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Vamseedhara Vemuri
Vamseedhara Vemuri
Подтвержден адрес электронной почты в домене intel.com
Название
Процитировано
Процитировано
Год
Two Keggin-based isostructural POMOF hybrids: synthesis, crystal structure, and catalytic properties
S Roy, V Vemuri, S Maiti, KS Manoj, U Subbarao, SC Peter
Inorganic chemistry 57 (19), 12078-12092, 2018
762018
Chemically designed CeO 2 nanoboxes boost the catalytic activity of Pt nanoparticles toward electro-oxidation of formic acid
S Ramani, S Sarkar, V Vemuri, SC Peter
Journal of Materials Chemistry A 5 (23), 11572-11576, 2017
352017
“Sacrificial protection in action!”: ultra-high stability of palladesite mineral towards the oxygen reduction reaction
SC Sarma, V Vemuri, V Mishra, SC Peter
Journal of Materials Chemistry A 7 (3), 979-984, 2019
192019
Deconvolution of phase–size–strain effects in metal carbide nanocrystals for enhanced hydrogen evolution
S Roy, D Bagchi, V Vemuri, SC Sarma, V Ahuja, V Rajaji, C Narayana, ...
Nanoscale 12 (28), 15414-15425, 2020
152020
“Breaking the O═O Bond”: Deciphering the Role of Each Element in Highly Durable CoPd2Se2 toward Oxygen Reduction Reaction
SC Sarma, V Mishra, V Vemuri, SC Peter
ACS Applied Energy Materials 3 (1), 231-239, 2019
142019
A Selectively Colorful yet Chilly Perspective on the Highs and Lows of Dielectric Materials for CMOS Nanoelectronics
S King, J Plombon, J Bielefeld, J Blackwell, S Vyas, R Chebiam, C Naylor, ...
2020 IEEE International Electron Devices Meeting (IEDM), 40.1. 1-40.1. 4, 2020
72020
Quartz crystal microbalance study of precursor diffusion during molecular layer deposition using cyclic azasilane, maleic anhydride, and water
L Ju, V Vemuri, NC Strandwitz
Journal of Vacuum Science & Technology A 37 (3), 2019
72019
Atomic layer deposition of MoOx thin films using Mo (iPrCp) 2H2 and O3
E Hendrix, BM Garland, V Vemuri, NC Strandwitz
Journal of Vacuum Science & Technology A 41 (3), 2023
52023
Comprehensive Study of the Chemical, Physical, and Structural Evolution of Molecular Layer Deposited Alucone Films during Thermal Processing
V Vemuri, SW King, WA Lanford, JT Gaskins, PE Hopkins, J Van Derslice, ...
Chemistry of Materials 35 (5), 1916-1925, 2023
22023
Chemical, Structural, and Electrical Changes in Molecular Layer-Deposited Hafnicone Thin Films after Thermal Processing
V Vemuri, SW King, R Thorpe, AH Jones, JT Gaskins, PE Hopkins, ...
ACS Applied Electronic Materials 6 (7), 5173-5182, 2024
12024
Developing Al & Hf Based Hybrid Molecular and Atomic Layer Deposited Films for Low-k Etch Stop Applications
V Vemuri
Lehigh University, 2024
2024
AVS 67 Session SS-Contributed On Demand: Surface Science Contributed On Demand Session
SSCO Demand, EM Anderson
Surface Science Division Room On Demand-Session SS-Contributed On Demand Surface Science Contributed On Demand Session
DS Enninful
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