| Highly efficient planarization of sliced 4H–SiC (0001) wafer by slurryless electrochemical mechanical polishing X Yang, X Yang, K Kawai, K Arima, K Yamamura International Journal of Machine Tools and Manufacture 144, 103431, 2019 | 74 | 2019 |
| Investigation of anodic oxidation mechanism of 4H-SiC (0001) for electrochemical mechanical polishing X Yang, R Sun, Y Ohkubo, K Kawai, K Arima, K Endo, K Yamamura Electrochimica Acta 271, 666-676, 2018 | 64 | 2018 |
| Metal-assisted chemical etching of Ge (100) surfaces in water toward nanoscale patterning T Kawase, A Mura, K Dei, K Nishitani, K Kawai, J Uchikoshi, M Morita, ... Nanoscale research letters 8 (1), 151, 2013 | 60 | 2013 |
| Damage-free highly efficient plasma-assisted polishing of a 20-mm square large mosaic single crystal diamond substrate N Liu, K Sugawara, N Yoshitaka, H Yamada, D Takeuchi, Y Akabane, ... Scientific Reports 10 (1), 19432, 2020 | 50 | 2020 |
| Efficient and slurryless ultrasonic vibration assisted electrochemical mechanical polishing for 4H–SiC wafers X Yang, X Yang, H Gu, K Kawai, K Arima, K Yamamura Ceramics International 48 (6), 7570-7583, 2022 | 47 | 2022 |
| Chemical etching of a semiconductor surface assisted by single sheets of reduced graphene oxide T Hirano, K Nakade, S Li, K Kawai, K Arima Carbon 127, 681-687, 2018 | 46 | 2018 |
| Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing N Liu, K Sugimoto, N Yoshitaka, H Yamada, R Sun, K Kawai, K Arima, ... Diamond and Related Materials 124, 108899, 2022 | 38 | 2022 |
| Obtaining atomically smooth 4H–SiC (0001) surface by controlling balance between anodizing and polishing in electrochemical mechanical polishing X Yang, X Yang, R Sun, K Kawai, K Arima, K Yamamura Nanomanufacturing and Metrology 2, 140-147, 2019 | 38 | 2019 |
| Novel SiC wafer manufacturing process employing three-step slurryless electrochemical mechanical polishing X Yang, X Yang, K Kawai, K Arima, K Yamamura Journal of Manufacturing Processes 70, 350-360, 2021 | 36 | 2021 |
| Dominant factors and their action mechanisms on material removal rate in electrochemical mechanical polishing of 4H-SiC (0001) surface X Yang, X Yang, K Kawai, K Arima, K Yamamura Applied Surface Science 562, 150130, 2021 | 36 | 2021 |
| Ultrasonic-assisted anodic oxidation of 4H-SiC (0001) surface X Yang, X Yang, K Kawai, K Arima, K Yamamura Electrochemistry Communications 100, 1-5, 2019 | 36 | 2019 |
| Catalytic behavior of metallic particles in anisotropic etching of Ge (100) surfaces in water mediated by dissolved oxygen T Kawase, A Mura, K Nishitani, Y Kawai, K Kawai, J Uchikoshi, M Morita, ... Journal of Applied Physics 111 (12), 2012 | 30 | 2012 |
| Cyanobacterial cell lineage analysis of the spatiotemporal hetR expression profile during heterocyst pattern formation in Anabaena sp. PCC 7120 H Asai, S Iwamori, K Kawai, S Ehira, J Ishihara, K Aihara, S Shoji, ... PLoS One 4 (10), e7371, 2009 | 30 | 2009 |
| High-quality plasma-assisted polishing of aluminum nitride ceramic R Sun, X Yang, K Arima, K Kawai, K Yamamura CIRP annals 69 (1), 301-304, 2020 | 29 | 2020 |
| Surface modification and microstructuring of 4H-SiC (0001) by anodic oxidation with sodium chloride aqueous solution X Yang, R Sun, K Kawai, K Arima, K Yamamura ACS Applied Materials & Interfaces 11 (2), 2535-2542, 2018 | 24 | 2018 |
| Flow control methods and devices in micrometer scale channels S Shoji, K Kawai Microfluidics: Technologies and Applications, 1-25, 2011 | 24 | 2011 |
| Catalytic properties of chemically modified graphene sheets to enhance etching of Ge surface in water R Mikurino, A Ogasawara, T Hirano, Y Nakata, H Yamashita, S Li, ... The Journal of Physical Chemistry C 124 (11), 6121-6129, 2020 | 22 | 2020 |
| Etching Characteristics of Quartz Crystal Wafers Using Argon-Based Atmospheric Pressure CF4 Plasma Stabilized by Ethanol Addition R Sun, X Yang, K Watanabe, S Miyazaki, T Fukano, M Kitada, K Arima, ... Nanomanufacturing and Metrology 2, 168-176, 2019 | 20 | 2019 |
| Comparison of surface and subsurface damage of mosaic single-crystal diamond substrate processed by mechanical and plasma-assisted polishing N Liu, H Yamada, N Yoshitaka, K Sugimoto, R Sun, K Kawai, K Arima, ... Diamond and Related Materials 119, 108555, 2021 | 19 | 2021 |
| Comparative study of GeO2/Ge and SiO2/Si structures on anomalous charging of oxide films upon water adsorption revealed by ambient-pressure X-ray photoelectron spectroscopy D Mori, H Oka, T Hosoi, K Kawai, M Morita, EJ Crumlin, Z Liu, ... Journal of Applied Physics 120 (9), 2016 | 19 | 2016 |
