| Roadmap on ferroelectric hafnia-and zirconia-based materials and devices JPB Silva, R Alcala, UE Avci, N Barrett, L Bégon-Lours, M Borg, S Byun, ... APL Materials 11 (8), 2023 | 75 | 2023 |
| The Electrode‐Ferroelectric interface as the primary constraint on endurance and retention in HZO‐Based ferroelectric capacitors R Alcala, M Materano, PD Lomenzo, P Vishnumurthy, W Hamouda, ... Advanced functional materials 33 (43), 2303261, 2023 | 40 | 2023 |
| Influence of oxygen source on the ferroelectric properties of ALD grown Hf1-xZrxO2 films R Alcala, C Richter, M Materano, PD Lomenzo, C Zhou, JL Jones, ... Journal of Physics D: Applied Physics 54 (3), 035102, 2020 | 34 | 2020 |
| Role of oxygen source on buried interfaces in atomic-layer-deposited ferroelectric hafnia–zirconia thin films HA Hsain, Y Lee, S Lancaster, M Materano, R Alcala, B Xu, T Mikolajick, ... ACS Applied Materials & Interfaces 14 (37), 42232-42244, 2022 | 22 | 2022 |
| Reliability Improvement from La2O3 Interfaces in Hf0.5Zr0.5O2‐Based Ferroelectric Capacitors F Mehmood, R Alcala, P Vishnumurthy, B Xu, R Sachdeva, T Mikolajick, ... Advanced Materials Interfaces 10 (8), 2202151, 2023 | 21 | 2023 |
| An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism L Azevedo Antunes, R Ganser, R Alcala, T Mikolajick, U Schroeder, ... Applied Physics Letters 119 (8), 2021 | 19 | 2021 |
| A Gibbs energy view of double hysteresis in ZrO2 and Si-doped HfO2 PD Lomenzo, M Materano, C Richter, R Alcala, T Mikolajick, U Schroeder Applied Physics Letters 117 (14), 2020 | 19 | 2020 |
| BEOL Integrated Ferroelectric HfO₂-Based Capacitors for FeRAM: Extrapolation of Reliability Performance to Use Conditions R Alcala, M Materano, PD Lomenzo, L Grenouillet, T Francois, J Coignus, ... IEEE Journal of the Electron Devices Society 10, 907-912, 2022 | 18 | 2022 |
| A highly reliable 1.8 V 1 Mb Hf0.5Zr0.5O2-based 1T1C FeRAM Array with 3-D Capacitors J Okuno, T Kunihiro, T Yonai, R Ono, Y Shuto, R Alcala, M Lederer, ... 2023 International Electron Devices Meeting (IEDM), 1-4, 2023 | 13 | 2023 |
| Pyroelectric dependence of atomic layer-deposited Hf0. 5Zr0. 5O2 on film thickness and annealing temperature PD Lomenzo, R Alcala, C Richter, S Li, T Mikolajick, U Schroeder Applied Physics Letters 119 (11), 2021 | 12 | 2021 |
| Investigation of Recovery Phenomena in Hf0.5Zr0.5O2-Based 1T1C FeRAM J Okuno, T Yonai, T Kunihiro, Y Shuto, R Alcala, M Lederer, K Seidel, ... IEEE Journal of the Electron Devices Society 11, 43-46, 2022 | 10 | 2022 |
| The Role of Interface Dynamics on the Reliability Performance of BEOL Integrated Ferroelectric HfO2 Capacitors R Alcala, PD Lomenzo, T Mittmann, B Xu, R Guido, S Lancaster, ... 2022 International Electron Devices Meeting (IEDM), 32.8. 1-32.8. 4, 2022 | 6 | 2022 |
| Influence of Interfacial Oxide Layers in Hf0.5Zr0.5O2 based ferroelectric capacitors on reliability performance R Alcala, F Mehmood, P Vishnumurthy, T Mittmann, T Mikolajick, ... 2022 IEEE International Memory Workshop (IMW), 1-4, 2022 | 5 | 2022 |
| Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition HA Hsain, Y Lee, PD Lomenzo, R Alcala, B Xu, T Mikolajick, U Schroeder, ... Journal of Applied Physics 133 (22), 2023 | 4 | 2023 |
| HZO-based Nonvolatile SRAM Array with 100% Bit Recall Yield and Sufficient Retention Time at 85° C Y Shuto, J Okuno, T Yonai, R Ono, P Reinig, M Lederer, K Seidel, ... 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and …, 2024 | 1 | 2024 |
| Ferroelectric HfO2-based capacitors for FeRAM: Reliability from field cycling endurance to retention P Vishnumurthy, R Alcala, T Mikolajick, U Schroeder, LA Antunes, ... 2024 IEEE International Reliability Physics Symposium (IRPS), 1-10, 2024 | 1 | 2024 |
| Ferroelectric Al0.85Sc0.15N and Hf0.5Zr0.5O2 Domain Switching Dynamics R Guido, X Wang, B Xu, R Alcala, T Mikolajick, U Schroeder, PD Lomenzo ACS Applied Materials & Interfaces 16 (32), 42415-42425, 2024 | | 2024 |
| 2023 Index IEEE Journal of the Electron Devices Society Vol. 11 A Akturk, PA Alba, R Alcala, S An, MG Ancona, MA Baig, M Bance, ... IEEE Journal of the Electron Devices Society 11, 2023 | | 2023 |
| (Invited) Advances in Atomic Layer Processing of Hafnia-Zirconia Ferroelectrics PD Lomenzo, R Alcala, M Materano, C Richter, T Mikolajick, U Schroeder Electrochemical Society Meeting Abstracts 242, 1135-1135, 2022 | | 2022 |
Thomas MikolajickScientific Director, NaMLab GmbH and Professor for Nanoelectronics, TU DresdenПідтверджена електронна адреса в namlab.com