Подписаться
Zhihui Cheng
Zhihui Cheng
Подтвержден адрес электронной почты в домене intel.com
Название
Процитировано
Процитировано
Год
How to report and benchmark emerging field-effect transistors
Z Cheng, CS Pang, P Wang, ST Le, Y Wu, D Shahrjerdi, I Radu, ...
Nature Electronics 5 (7), 416-423, 2022
1372022
Sub-60 mV/decade switching in 2D negative capacitance field-effect transistors with integrated ferroelectric polymer
FA McGuire, Z Cheng, K Price, AD Franklin
Applied Physics Letters 109 (9), 2016
1332016
Immunity to Contact Scaling in MoS2 Transistors Using in Situ Edge Contacts
Z Cheng, Y Yu, S Singh, K Price, SG Noyce, YC Lin, L Cao, AD Franklin
Nano letters 19 (8), 5077-5085, 2019
1222019
Electronic stability of carbon nanotube transistors under long-term bias stress
SG Noyce, JL Doherty, Z Cheng, H Han, S Bowen, AD Franklin
Nano letters 19 (3), 1460-1466, 2019
582019
Contacting and gating 2-D nanomaterials
Z Cheng, K Price, AD Franklin
IEEE Transactions on Electron Devices 65 (10), 4073-4083, 2018
372018
Capping Layers to Improve the Electrical Stress Stability of MoS2 Transistors
JL Doherty, SG Noyce, Z Cheng, H Abuzaid, AD Franklin
ACS applied materials & interfaces 12 (31), 35698-35706, 2020
342020
Are 2D interfaces really flat?
Z Cheng, H Zhang, ST Le, H Abuzaid, G Li, L Cao, AV Davydov, ...
ACS nano 16 (4), 5316-5324, 2022
242022
Convergent ion beam alteration of 2D materials and metal-2D interfaces
Z Cheng, H Abuzaid, Y Yu, F Zhang, Y Li, SG Noyce, NX Williams, YC Lin, ...
2D Materials 6 (3), 034005, 2019
222019
Modifying the Ni-MoS2 Contact Interface Using a Broad-Beam Ion Source
Z Cheng, JA Cardenas, F McGuire, S Najmaei, AD Franklin
IEEE Electron Device Letters 37 (9), 1234-1237, 2016
172016
Unanticipated polarity shift in edge-contacted tungsten-based 2D transition metal dichalcogenide transistors
H Abuzaid, Z Cheng, G Li, L Cao, AD Franklin
IEEE Electron Device Letters 42 (10), 1563-1566, 2021
132021
Distinct Contact Scaling Effects in MoS2 Transistors Revealed with Asymmetrical Contact Measurements
Z Cheng, J Backman, H Zhang, H Abuzaid, G Li, Y Yu, L Cao, ...
Advanced Materials 35 (21), 2210916, 2023
82023
Effects of gate stack composition and thickness in 2-D negative capacitance FETs
YC Lin, F McGuire, S Noyce, N Williams, Z Cheng, J Andrews, ...
IEEE Journal of the Electron Devices Society 7, 645-649, 2019
62019
New Observations in Contact Scaling for 2D FETs
Z Cheng, H Abuzaid, Y Yu, S Singh, L Cao, AD Franklin
2019 Device Research Conference (DRC), 227-228, 2019
32019
Using Ar Ion beam exposure to improve contact resistance in MoS2 FETs
Z Cheng, JA Cardenas, F McGuire, AD Franklin
Device Research Conference (DRC), 2016 74th Annual, 1-2, 2016
32016
A friend in need is a friend indeed: Acute tandem rope skipping enhances inter-brain synchrony of socially avoidant individuals
X Deng, Y Chen, K Chen, S Ludyga, Z Zhang, B Cheval, W Zhu, J Chen, ...
Brain and Cognition 180, 106205, 2024
22024
Linking 24-h movement behavior guidelines to cognitive difficulties, internalizing and externalizing problems in preterm youth
Z Cheng, A Aikeremu, Y Gao, Z Zhang, AD Paoli, PM Cunha, A Taylor, ...
International Journal of Mental Health Promotion 26, 651-662, 2024
22024
Validity and Reliability of the Physical Activity and Social Support Scale among Chinese College Students
J Chen, Z Cheng, F Herold, T Wang, J Kuang, A Taylor, L Zou
International Journal of Mental Health Promotion. https://doi. org/10.32604 …, 2023
22023
Modification and Scaling of Metal Contacts to 2D Materials Using an In-Situ Argon Ion Beam
Z Cheng
Duke University, 2019
12019
Psychometric evaluation of the exercise-related cognitive errors questionnaire among Chinese emerging adults
M Guo, J Kuang, T Wang, F Herold, A Taylor, JL Ng, MM Hossain, ...
Frontiers in Psychology 16, 1515859, 2025
2025
Validation of the CRAVE-C scale in Chinese adults: a four-study examination of competing motivations for physical activity versus rest
Z Cheng, A Taylor, MA Stults-Kolehmainen, M Gerber, F Herold, M Ross, ...
Frontiers in Psychology 15, 1467949, 2024
2024
В данный момент система не может выполнить эту операцию. Повторите попытку позднее.
Статьи 1–20