| Demonstration of 12 nm resolution Fresnel zone plate lens based soft x-ray microscopy W Chao, J Kim, S Rekawa, P Fischer, EH Anderson Optics Express 17 (20), 17669-17677, 2009 | 338 | 2009 |
| Real space soft x-ray imaging at 10 nm spatial resolution W Chao, P Fischer, T Tyliszczak, S Rekawa, E Anderson, P Naulleau Optics express 20 (9), 9777-9783, 2012 | 284 | 2012 |
| Hartmann wave-front measurement at 13.4 nm with λEUV/120 accuracy P Mercère, P Zeitoun, M Idir, S Le Pape, D Douillet, X Levecq, G Dovillaire, ... Optics letters 28 (17), 1534-1536, 2003 | 129 | 2003 |
| Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic P Naulleau, KA Goldberg, EH Anderson, K Bradley, R Delano, P Denham, ... Emerging Lithographic Technologies VIII 5374, 881-891, 2004 | 117 | 2004 |
| Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography PP Naulleau, KA Goldberg, P Batson, J Bokor, P Denham, S Rekawa Applied Optics 42 (5), 820-826, 2003 | 92 | 2003 |
| Critical challenges for EUV resist materials PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011 | 90 | 2011 |
| Sub-70 nm extreme ultraviolet lithography at the advanced light source static microfield exposure station using the engineering test stand set-2 optic P Naulleau, KA Goldberg, EH Anderson, D Attwood, P Batson, J Bokor, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002 | 64 | 2002 |
| Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic PP Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 63 | 2004 |
| At-wavelength alignment and testing of the 0.3 NA MET optic KA Goldberg, PP Naulleau, PE Denham, SB Rekawa, K Jackson, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004 | 62 | 2004 |
| EUV microexposures at the ALS using the 0.3-NA MET projection optics P Naulleau, KA Goldberg, E Anderson, JP Cain, P Denham, B Hoef, ... Emerging Lithographic Technologies IX 5751, 56-63, 2005 | 59 | 2005 |
| Commissioning an EUV mask microscope for lithography generations reaching 8 nm KA Goldberg, I Mochi, M Benk, AP Allezy, MR Dickinson, CW Cork, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 347-356, 2013 | 56 | 2013 |
| Performance of actinic EUVL mask imaging using a zoneplate microscope KA Goldberg, PP Naulleau, A Barty, SB Rekawa, CD Kemp, RF Gunion, ... Photomask Technology 2007 6730, 1708-1719, 2007 | 45 | 2007 |
| The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch P Naulleau, CN Anderson, LM Baclea-an, D Chan, P Denham, S George, ... Extreme Ultraviolet (EUV) Lithography 7636, 530-538, 2010 | 37 | 2010 |
| EUV interferometric testing and alignment of the 0.3-NA MET optic KA Goldberg, P Naulleau, P Denham, SB Rekawa, K Jackson, JA Liddle, ... Emerging Lithographic Technologies VIII 5374, 64-73, 2004 | 35 | 2004 |
| Actinic extreme ultraviolet mask inspection beyond 0.25 numericalaperture KA Goldberg, P Naulleau, I Mochi, EH Anderson, SB Rekawa, CD Kemp, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2008 | 34 | 2008 |
| At-wavelength detection of extreme ultraviolet lithography mask blank defects S Jeong, M Idir, Y Lin, L Johnson, S Rekawa, M Jones, P Denham, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 30 | 1998 |
| The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6. x-nm C Anderson, D Ashworth, LM Baclea-An, S Bhattari, R Chao, R Claus, ... Extreme Ultraviolet (EUV) Lithography III 8322, 330-336, 2012 | 29 | 2012 |
| An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm KA Goldberg, I Mochi, SB Rekawa, NS Smith, JB Macdougall, ... Extreme Ultraviolet (EUV) Lithography II 7969, 331-342, 2011 | 29 | 2011 |
| Actinic mask imaging: recent results and future directions from the SHARP EUV microscope KA Goldberg, MP Benk, A Wojdyla, I Mochi, SB Rekawa, AP Allezy, ... Extreme Ultraviolet (EUV) Lithography V 9048, 249-258, 2014 | 28 | 2014 |
| Hydrogen silsesquioxane double patterning process for 12nm resolution x-ray zone plates W Chao, J Kim, S Rekawa, P Fischer, E Anderson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 25 | 2009 |
Patrick NaulleauEUV Tech Inc. and Berkeley LabEmail được xác minh tại euvtech.com
