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Elizabeth Buitrago
Elizabeth Buitrago
Hitachi Energy
Верификована је имејл адреса на hitachienergy.com - Почетна страница
Наслов
Навело
Навело
Година
Sensing with advanced computing technology: Fin field-effect transistors with high-k gate stack on bulk silicon
S Rigante, P Scarbolo, M Wipf, RL Stoop, K Bedner, E Buitrago, ...
ACS nano 9 (5), 4872-4881, 2015
822015
Improvements in resist performance towards EUV HVM
O Yildirim, E Buitrago, R Hoefnagels, M Meeuwissen, S Wuister, ...
Extreme Ultraviolet (EUV) Lithography VIII 10143, 153-164, 2017
712017
RF MEMS Shunt Capacitive Switches Using AlN Compared to Si3N4 Dielectric
M Fernández-Bolaños Badía, E Buitrago, AM Ionescu
IEEE, 2012
62*2012
Materials and processes for next generation lithography
A Robinson, R Lawson
Elsevier, 2016
612016
Junctionless silicon nanowire transistors for the tunable operation of a highly sensitive, low power sensor
E Buitrago, G Fagas, MFB Badia, YM Georgiev, M Berthomé, AM Ionescu
Sensors and Actuators B: Chemical 183, 1-10, 2013
502013
The top-down fabrication of a 3D-integrated, fully CMOS-compatible FET biosensor based on vertically stacked SiNWs and FinFETs
E Buitrago, M Fernandez-Bolanos, S Rigante, CF Zilch, NS Schröter, ...
Sensors and Actuators B: Chemical 193, 400-412, 2014
472014
SnOx high-efficiency EUV interference lithography gratings towards the ultimate resolution in photolithography
E Buitrago, R Fallica, D Fan, TS Kulmala, M Vockenhuber, Y Ekinci
Microelectronic Engineering 155, 44-49, 2016
452016
Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates
R Del Re, J Passarelli, M Sortland, B Cardineau, Y Ekinci, E Buitrago, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 14 (4), 043506-043506, 2015
432015
Nanoparticle synthesis and growth in a continuous plasma reactor from organosilicon precursors
C Roth, G Oberbossel, E Buitrago, R Heuberger, P Rudolf von Rohr
Plasma Processes and Polymers 9 (2), 119-134, 2012
362012
Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography
E Buitrago, S Nagahara, O Yildirim, H Nakagawa, S Tagawa, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033502-033502, 2016
322016
EUV lithography process challenges
E Buitrago, TS Kulmala, R Fallica, Y Ekinci
Frontiers of Nanoscience 11, 135-176, 2016
322016
Electrical characterization of high performance, liquid gated vertically stacked SiNW-based 3D FET biosensors
E Buitrago, MFB Badia, YM Georgiev, R Yu, O Lotty, JD Holmes, ...
Sensors and Actuators B: Chemical 199, 291-300, 2014
312014
Novel high sensitivity EUV photoresist for sub-7 nm node
T Nagai, H Nakagawa, T Naruoka, S Dei, S Tagawa, A Oshima, ...
Journal of Photopolymer Science and Technology 29 (3), 475-478, 2016
302016
Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure
S Nagahara, M Carcasi, H Nakagawa, E Buitrago, O Yildirim, G Shiraishi, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 40-57, 2016
292016
Carbon nanotube gas sensor array for multiplex analyte discrimination
H Guerin, H Le Poche, R Pohle, E Buitrago, MFB Badía, J Dijon, ...
Sensors and Actuators B: Chemical 207, 833-842, 2015
252015
Evaluation of EUV resist performance using interference lithography
E Buitrago, O Yildirim, C Verspaget, N Tsugama, R Hoefnagels, ...
Extreme Ultraviolet (EUV) Lithography VI 9422, 585-597, 2015
242015
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher …
S Nagahara, M Carcasi, G Shiraishi, H Nakagawa, S Dei, T Shiozawa, ...
Advances in Patterning Materials and Processes XXXIV 10146, 96-109, 2017
232017
State-of-the-art EUV materials and processes for the 7nm node and beyond
E Buitrago, M Meeuwissen, O Yildirim, R Custers, R Hoefnagels, ...
Extreme Ultraviolet (EUV) Lithography VIII 10143, 170-177, 2017
232017
Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility
D Fan, E Buitrago, S Yang, W Karim, Y Wu, R Tai, Y Ekinci
Microelectronic Engineering 155, 55-60, 2016
232016
High-yield, in-situ fabrication and integration of horizontal carbon nanotube arrays at the wafer scale for robust ammonia sensors
H Guerin, H Le Poche, R Pohle, LS Bernard, E Buitrago, R Ramos, ...
Carbon 78, 326-338, 2014
222014
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