Microscopic structure of the /Si interface FJ Himpsel, FR McFeely, A Taleb-Ibrahimi, JA Yarmoff, G Hollinger
Physical review B 38 (9), 6084, 1988
2292 1988 Arsenic (III) and arsenic (V) reactions with zerovalent iron corrosion products BA Manning, ML Hunt, C Amrhein, JA Yarmoff
Environmental science & technology 36 (24), 5455-5461, 2002
573 2002 Valence electronic structure of JA Yarmoff, DR Clarke, W Drube, UO Karlsson, A Taleb-Ibrahimi, ...
Physical Review B 36 (7), 3967, 1987
288 1987 Electronic structure of the /Si(111) interface D Rieger, FJ Himpsel, UO Karlsson, FR McFeely, JF Morar, JA Yarmoff
Physical Review B 34 (10), 7295, 1986
223 1986 The chemisorption of chlorosilanes and chlorine on Si (111) 7× 7 LJ Whitman, SA Joyce, JA Yarmoff, FR McFeely, LJ Terminello
Surface science 232 (3), 297-306, 1990
186 1990 Removal of contaminants from aqueous solution by reaction with iron surfaces SR Qiu, HF Lai, MJ Roberson, ML Hunt, C Amrhein, LC Giancarlo, ...
Langmuir 16 (5), 2230-2236, 2000
174 2000 Impact-collision ion-scattering spectroscopy of Cu(110) and Cu(110)-(2×1)-O using 5-keV JA Yarmoff, DM Cyr, JH Huang, S Kim, RS Williams
Physical Review B 33 (6), 3856, 1986
130 1986 Determination of Interface States for Ca /Si(111) from Near-Edge X-Ray-Absorption Measurements FJ Himpsel, UO Karlsson, JF Morar, D Rieger, JA Yarmoff
Physical review letters 56 (14), 1497, 1986
115 1986 Resonant neutralization of 7Li+ scattered from alkali/Al (100) as a probe of the local electrostatic potential CB Weare, JA Yarmoff
Surface science 348 (3), 359-369, 1996
113 1996 Fine structure of the Ca 2p x-ray-absorption edge for bulk compounds, surfaces, and interfaces FJ Himpsel, UO Karlsson, AB McLean, LJ Terminello, FMF De Groot, ...
Physical Review B 43 (9), 6899, 1991
111 1991 etching of Si(111): The geometric structure of the reaction layerCW Lo, DK Shuh, V Chakarian, TD Durbin, PR Varekamp, JA Yarmoff
Physical Review B 47 (23), 15648, 1993
102 1993 Fundamental studies of halogen reactions with III-V semiconductor surfaces WC Simpson, JA Yarmoff
Annual review of physical chemistry 47 (1), 527-554, 1996
88 1996 Atomic layer epitaxy of silicon by dichlorosilane studied with core level spectroscopy JA Yarmoff, DK Shuh, TD Durbin, CW Lo, DA Lapiano‐Smith, FR McFeely, ...
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 10 (4 …, 1992
84 1992 Formation of a New Ordered Structure of Ca /Si(111) by Ultraviolet Irradiation UO Karlsson, FJ Himpsel, JF Morar, FR McFeely, D Rieger, JA Yarmoff
Physical review letters 57 (10), 1247, 1986
81 1986 Desorption Induced by Electronic Transitions TE Madey, SA Joyce, JA Yarmoff
Chemistry and Physics of Solid Surfaces VIII, 55-68, 1983
79 1983 Surface Termination of Cleaved Investigated by Low Energy Ion Scattering X He, W Zhou, ZY Wang, YN Zhang, J Shi, RQ Wu, JA Yarmoff
Physical Review Letters 110 (15), 156101, 2013
73 2013 Interaction of O2 with the Fe0. 84Cr0. 16 (001) surface studied by photoelectron spectroscopy JR Lince, SV Didziulis, DK Shuh, TD Durbin, JA Yarmoff
Surface Science 277 (1-2), 43-63, 1992
71 1992 Photoemission and absorption spectroscopy of solids and interfaces with synchrotron radiation FJ Himpsel, BS Meyerson, FR McFeely, JF Morar, A Taleb-Ibrahimi, ...
Proceedings of the International School of Physics, Enrico Fermi, Cource …, 1990
68 1990 Oxygen removal from Si via reaction with adsorbed Ge JF Morar, BS Meyerson, UO Karlsson, FJ Himpsel, FR McFeely, D Rieger, ...
Applied physics letters 50 (8), 463-465, 1987
63 1987 Mechanism for chemical‐vapor deposition of tungsten on silicon from tungsten hexafluoride JA Yarmoff, FR McFeely
Journal of applied physics 63 (11), 5213-5219, 1988
58 1988