| Expanding plastics recycling technologies: chemical aspects, technology status and challenges H Li, HA Aguirre-Villegas, RD Allen, X Bai, CH Benson, GT Beckham, ... Green Chemistry 24 (23), 8899-9002, 2022 | 362 | 2022 |
| Preparation of high purity, anionic polymerization grade alkyl methacrylate monomers RD Allen, TE Long, JE McGrath Polymer Bulletin 15 (2), 127-134, 1986 | 270 | 1986 |
| Limits to etch resistance for 193-nm single-layer resists RR Kunz, SC Palmateer, AR Forte, RD Allen, GM Wallraff, RA Di Pietro, ... Advances in Resist Technology and Processing XIII 2724, 365-376, 1996 | 173 | 1996 |
| Supercritical CO2 Processing for Submicron Imaging of Fluoropolymers N Sundararajan, S Yang, K Ogino, S Valiyaveettil, Wang, X Zhou, ... Chemistry of materials 12 (1), 41-48, 2000 | 170 | 2000 |
| 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system RD Allen, GM Wallraff, RA Di Pietro, DC Hofer, RR Kunz Advances in Resist Technology and Processing XII 2438, 474-485, 1995 | 128 | 1995 |
| Acid-catalyzed single-layer resists for ArF lithography RR Kunz, RD Allen, WD Hinsberg, GM Wallraff Optical Engineering 32 (10), 2363-2367, 1993 | 128 | 1993 |
| Resolution and etch resistance of a family of 193nm positive resists RD Allen, IY Wan, GM Wallraff, RA DiPietro, DC Hofer, RR Kunz Journal of Photopolymer Science and Technology 8 (4), 623-626, 1995 | 124 | 1995 |
| Bifunctional hydrogel coatings for water purification membranes: improved fouling resistance and antimicrobial activity YH La, BD McCloskey, R Sooriyakumaran, A Vora, B Freeman, M Nassar, ... Journal of Membrane Science 372 (1-2), 285-291, 2011 | 109 | 2011 |
| Process for generating negative tone resist images utilizing carbon dioxide critical fluid RD Allen, GM Wallraff US Patent 5,665,527, 1997 | 109 | 1997 |
| Novel thin film composite membrane containing ionizable hydrophobes: pH-dependent reverse osmosis behavior and improved chlorine resistance YH La, R Sooriyakumaran, DC Miller, M Fujiwara, Y Terui, K Yamanaka, ... Journal of Materials Chemistry 20 (22), 4615-4620, 2010 | 102 | 2010 |
| Thermal probe maskless lithography for 27.5 nm half-pitch Si technology LL Cheong, P Paul, F Holzner, M Despont, DJ Coady, JL Hedrick, R Allen, ... Nano letters 13 (9), 4485-4491, 2013 | 99 | 2013 |
| Photoresists for 193-nm lithography RD Allen, GM Wallraff, DC Hofer, RR Kunz IBM journal of research and development 41 (1.2), 95-104, 1997 | 95 | 1997 |
| Imaging polymers with supercritical carbon dioxide CK Ober, AH Gabor, P Gallagher‐Wetmore, RD Allen Advanced Materials 9 (13), 1039-1043, 1997 | 91 | 1997 |
| High performance acrylic polymers for chemically amplified photoresist applications RD Allen, GM Wallraff, WD Hinsberg, LL Simpson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1991 | 85 | 1991 |
| Polymer design for 157-nm chemically amplified resists H Ito, GM Wallraff, PJ Brock, N Fender, HD Truong, G Breyta, DC Miller, ... Advances in Resist Technology and Processing XVIII 4345, 273-284, 2001 | 84 | 2001 |
| Supercritical fluid processing: a new dry technique for photoresist developing PM Gallagher-Wetmore, GM Wallraff, RD Allen Advances in Resist Technology and Processing XII 2438, 694-708, 1995 | 80 | 1995 |
| Protecting groups for 193-nm photoresists RD Allen, R Sooriyakumaran, J Opitz, GM Wallraff, RA Di Pietro, G Breyta, ... Advances in Resist Technology and Processing XIII 2724, 334-343, 1996 | 77 | 1996 |
| Acid generation and acid diffusion in photoresist films DR McKean, RD Allen, PH Kasai, UP Schaedeli, SA MacDonald Advances in resist technology and processing IX 1672, 94-103, 1992 | 77 | 1992 |
| New single-layer positive photoresists for 193-nm photolithography U Okoroanyanwu, T Shimokawa, JD Byers, DR Medeiros, CG Willson, ... Advances in Resist Technology and Processing XIV 3049, 92-103, 1997 | 72 | 1997 |
| Performance properties of near-monodisperse Novolak resins RD Allen, KR Chen, PM Gallagher-Wetmore Advances in Resist Technology and Processing XII 2438, 250-260, 1995 | 72 | 1995 |
