanazhi, JJ John, CS Solanki, ...
IEEE Journal of photovoltaics 4 (6), 1470-1476, 2014
116 2014 Study of soiling loss on photovoltaic modules with artificially deposited dust of different gravimetric densities and compositions collected from different locations in India JJ John, S Warade, G Tamizhmani, A Kottantharayil
IEEE journal of photovoltaics 6 (1), 236-243, 2015
114 2015 Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography MJH Van Dal, N Collaert, G Doornbos, G Vellianitis, G Curatola, ...
2007 IEEE symposium on VLSI technology, 110-111, 2007
107 2007 Comprehensive study of performance degradation of field‐mounted photovoltaic modules in India R Dubey, S Chattopadhyay, V Kuthanazhi, A Kottantharayil, ...
Energy Science & Engineering 5 (1), 51-64, 2017
98 2017 Dual- HG Virani, RBR Adari, A Kottantharayil
IEEE transactions on electron devices 57 (10), 2410-2417, 2010
97 2010 A functional 41-stage ring oscillator using scaled FinFET devices with 25-nm gate lengths and 10-nm fin widths applicable for the 45-nm CMOS node N Collaert, A Dixit, M Goodwin, KG Anil, R Rooyackers, B Degroote, ...
IEEE Electron Device Letters 25 (8), 568-570, 2004
95 2004 Work function of Ni silicide phases on HfSiON and SiO/sub 2: NiSi, Ni/sub 2/Si, Ni/sub 31/Si/sub 12/, and Ni/sub 3/Si fully silicided gates JA Kittl, MA Pawlak, A Lauwers, C Demeurisse, K Opsomer, KG Anil, ...
IEEE electron device letters 27 (1), 34-36, 2005
87 2005 Performance improvement of tall triple gate devices with strained SiN layers N Collaert, A De Keersgieter, KG Anil, R Rooyackers, G Eneman, ...
IEEE electron device letters 26 (11), 820-822, 2005
66 2005 Layout density analysis of FinFETs KG Anil, K Henson, S Biesemans, N Collaert
ESSDERC'03. 33rd Conference on European Solid-State Device Research, 2003 …, 2003
66 2003 A CMOS compatible bulk FinFET-based ultra low energy leaky integrate and fire neuron for spiking neural networks D Chatterjee, A Kottantharayil
IEEE Electron Device Letters 40 (8), 1301-1304, 2019
65 2019 Mitigation of soiling by vertical mounting of bifacial modules S Bhaduri, A Kottantharayil
IEEE Journal of Photovoltaics 9 (1), 240-244, 2018
65 2018 GIDL (gate-induced drain leakage) and parasitic schottky barrier leakage elimination in aggressively scaled HfO/sub 2/TiN FinFET devices T Hoffmann, G Doornbos, I Ferain, N Collaert, P Zimmerman, M Goodwin, ...
IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest …, 2005
62 2005 Evaluation of soiling and potential mitigation approaches on photovoltaic glass A Einhorn, L Micheli, DC Miller, LJ Simpson, HR Moutinho, B To, ...
IEEE Journal of Photovoltaics 9 (1), 233-239, 2018
56 2018 Silicon tunneling field-effect transistors with tunneling in line with the gate field IA Fischer, ASM Bakibillah, M Golve, D Hahnel, H Isemann, ...
IEEE electron device letters 34 (2), 154-156, 2012
56 2012 Impact of stochastic mismatch on measured SRAM performance of FinFETs with resist/spacer-defined fins: Role of line-edge-roughness A Dixit, KG Anil, E Baravelli, P Roussel, A Mercha, C Gustin, M Bamal, ...
2006 International Electron Devices Meeting, 1-4, 2006
54 2006