Conductive-filament switching analysis and self-accelerated thermal dissolution model for reset in NiO-based RRAM U Russo, D Ielmini, C Cagli, AL Lacaita, S Spiga, C Wiemer, M Perego, ...
2007 IEEE International Electron Devices Meeting, 775-778, 2007
237 2007 Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism SD Elliott, G Scarel, C Wiemer, M Fanciulli, G Pavia
Chemistry of materials 18 (16), 3764-3773, 2006
233 2006 Atomic-layer deposition of Lu2O3 G Scarel, E Bonera, C Wiemer, G Tallarida, S Spiga, M Fanciulli, ...
Applied physics letters 85 (4), 630-632, 2004
133 2004 Electronic states and mechanical properties in transition metal nitrides F Lévy, P Hones, PE Schmid, R Sanjinés, M Diserens, C Wiemer
Surface and coatings technology 120, 284-290, 1999
130 1999 Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD” E Ahvenniemi, AR Akbashev, S Ali, M Bechelany, M Berdova, S Boyadjiev, ...
Journal of Vacuum Science & Technology A 35 (1), 2017
125 2017 Amorphization dynamics of Ge2Sb2Te5 films upon nano-and femtosecond laser pulse irradiation J Siegel, W Gawelda, D Puerto, C Dorronsoro, J Solis, CN Afonso, ...
Journal of Applied Physics 103 (2), 2008
119 2008 Valence band photoemission study of the Ti Mo N system R Sanjinés, C Wiemer, J Almeida, F Levy
Thin Solid Films 290, 334-338, 1996
111 1996 Thermal characterization of the SiO2-Ge2Sb2Te5 interface from room temperature up to 400 C JL Battaglia, A Kusiak, V Schick, A Cappella, C Wiemer, M Longo, ...
Journal of Applied Physics 107 (4), 2010
109 2010 Combining grazing incidence X-ray diffraction and X-ray reflectivity for the evaluation of the structural evolution of HfO2 thin films with annealing C Wiemer, S Ferrari, M Fanciulli, G Pavia, L Lutterotti
Thin Solid Films 450 (1), 134-137, 2004
92 2004 High Temperature Thermal Conductivity of Amorphous Al2 O3 Thin Films Grown by Low Temperature ALD A Cappella, JL Battaglia, V Schick, A Kusiak, A Lamperti, C Wiemer, ...
Advanced Engineering Materials 15 (11), 1046-1050, 2013
88 2013 Electrical and structural characteristics of yttrium oxide films deposited by rf-magnetron sputtering on EK Evangelou, C Wiemer, M Fanciulli, M Sethu, W Cranton
Journal of Applied Physics 94 (1), 318-325, 2003
84 2003 Reproducibility in X-ray reflectometry: results from the first world-wide round-robin experiment P Colombi, DK Agnihotri, VE Asadchikov, E Bontempi, DK Bowen, ...
Applied Crystallography 41 (1), 143-152, 2008
81 2008 Ru and RuO2 gate electrodes for advanced CMOS technology K Fröhlich, K Husekova, D Machajdik, JC Hooker, N Perez, M Fanciulli, ...
Materials Science and Engineering: B 109 (1-3), 117-121, 2004
77 2004 Thermal and electrical characterization of materials for phase-change memory cells R Fallica, JL Battaglia, S Cocco, C Monguzzi, A Teren, C Wiemer, ...
Journal of Chemical & Engineering Data 54 (6), 1698-1701, 2009
76 2009 Resistance switching in amorphous and crystalline binary oxides grown by electron beam evaporation and atomic layer deposition S Spiga, A Lamperti, C Wiemer, M Perego, E Cianci, G Tallarida, HL Lu, ...
Microelectronic Engineering 85 (12), 2414-2419, 2008
76 2008 Atomic layer deposition of NiO films on Si (100) using cyclopentadienyl-type compounds and ozone as precursors HL Lu, G Scarel, C Wiemer, M Perego, S Spiga, M Fanciulli, G Pavia
Journal of The Electrochemical Society 155 (10), H807, 2008
76 2008 La2Hf2O7 high-κ gate dielectric grown directly on Si (001) by molecular-beam epitaxy A Dimoulas, G Vellianitis, G Mavrou, G Apostolopoulos, A Travlos, ...
Applied physics letters 85 (15), 3205-3207, 2004
70 2004 Hot-wire chemical vapor deposition of chalcogenide materials for phase change memory applications A Abrutis, V Plausinaitiene, M Skapas, C Wiemer, O Salicio, A Pirovano, ...
Chemistry of Materials 20 (11), 3557-3559, 2008
67 2008 Nanoscale morphological and electrical homogeneity of HfO2 and ZrO2 thin films studied by conducting atomic-force microscopy S Kremmer, H Wurmbauer, C Teichert, G Tallarida, S Spiga, C Wiemer, ...
Journal of applied physics 97 (7), 2005
65 2005 Chlorine mobility during annealing in S Ferrari, G Scarel, C Wiemer, M Fanciulli
Journal of applied physics 92 (12), 7675-7677, 2002
65 2002 