Theo dõi
giacomo benvenuti
giacomo benvenuti
3D-oxides and ABCD Technology
Email được xác minh tại abcd-technology.com
Tiêu đề
Trích dẫn bởi
Trích dẫn bởi
Năm
Vapor phase deposition system
G Benvenuti, EH Wagner, C Petit
US Patent App. 13/123,225, 2011
3062011
Light induced chemical vapour deposition of titanium oxide thin films at room temperature
E Halary, G Benvenuti, F Wagner, P Hoffmann
Applied Surface Science 154, 146-151, 2000
552000
Crystallinity of titania thin films deposited by light induced chemical vapor deposition
E Halary, E Haro-Poniatowski, G Benvenuti, P Hoffmann
Applied surface science 168 (1-4), 61-65, 2000
372000
High uniformity deposition with chemical beams in high vacuum
G Benvenuti, E Halary-Wagner, A Brioude, P Hoffmann
Thin Solid Films 427 (1-2), 411-416, 2003
312003
Geometry of chemical beam vapor deposition system for efficient combinatorial investigations of thin oxide films: deposited film properties versus precursor flow simulations
E Wagner, CS Sandu, S Harada, C Pellodi, M Jobin, P Muralt, ...
ACS Combinatorial science 18 (3), 154-161, 2016
232016
Combinatorial high-vacuum chemical vapor deposition of textured hafnium-doped lithium niobate thin films on sapphire
A Dabirian, Y Kuzminykh, SC Sandu, S Harada, E Wagner, P Brodard, ...
Crystal growth & design 11 (1), 203-209, 2011
192011
Combinatorial chemical beam epitaxy of lithium niobate thin films on sapphire
A Dabirian, S Harada, Y Kuzminykh, SC Sandu, E Wagner, G Benvenuti, ...
Journal of The Electrochemical Society 158 (2), D72, 2010
192010
Chemical beam vapour deposition technique with Sybilla equipment: Review of main results in its 20-year anniversary
E Wagner, W Maudez, S Bagdzevicius, CS Sandu, G Benvenuti
Oxide-based Materials and Devices XII 11687, 135-154, 2021
172021
Combinatorial discovery and optimization of amorphous HfO2–Nb2O5 mixture with improved transparency
A Dabirian, Y Kuzminykh, B Afra, S Harada, E Wagner, CS Sandu, ...
Electrochemical and Solid-State Letters 13 (7), G60, 2010
172010
Fabrication of complex oxide microstructures by combinatorial chemical beam vapour deposition through stencil masks
E Wagner, CS Sandu, S Harada, G Benvenuti, V Savu, P Muralt
Thin Solid Films 586, 64-69, 2015
162015
Phase transitions in thin titanium oxide films under the action of excimer laser radiation
P Mitrev, G Benvenuti, P Hofman, A Smirnov, N Kaliteevskaya, R Seisyan
Technical physics letters 31, 908-911, 2005
162005
Chemical vapor deposition kinetics and localized growth regimes in combinatorial experiments
A Dabirian, Y Kuzminykh, E Wagner, G Benvenuti, SA Rushworth, ...
ChemPhysChem 12 (18), 3524, 2011
142011
Chemical beam deposition of titanium dioxide thin films
G Benvenuti
Verlag nicht ermittelbar, 2003
132003
Amorphous silicon-doped titania films for on-chip photonics
T Kornher, K Xia, R Kolesov, B Villa, S Lasse, CS Sandu, E Wagner, ...
ACS Photonics 4 (5), 1101-1107, 2017
102017
A combinatorial chemical beam vapour deposition approach to tune the electrical conductivity of Nb: TiO2 films via Si co-doping
CS Sandu, E Wagner, S Harada, G Benvenuti, W Maudez, M Jobin, ...
Thin Solid Films 615, 265-270, 2016
92016
Evaluation of niobium dimethylamino-ethoxide for chemical vapour deposition of niobium oxide thin films
A Dabirian, Y Kuzminykh, E Wagner, G Benvenuti, S Rushworth, ...
Thin Solid Films 571, 94-101, 2014
82014
Efficient Optimization of High‐Quality Epitaxial Lithium Niobate Thin Films by Chemical Beam Vapor Deposition: Impact of Cationic Stoichiometry
AL Pellegrino, E Wagner, F Lo Presti, W Maudez, S Kolb, R Rani, ...
Advanced Materials Interfaces 10 (34), 2300535, 2023
72023
Study of titanium amino-alkoxide derivatives as TiO2 Chemical Beam Vapour Deposition precursor
D Bijou, E Wagner, W Maudez, T Cornier, M Yettou, G Benvenuti, ...
Materials Chemistry and Physics 277, 125561, 2022
72022
Full wafer metrology for chemically graded thin films
M Jobin, S Jotterand, C Pellodi, S dos Santos, CS Sandu, E Wagner, ...
Optical Micro-and Nanometrology IV 8430, 52-62, 2012
72012
Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition
E Halary-Wagner, P Lambelet, G Benvenuti, P Hoffmann
Le Journal de Physique IV 11 (PR3), Pr3-825-Pr3-832, 2001
72001
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