Enhanced AlGaN/GaN MOS-HEMT performance by using hydrogen peroxide oxidation technique HY Liu, BY Chou, WC Hsu, CS Lee, JK Sheu, CS Ho IEEE transactions on electron devices 60 (1), 213-220, 2012 | 76 | 2012 |
A Comparative Study of Amorphous, Anatase, Rutile, and Mixed Phase TiO2 Films by Mist Chemical Vapor Deposition and Ultraviolet Photodetectors Applications HY Liu, YL Hsu, HY Su, RC Huang, FY Hou, GC Tu, WH Liu IEEE Sensors Journal 18 (10), 4022-4029, 2018 | 52 | 2018 |
A study of ultrasonic spray pyrolysis deposited rutile-TiO2-based metal-semiconductor-metal ultraviolet photodetector HY Liu, WH Lin, WC Sun, SY Wei, SM Yu Materials Science in Semiconductor Processing 57, 90-94, 2017 | 42 | 2017 |
Novel oxide-passivated AlGaN/GaN HEMT by using hydrogen peroxide treatment HY Liu, BY Chou, WC Hsu, CS Lee, CS Ho IEEE transactions on electron devices 58 (12), 4430-4433, 2011 | 38 | 2011 |
Investigation of AlGaN/GaN Ion-Sensitive Heterostructure Field-Effect Transistors-Based pH Sensors With Al2O3 Surface Passivation and Sensing Membrane HY Liu, WC Hsu, WF Chen, CW Lin, YY Li, CS Lee, WC Sun, SY Wei, ... IEEE Sensors Journal 16 (10), 3514-3522, 2016 | 37 | 2016 |
Al2O3-Passivated AlGaN/GaN HEMTs by Using Nonvacuum Ultrasonic Spray Pyrolysis Deposition Technique BY Chou, HY Liu, WC Hsu, CS Lee, YS Wu, WC Sun, SY Wei, SM Yu IEEE Electron Device Letters 35 (9), 903-905, 2014 | 33 | 2014 |
Investigations of TiO2–AlGaN/GaN/Si-Passivated HFETs and MOS-HFETs Using Ultrasonic Spray Pyrolysis Deposition CS Lee, WC Hsu, BY Chou, HY Liu, CL Yang, WC Sun, SY Wei, SM Yu, ... IEEE Transactions on Electron Devices 62 (5), 1460-1466, 2015 | 32 | 2015 |
A simple passivation technique for AlGaN/GaN ultraviolet Schottky barrier photodetector HY Liu, WC Hsu, BY Chou, YH Wang IEEE Photonics Technology Letters 26 (2), 138-141, 2013 | 32 | 2013 |
A simple gate-dielectric fabrication process for AlGaN/GaN metal–oxide–semiconductor high-electron-mobility transistors HY Liu, BY Chou, WC Hsu, CS Lee, CS Ho IEEE electron device letters 33 (7), 997-999, 2012 | 32 | 2012 |
TiO2-Dielectric AlGaN/GaN/Si Metal-Oxide-Semiconductor High Electron Mobility Transistors by Using Nonvacuum Ultrasonic Spray Pyrolysis Deposition BY Chou, CS Lee, CL Yang, WC Hsu, HY Liu, MH Chiang, WC Sun, ... IEEE Electron Device Letters 35 (11), 1091-1093, 2014 | 31 | 2014 |
Investigation of temperature-dependent characteristics of AlGaN/GaN MOS-HEMT by using hydrogen peroxide oxidation technique HY Liu, WC Hsu, CS Lee, BY Chou, YB Liao, MH Chiang IEEE Transactions on Electron Devices 61 (8), 2760-2766, 2014 | 31 | 2014 |
Enhancement-mode tri-gate nanowire InAlN/GaN MOSHEMT for power applications YP Huang, WC Hsu, HY Liu, CS Lee IEEE Electron Device Letters 40 (6), 929-932, 2019 | 25 | 2019 |
TiO2-Based Metal–Semiconductor–Metal Ultraviolet Photodetectors Deposited by Ultrasonic Spray Pyrolysis Technique HY Liu, SH Hong, WC Sun, SY Wei, SM Yu IEEE Transactions on Electron Devices 63 (1), 79-85, 2015 | 24 | 2015 |
Enhanced Performances of AlGaN/GaN Ion-Sensitive Field-Effect Transistors Using H2O2-Grown Al2O3 for Sensing Membrane and Surface Passivation … HY Liu, WC Hsu, CS Lee, BY Chou, WF Chen IEEE Sensors Journal 15 (6), 3359-3366, 2015 | 24 | 2015 |
Investigations of AlGaN/AlN/GaN MOS-HEMTs on Si substrate by ozone water oxidation method HY Liu, CS Lee, WC Hsu, LY Tseng, BY Chou, CS Ho, CL Wu IEEE transactions on electron devices 60 (7), 2231-2237, 2013 | 24 | 2013 |
Amorphous ITZO thin-film transistors by using ultrasonic spray pyrolysis deposition HY Liu, WC Hsu, JH Chen, PH Hsu, CS Lee IEEE Transactions on Electron Devices 67 (3), 1009-1013, 2020 | 23 | 2020 |
Suppression of dark current on AlGaN/GaN metal–semiconductor–metal photodetectors HY Liu, YH Wang, WC Hsu IEEE Sensors Journal 15 (9), 5202-5207, 2015 | 23 | 2015 |
Comparative studies of AlGaN/GaN MOS-HEMTs with stacked gate dielectrics by the mixed thin film growth method BY Chou, WC Hsu, CS Lee, HY Liu, CS Ho Semiconductor science and technology 28 (7), 074005, 2013 | 23 | 2013 |
A Comparative Study of Metal–Semiconductor–Metal Ultraviolet Photodetectors Based on Ultrasonic Spray Pyrolysis Deposited Anatase and Rutile TiO2 HY Liu, GJ Liu IEEE Transactions on Electron Devices 64 (3), 1108-1113, 2017 | 20 | 2017 |
Integration of Gate Recessing and In Situ Cl− Doped Al2O3 for Enhancement-Mode AlGaN/GaN MOSHEMTs Fabrication HY Liu, CW Lin, WC Hsu, CS Lee, MH Chiang, WC Sun, SY Wei, SM Yu IEEE Electron Device Letters 38 (1), 91-94, 2016 | 20 | 2016 |