Scott W. Schmucker

Alıntı yapanlar

	Hepsi	2020 yılından bugüne
Alıntılar	1630	714
h-endeksi	19	15
i10-endeksi	24	19

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28 makale

3 makale

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Finansman sağlayan kuruluşun getirdiği zorunluluğa dayalı olarak

Katkıda bulunan yazarlar

Joseph W. LydingProfessor of Electrical and Computer Engineering, University of Illinoisillinois.edu üzerinde doğrulanmış e-posta adresine sahip
Shashank MisraSandia National Laboratoriessandia.gov üzerinde doğrulanmış e-posta adresine sahip
Joshua D. WoodPrincipal Solutions Engineer, Dynatracedynatrace.com üzerinde doğrulanmış e-posta adresine sahip
Evan M AndersonSandia National Labs, University of Michigansandia.gov üzerinde doğrulanmış e-posta adresine sahip
Tzu-Ming LuSandia National Laboratoriessandia.gov üzerinde doğrulanmış e-posta adresine sahip
Richard SilverNISTnist.gov üzerinde doğrulanmış e-posta adresine sahip
Jon Wyricknist.gov üzerinde doğrulanmış e-posta adresine sahip
Pradeep NamboodiriPhysicistnist.gov üzerinde doğrulanmış e-posta adresine sahip
Ranjit KashidScientist, Centre for Materials for Electronics Technologycmet.gov.in üzerinde doğrulanmış e-posta adresine sahip
Cory D. CressMaterials Research Engineer, Naval Research Laboratorynrl.navy.mil üzerinde doğrulanmış e-posta adresine sahip
Ezra BussmannSandia National Laboratoriessandia.gov üzerinde doğrulanmış e-posta adresine sahip
Jeremy T RobinsonUS Naval Research Laboratorynrl.navy.mil üzerinde doğrulanmış e-posta adresine sahip
Eric PopPease-Ye Professor of Electrical Engineering, MSE, AP at Stanford & SLACstanford.edu üzerinde doğrulanmış e-posta adresine sahip
John N. RandallZyvex Labszyvexlabs.com üzerinde doğrulanmış e-posta adresine sahip
Adam L FriedmanLaboratory for Physical Sciences, University of Maryland, Naval Research Laboratorylps.umd.edu üzerinde doğrulanmış e-posta adresine sahip
Michael StewartPhysicist, National Institute of Standards and Technologynist.gov üzerinde doğrulanmış e-posta adresine sahip
Kevin HeGraduate Student, UIUCillinois.edu üzerinde doğrulanmış e-posta adresine sahip
N. AluruMechanical Engineering, Oden Institute, University of Texas at Austin | Previous: UIUC |utexas.edu üzerinde doğrulanmış e-posta adresine sahip
Mark HersamNorthwestern Universitynorthwestern.edu üzerinde doğrulanmış e-posta adresine sahip
Heather ArnoldNorthwestern Universityu.northwestern.edu üzerinde doğrulanmış e-posta adresine sahip

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Scott W. Schmucker

Sandia National Laboratories

sandia.gov üzerinde doğrulanmış e-posta adresine sahip - Ana Sayfa

Scanning tunneling microscopy atomically-precise manufacturing nanolithography surface science


Başlık Alıntılara göre sırala Yıla göre sırala Başlığa göre sırala	Alıntı yapanlar Alıntı yapanlar	Yıl
Effects of polycrystalline Cu substrate on graphene growth by chemical vapor deposition JD Wood, SW Schmucker, AS Lyons, E Pop, JW Lyding Nano letters 11 (11), 4547-4554, 2011	587	2011
Role of Pressure in the Growth of Hexagonal Boron Nitride Thin Films from Ammonia-Borane JC Koepke, JD Wood, Y Chen, SW Schmucker, X Liu, NN Chang, ... Chemistry of Materials 28 (12), 4169-4179, 2016	115	2016
Electronic hybridization of large-area stacked graphene films JT Robinson, SW Schmucker, CB Diaconescu, JP Long, JC Culbertson, ... ACS nano 7 (1), 637-644, 2012	109	2012
Atomic precision lithography on Si JN Randall, JW Lyding, S Schmucker, JR Von Ehr, J Ballard, R Saini, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009	80	2009
Nitrogen-Doped Graphene and Twisted Bilayer Graphene via Hyperthermal Ion Implantation with Depth Control CD Cress, SW Schmucker, AL Friedman, P Dev, JC Culbertson, ... ACS nano 10 (3), 3714-3722, 2016	78	2016
Inducing electronic changes in graphene through silicon (100) substrate modification Y Xu, KT He, SW Schmucker, Z Guo, JC Koepke, JD Wood, JW Lyding, ... Nano letters 11 (7), 2735-2742, 2011	75	2011
Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography SW Schmucker, N Kumar, JR Abelson, SR Daly, GS Girolami, MR Bischof, ... Nature communications 3 (1), 935, 2012	68	2012
Atom‐by‐Atom Fabrication of Single and Few Dopant Quantum Devices J Wyrick, X Wang, RV Kashid, P Namboodiri, SW Schmucker, ... Advanced Functional Materials, 1903475, 2019	64	2019
Atomic precision advanced manufacturing for digital electronics DR Ward, SW Schmucker, EM Anderson, E Bussmann, L Tracy, TM Lu, ... EDFA Technical Articles 22 (1), 4-10, 2020	44	2020
Removal of sodium dodecyl sulfate surfactant from aqueous dispersions of single-wall carbon nanotubes JE Rossi, KJ Soule, E Cleveland, SW Schmucker, CD Cress, ND Cox, ... Journal of Colloid and Interface Science 495, 140-148, 2017	39	2017
Atomic-scale control of tunneling in donor-based devices X Wang, J Wyrick, RV Kashid, P Namboodiri, SW Schmucker, A Murphy, ... Communications Physics 3 (1), 82, 2020	32	2020
Reducing flicker noise in chemical vapor deposition graphene field-effect transistors HN Arnold, VK Sangwan, SW Schmucker, CD Cress, KA Luck, ... Applied Physics Letters 108 (7), 2016	31	2016
Electronic transport and localization in nitrogen-doped graphene devices using hyperthermal ion implantation AL Friedman, CD Cress, SW Schmucker, JT Robinson, OMJ van‘t Erve Physical Review B 93 (16), 161409, 2016	28	2016
Raman signature of defected twisted bilayer graphene SW Schmucker, CD Cress, JC Culbertson, JW Beeman, OD Dubon, ... Carbon 93, 250-257, 2015	28	2015
Vacuum ultraviolet radiation effects on two-dimensional MoS2 field-effect transistors JJ McMorrow, CD Cress, HN Arnold, VK Sangwan, D Jariwala, ... Applied Physics Letters 110 (7), 2017	25	2017
Atomic precision patterning on Si: An opportunity for a digitized process JN Randall, JB Ballard, JW Lyding, S Schmucker, JR Von Ehr, R Saini, ... Microelectronic Engineering 87 (5-8), 955-958, 2010	24	2010
Nanometer-scale sharpening of conductor tips JW Lyding, SW Schmucker US Patent 8,070,920, 2011	23	2011
Atom-by-atom construction of a cyclic artificial molecule in silicon J Wyrick, X Wang, P Namboodiri, SW Schmucker, RV Kashid, RM Silver Nano letters 18 (12), 7502-7508, 2018	22	2018
Tunable Radiation Response in Hybrid Organic–Inorganic Gate Dielectrics for Low-Voltage Graphene Electronics HN Arnold, CD Cress, JJ McMorrow, SW Schmucker, VK Sangwan, ... ACS applied materials & interfaces 8 (8), 5058-5064, 2016	19	2016
Low-resistance, high-yield electrical contacts to atom scale Si:P devices using palladium silicide SW Schmucker, PN Namboodiri, R Kashid, X Wang, B Hu, JE Wyrick, ... Physical Review Applied, 2019	16	2019

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