Silicon dioxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition RG Andosca, WJ Varhue, E Adams
Journal of applied physics 72 (3), 1126-1132, 1992
57 1992 Epitaxial film thickness in the low‐temperature growth of Si (100) by plasma enhanced chemical vapor deposition WJ Varhue, JL Rogers, PS Andry, E Adams
Applied physics letters 68 (3), 349-351, 1996
42 1996 Comparison of diamond-like carbon film deposition by electron cyclotron resonance with benzene and methane PS Andry, PW Pastel, WJ Varhue
Journal of materials research 11 (1), 221-228, 1996
41 1996 Erbium‐doped silicon films grown by plasma‐enhanced chemical‐vapor deposition JL Rogers, PS Andry, WJ Varhue, E Adams, M Lavoie, PB Klein
Journal of applied physics 78 (10), 6241-6248, 1995
39 1995 Growth of Er‐doped silicon using metalorganics by plasma‐enhanced chemical vapor deposition PS Andry, WJ Varhue, F Ladipo, K Ahmed, E Adams, M Lavoie, PB Klein, ...
Journal of applied physics 80 (1), 551-558, 1996
34 1996 A MEMS-Based Catalytic Microreactor for a H SJ Widdis, K Asante, DL Hitt, MW Cross, WJ Varhue, MR McDevitt
IEEE/ASME transactions on mechatronics 18 (4), 1250-1258, 2013
31 2013 Very-low-frequency electromagnetic field detector with data acquisition SA Hanna, Y Motai, WJ Varhue, S Titcomb
IEEE Transactions on Instrumentation and Measurement 58 (1), 129-140, 2008
29 2008 The effect of radio frequency substrate biasing in the deposition of diamond‐like carbon films in an electron cyclotron resonance discharge PW Pastel, WJ Varhue
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9 (3 …, 1991
28 1991 Deposition of Y2 O3 by plasma enhanced organometallic chemical vapor deposition using an electron cyclotron resonance source WJ Varhue, M Massimo, JM Carrulli, V Baranauskas, E Adams, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (4 …, 1993
27 1993 Raman scattering and the π‐orbitals in amorphous carbon films K Sinha, J Menendez, OF Sankey, DA Johnson, WJ Varhue, JN Kidder, ...
Applied physics letters 60 (5), 562-564, 1992
27 1992 Plasma enhanced CVD process for rapidly growing semiconductor films WJ Varhue
US Patent 6,313,017, 2001
26 2001 Structural evolution and characterization of heteroepitaxial GaSb thin films on Si (111) substrates T Nguyen, W Varhue, M Cross, R Pino, E Adams, M Lavoie, J Lee
Journal of applied physics 101 (7), 2007
25 2007 Low‐temperature homoepitaxial growth of Si by electron cyclotron resonance plasma enhanced chemical vapor deposition JL Rogers, PS Andry, WJ Varhue, P McGaughnea, E Adams, R Kontra
Applied physics letters 67 (7), 971-973, 1995
24 1995 Electron cyclotron resonance plasma etching of photoresist at cryogenic temperatures W Varhue, J Burroughs, W Mlynko
Journal of applied physics 72 (7), 3050-3057, 1992
24 1992 Diamond-like carbon films prepared by rf substrate biasing in an ECR discharge W Varhue, P Pastel
Journal of Materials Research 5 (11), 2441-2444, 1990
24 1990 Control of ruthenium oxide nanorod length in reactive sputtering MW Cross, WJ Varhue, DL Hitt, E Adams
Nanotechnology 19 (4), 045611, 2008
20 2008 Lamb-wave microdevices fabricated on monolithic single crystal silicon wafers D Fischer, WJ Varhue, J Wu, CA Whiting
Journal of Microelectromechanical systems 9 (1), 88-93, 2000
18 2000 Radiative melting of crystalline ruthenium oxide nanorods MW Cross, WJ Varhue
Nanotechnology 19 (43), 435705, 2008
17 2008 Low temperature growth of Si by PECVD WJ Varhue, PS Andry, JL Rogers, E Adams, R Kontra, M Lovioe
Solid State Technology 39 (6), 163-168, 1996
17 1996 Low temperature etching of silicon trenches with SF6 in an electron cyclotron resonance reactor AJ Watts, WJ Varhue
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10 (4 …, 1992
15 1992 