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Gudrun Kissinger
Gudrun Kissinger
Preverjeni e-poštni naslov na ihp-microelectronics.com
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Leto
Void-free silicon-wafer-bond strengthening in the 200–400 C range
G Kissinger, W Kissinger
Sensors and Actuators A: Physical 36 (2), 149-156, 1993
1441993
Hydrophilicity of silicon wafers for direct bonding
G Kissinger, W Kissinger
physica status solidi (a) 123 (1), 185-192, 1991
821991
Analytical modeling of the interaction of vacancies and oxygen for oxide precipitation in RTA treated silicon wafers
G Kissinger, J Dabrowski, A Sattler, C Seuring, T Müller, H Richter, ...
Journal of the Electrochemical Society 154 (6), H454, 2007
602007
A Method for Studying the Grown‐In Defect Density Spectra in Czochralski Silicon Wafers
G Kissinger, D Gräf, U Lambert, H Richter
Journal of the Electrochemical Society 144 (4), 1447, 1997
601997
Silicon, germanium, and their alloys: growth, defects, impurities, and nanocrystals
G Kissinger, S Pizzini
CRC Press, 2014
552014
Stepwise equilibrated graded GexSi1−x buffer with very low threading dislocation density on Si(001)
G Kissinger, T Morgenstern, G Morgenstern, H Richter
Applied physics letters 66 (16), 2083-2085, 1995
491995
Defects in as-grown silicon and their evolution during heat treatments
J Vanhellemont, E Dornberger, J Esfandyari, G Kissinger, MA Trauwaert, ...
Materials Science Forum 258, 341-346, 1997
401997
Investigation of the copper gettering mechanism of oxide precipitates in silicon
G Kissinger, D Kot, M Klingsporn, MA Schubert, A Sattler, T Müller
ECS Journal of Solid State Science and Technology 4 (9), N124, 2015
302015
Analysis of the nucleation kinetics of oxide precipitates in Czochralski silicon
G Kissinger, D Kot, J Dabrowski, V Akhmetov, A Sattler, W Von Ammon
ECS Transactions 16 (6), 97, 2008
282008
Interaction of oxygen with thermally induced vacancies in Czochralski silicon
V Akhmetov, G Kissinger, W Von Ammon
Applied Physics Letters 94 (9), 2009
272009
Key influence of the thermal history on process-induced defects in Czochralski silicon wafers
G Kissinger, D Gräf, U Lambert, T Grabolla, H Richter
Semiconductor science and technology 12 (7), 933, 1997
271997
Supercell-size convergence of formation energies and gap levels of vacancy complexes in crystalline silicon in density functional theory calculations
J Dabrowski, G Kissinger
Physical Review B 92 (14), 144104, 2015
262015
Denuded zone formation by conventional and rapid thermal anneals
G Kissinger, J Vanhellemont, G Obermeier, J Esfandyari
Materials Science and Engineering: B 73 (1-3), 106-110, 2000
242000
IR-LTS a powerful non-invasive tool to observe crystal defects in as-grown silicon, after device processing, and in heteroepitaxial layers
G Kissinger, H Richter, J Vanhellemont, C Claeys
Institute of Physics Publishing, Philadelphia, PA (United States), 1996
241996
Observation of stacking faults and prismatic punching systems in silicon by light scattering tomography
G Kissinger, J Vanhellemont, C Claeys, H Richter
Journal of crystal growth 158 (3), 191-196, 1996
241996
Measurement, modelling and simulation of defects in as-grown Czochralski silicon
J Vanhellemont, S Senkader, G Kissinger, V Higgs, MA Trauwaert, D Gräf, ...
Journal of crystal growth 180 (3-4), 353-362, 1997
231997
Load induced stresses and plastic deformation in 450mm silicon wafers
A Fischer, G Kissinger
Applied Physics Letters 91 (11), 2007
212007
Influence of Residual Point Defect Supersaturation on the Formation of Grown‐In Oxide Precipitate Nuclei in CZ‐Si
G Kissinger, J Vanhellemont, U Lambert, D Gräf, E Dornberger, H Richter
Journal of The Electrochemical Society 145 (5), L75, 1998
211998
Investigation of the composition of the Si/SiO2 interface in oxide precipitates and oxide layers on silicon by STEM/EELS
G Kissinger, MA Schubert, D Kot, T Grabolla
ECS Journal of Solid State Science and Technology 6 (7), N54, 2017
202017
Semiconductor wafer composed of monocrystalline silicon and method for producing it
T Mueller, G Kissinger, D Kot, A Sattler
US Patent 9,458,554, 2016
202016
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