Takip et
Zhitian Shi
Zhitian Shi
University of Cambridge; ETH Zurich
cam.ac.uk üzerinde doğrulanmış e-posta adresine sahip
Başlık
Alıntı yapanlar
Alıntı yapanlar
Yıl
Towards the fabrication of high-aspect-ratio silicon gratings by deep reactive ion etching
Z Shi, K Jefimovs, L Romano, M Stampanoni
Micromachines 11 (9), 864, 2020
552020
Pushing the limits of bottom-up gold filling for x-ray grating interferometry
D Josell, Z Shi, K Jefimovs, L Romano, J Vila-Comamala, TP Moffat
Journal of The Electrochemical Society 167 (13), 132504, 2020
262020
High mechanical endurance RRAM based on amorphous gadolinium oxide for flexible nonvolatile memory application
H Zhao, H Tu, F Wei, Z Shi, Y Xiong, Y Zhang, J Du
Journal of Physics D: Applied Physics 48 (20), 205104, 2015
222015
High aspect ratio arrays of Si nano-pillars using displacement Talbot lithography and gas-MacEtch
Z Shi, K Jefimovs, M Stampanoni, L Romano
Materials Science in Semiconductor Processing 157, 107311, 2023
192023
Fabrication of x-ray gratings for interferometric imaging by conformal seedless gold electroplating
K Jefimovs, J Vila-Comamala, C Arboleda, Z Wang, L Romano, Z Shi, ...
Micromachines 12 (5), 517, 2021
192021
Chemical vapor deposition growth and transport properties of MoS2–2H thin layers using molybdenum and sulfur as precursors
ZT Shi, HB Zhao, XQ Chen, GM Wu, F Wei, HL Tu
Rare Metals, 1-5, 2022
172022
Increased dose efficiency of breast CT with grating interferometry
M Rawlik, A Pereira, S Spindler, Z Wang, L Romano, K Jefimovs, Z Shi, ...
Optica 10 (7), 938-943, 2023
142023
High aspect ratio tilted gratings through local electric field modulation in plasma etching
Z Shi, K Jefimovs, A La Magna, M Stampanoni, L Romano
Applied Surface Science 588, 152938, 2022
142022
Fast acquisition protocol for X-ray scattering tensor tomography
J Kim, M Kagias, F Marone, Z Shi, M Stampanoni
Scientific Reports 11 (1), 23046, 2021
132021
Optimization of displacement Talbot lithography for fabrication of uniform high aspect ratio gratings
Z Shi, K Jefimovs, L Romano, M Stampanoni
Japanese Journal of Applied Physics 60 (SC), SCCA01, 2021
122021
Bottom-up gold filling in new geometries and yet higher aspect ratio gratings for hard X-ray interferometry
D Josell, Z Shi, K Jefimovs, VA Guzenko, C Beauchamp, L Peer, ...
Journal of the Electrochemical Society 168 (8), 082508, 2021
102021
Laboratory x-ray interferometry imaging with a fan-shaped source grating
Z Shi, K Jefimovs, L Romano, J Vila-Comamala, M Stampanoni
Optics Letters 46 (15), 3693-3696, 2021
92021
The choice of an autocorrelation length in dark-field lung imaging
S Spindler, D Etter, M Rawlik, M Polikarpov, L Romano, Z Shi, K Jefimovs, ...
Scientific Reports 13 (1), 2731, 2023
72023
Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating
Z Shi, D Josell, K Jefimovs, L Romano, TP Moffat, M Stampanoni, ...
Applied optics 61 (13), 3850-3854, 2022
72022
Refraction beats attenuation in breast CT
M Rawlik, A Pereira, S Spindler, Z Wang, L Romano, K Jefimovs, Z Shi, ...
arXiv preprint arXiv:2301.00455, 2023
52023
Envelope modulated x-ray grating interferometry
A Pandeshwar, M Kagias, Z Shi, M Stampanoni
Applied Physics Letters 120 (19), 2022
52022
Benchmarking Reconstructive Spectrometer with Multiresonant Cavities
C Yao, K Xu, T Lin, J Ma, C Yao, P Bao, Z Shi, R Penty, Q Cheng
ACS photonics 11 (9), 3730-3740, 2024
42024
Implementation of a dual-phase grating interferometer for multi-scale characterization of building materials by tunable dark-field imaging
C Organista, R Tang, Z Shi, K Jefimovs, D Josell, L Romano, S Spindler, ...
Scientific Reports 14 (1), 384, 2024
42024
Optimization of the visibility of a tunable dual-phase x-ray grating interferometer
C Organista, M Kagias, R Tang, Z Shi, K Jefimovs, MN Boone, ...
Optics Continuum 2 (1), 232-248, 2023
42023
Investigations on black silicon nanostructures fabricated by reactive ion etching on highly curved surfaces
D Schmelz, T Käsebier, Z Shi, Q Cheng, N Sergeev, D Schelle, U Zeitner
Materials Science in Semiconductor Processing 165, 107646, 2023
22023
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Makaleler 1–20