A comparative study of oxygen/organosilicon plasmas and thin SiOxCyHz films deposited in a helicon reactor K Aumaille, C Vallée, A Granier, A Goullet, F Gaboriau, G Turban
Thin Solid Films 359 (2), 188-196, 2000
187 2000 Diagnostics in helicon plasmas for deposition A Granier, F Nicolazo, C Vallée, A Goullet, G Turban, B Grolleau
Plasma Sources Science and Technology 6 (2), 147, 1997
115 1997 Impedance and electric modulus study of amorphous TiTaO thin films: highlight of the interphase effect A Rouahi, A Kahouli, F Challali, MP Besland, C Vallée, B Yangui, ...
Journal of Physics D: Applied Physics 46 (6), 065308, 2013
89 2013 Inorganic to organic crossover in thin films deposited from O2/TEOS plasmas C Vallée, A Goullet, A Granier, A van Der Lee, J Durand, C Marliere
Journal of non-crystalline solids 272 (2-3), 163-173, 2000
85 2000 Characterization of silicon dioxide films deposited at low pressure and temperature in a helicon diffusion reactor C Charles, G Giroult‐Matlakowski, RW Boswell, A Goullet, G Turban, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (6 …, 1993
80 1993 Optical spectroscopic analyses of OH incorporation into A Goullet, C Vallee, A Granier, G Turban
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (5 …, 2000
74 2000 Silicon dioxide deposition in a microwave plasma reactor N Benissad, C Boisse-Laporte, C Vallée, A Granier, A Goullet
Surface and Coatings Technology 116, 868-873, 1999
69 1999 Ellipsometry and Raman study on hydrogenated amorphous carbon (aC: H) films deposited in a dual ECR-rf plasma J Hong, A Goullet, G Turban
Thin solid films 352 (1-2), 41-48, 1999
52 1999 Optical characterization of hydrogenated amorphous carbon (aC: H) thin films deposited from methane plasma J Hong, A Goullet, G Turban
Thin Solid Films 364 (1-2), 144-149, 2000
49 2000 Nitrogen doping on NiO by reactive magnetron sputtering: A new pathway to dynamically tune the optical and electrical properties J Keraudy, A Ferrec, M Richard-Plouet, J Hamon, A Goullet, PY Jouan
Applied Surface Science 409, 77-84, 2017
48 2017 Quantitative infrared analysis of the stretching peak of SiO2 films deposited from tetraethoxysilane plasmas A Goullet, C Charles, P Garcia, G Turban
Journal of applied physics 74 (11), 6876-6882, 1993
44 1993 Structural, morphological and electrical properties of nickel oxide thin films deposited by reactive sputtering J Keraudy, JG Molleja, A Ferrec, B Corraze, M Richard-Plouet, A Goullet, ...
Applied surface science 357, 838-844, 2015
42 2015 In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition D Li, M Carette, A Granier, JP Landesman, A Goullet
Applied Surface Science 283, 234-239, 2013
42 2013 Analysis of low-k organosilicon and low-density silica films deposited in HMDSO plasmas G Borvon, A Goullet, A Granier, G Turban
Plasmas and polymers 7 (4), 341-352, 2002
41 2002 In situ ellipsometry and infrared analysis of PECVD SiO2 films deposited in an O2/TEOS helicon reactor C Vallee, A Goullet, F Nicolazo, A Granier, G Turban
Journal of non-crystalline solids 216, 48-54, 1997
41 1997 Electrical properties of low-dielectric-constant films prepared by PECVD in O2/CH4/HMDSO G Borvon, A Goullet, X Mellhaoui, N Charrouf, A Granier
Materials Science in Semiconductor Processing 5 (2-3), 279-284, 2002
40 2002 Carbon nanotubes and nanostructures grown from diamond-like carbon and polyethylene D Sarangi, C Godon, A Granier, R Moalic, A Goullet, G Turban, O Chauvet
Applied Physics A 73, 765-768, 2001
39 2001 Effect of surface preparation and interfacial layer on the quality of SiO2/GaN interfaces EA Alam, I Cortes, MP Besland, A Goullet, L Lajaunie, P Regreny, ...
Journal of Applied Physics 109 (8), 2011
37 2011 Structure and properties of silicon oxide films deposited in a dual microwave-rf plasma reactor N Benissad, K Aumaille, A Granier, A Goullet
Thin Solid Films 384 (2), 230-235, 2001
37 2001 Study of oxygen/TEOS plasmas and thin SiOx films obtained in an helicon diffusion reactor F Nicolazo, A Goullet, A Granier, C Vallee, G Turban, B Grolleau
Surface and Coatings Technology 98 (1-3), 1578-1583, 1998
37 1998 