Sledovať
Sridhar Mahendrakar
Sridhar Mahendrakar
Senior Manager- Metrology at Western Digital Corp.
Overená e-mailová adresa na: wdc.com
Názov
Citované v
Citované v
Rok
Scatterometry-based metrology for SAQP pitch walking using virtual reference
T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ...
Metrology, inspection, and process control for microlithography XXX 9778 …, 2016
152016
Measurement system and method for measuring in thin films
C Bozdog, A Vaid, S Mahendrakar, M Hossain, T Kagalwala
US Patent 10,030,971, 2018
122018
Measuring self-aligned quadruple patterning pitch walking with scatterometry-based metrology utilizing virtual reference
T Kagalwala, A Vaid, S Mahendrakar, M Lenahan, F Fang, P Isbester, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (4), 044004-044004, 2016
102016
Gamma‐irradiation effects on polypropylene‐based composites with and without an internal lubricant
W Brostow, S Deshpande, K Fan, S Mahendrakar, D Pietkiewicz, ...
Polymer Engineering & Science 49 (5), 1035-1041, 2009
102009
Large scale in silico screening on grid infrastructures
N Jacq, V Breton, HY Chen, LY Ho, M Hofmann, HC Lee, Y Legre, SC Lin, ...
arXiv preprint cs/0611084, 2006
92006
Hybrid enabled thin film metrology using XPS and optical
A Vaid, G Iddawela, S Mahendrakar, M Lenahan, M Hossain, P Timoney, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
62016
Grid-enabled high throughput virtual screening
N Jacq, V Breton, HY Chen, LY Ho, M Hofmann, HC Lee, Y Legré, SC Lin, ...
Distributed, High-Performance and Grid Computing in Computational Biology …, 2007
52007
Measuring complex structures in semiconductor fabrication
S Mahendrakar, T Kagalwala, A Vaid, M Sendelbach
US Patent 10,664,638, 2020
3*2020
Complex metrology on 3D structures using multi-channel OCD
T Kagalwala, S Mahendrakar, A Vaid, PK Isbester, A Cepler, C Kang, ...
Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017
32017
Optical metrology solutions for 10nm films process control challenges
S Mahendrakar, A Vaid, K Venkataraman, M Lenahan, S Seipp, F Fang, ...
Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016
32016
Optical metrology strategies for inline 7nm CMOS logic product control
M Lenahan, S Mahendrakar, A Vaid, T Kagalwala, K Venkataraman, D Hu, ...
Metrology, Inspection, and Process Control for Microlithography XXXI 10145 …, 2017
22017
Maleic Anhydride grafted polypropylene coatings on steel: adhesion and wear, 2010
S MAHENDRAKAR, B Tech
Thesis (MSC)–University of North Texas, 0
2
Maleic anhydride grafted polypropylene coatings on steel: adhesion and wear
W Brostow
PhD thesis, University of North Texas, 2010
12010
Process control of semiconductor fabrication based on linkage between different fabrication steps
P Timoney, T Kagalwala, A Vaid, S Mahendrakar, D Dixit, S Yogev, ...
US Patent App. 16/288,152, 2020
2020
Manufacturing excellence using multi-platform ellipsometry thickness measurement fleet on advanced nodes
M Lenahan, A Vaid, S Mahendrakar, S Seipp, D Jayez, A Yueh, S Saxena, ...
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2016
2016
Systém momentálne nemôže vykonať operáciu. Skúste to neskôr.
Články 1–15