| Mechanism of hydrogen-induced crystallization of amorphous silicon S Sriraman, S Agarwal, ES Aydil, D Maroudas Nature 418 (6893), 62-65, 2002 | 493 | 2002 |
| The 2022 Plasma Roadmap: low temperature plasma science and technology I Adamovich, S Agarwal, E Ahedo, LL Alves, S Baalrud, N Babaeva, ... Journal of Physics D: Applied Physics 55 (37), 373001, 2022 | 353 | 2022 |
| Area-selective deposition of ruthenium by combining atomic layer deposition and selective etching MFJ Vos, SN Chopra, MA Verheijen, JG Ekerdt, S Agarwal, WMM Kessels, ... Chemistry of Materials 31 (11), 3878-3882, 2019 | 117 | 2019 |
| Surface reaction mechanisms during ozone and oxygen plasma assisted atomic layer deposition of aluminum oxide VR Rai, V Vandalon, S Agarwal Langmuir 26 (17), 13732-13735, 2010 | 117 | 2010 |
| Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook RA Ovanesyan, EA Filatova, SD Elliott, DM Hausmann, DC Smith, ... Journal of Vacuum Science & Technology A 37 (6), 2019 | 113 | 2019 |
| Well ordered polymer melts from blends of disordered triblock copolymer surfactants and functional homopolymers VR Tirumala, A Romang, S Agarwal, EK Lin, JJ Watkins Advanced Materials 20 (9), 1603-1608, 2008 | 96 | 2008 |
| Absolute densities of N and excited in a plasma S Agarwal, B Hoex, MCM Van de Sanden, D Maroudas, ES Aydil Applied physics letters 83 (24), 4918-4920, 2003 | 96 | 2003 |
| Effect of silicon oxide thickness on polysilicon based passivated contacts for high-efficiency crystalline silicon solar cells AS Kale, W Nemeth, SP Harvey, M Page, DL Young, S Agarwal, ... Solar Energy Materials and Solar Cells 185, 270-276, 2018 | 93 | 2018 |
| Low-Temperature Conformal Atomic Layer Deposition of SiNx Films Using Si2Cl6 and NH3 Plasma RA Ovanesyan, DM Hausmann, S Agarwal ACS Applied Materials & Interfaces 7 (20), 10806-10813, 2015 | 85 | 2015 |
| Measurement of absolute radical densities in a plasma using modulated-beam line-of-sight threshold ionization mass spectrometry S Agarwal, GWW Quax, MCM Van de Sanden, D Maroudas, ES Aydil Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 22 (1 …, 2004 | 80 | 2004 |
| Surface reaction mechanisms during plasma-assisted atomic layer deposition of titanium dioxide VR Rai, S Agarwal The Journal of Physical Chemistry C 113 (30), 12962-12965, 2009 | 78 | 2009 |
| Influence of surface temperature on the mechanism of atomic layer deposition of aluminum oxide using an oxygen plasma and ozone VR Rai, V Vandalon, S Agarwal Langmuir 28 (1), 350-357, 2012 | 73 | 2012 |
| Tin-catalyzed plasma-assisted growth of silicon nanowires SJ Rathi, BN Jariwala, JD Beach, P Stradins, PC Taylor, X Weng, Y Ke, ... The Journal of Physical Chemistry C 115 (10), 3833-3839, 2011 | 71 | 2011 |
| Surface reaction mechanisms during ozone-based atomic layer deposition of titanium dioxide VR Rai, S Agarwal The Journal of Physical Chemistry C 112 (26), 9552-9554, 2008 | 71 | 2008 |
| In situ gas-phase hydrosilylation of plasma-synthesized silicon nanocrystals BN Jariwala, OS Dewey, P Stradins, CV Ciobanu, S Agarwal ACS applied materials & interfaces 3 (8), 3033-3041, 2011 | 67 | 2011 |
| Threshold ionization mass spectrometry of reactive species in remote Ar∕ C2H2 expanding thermal plasma J Benedikt, S Agarwal, D Eijkman, W Vandamme, M Creatore, ... Journal of Vacuum Science & Technology A 23 (5), 1400-1412, 2005 | 66 | 2005 |
| Understanding the charge transport mechanisms through ultrathin SiOx layers in passivated contacts for high-efficiency silicon solar cells AS Kale, W Nemeth, H Guthrey, E Kennedy, AG Norman, M Page, ... Applied Physics Letters 114 (8), 2019 | 63 | 2019 |
| Mesoporous silica films with long-range order prepared from strongly segregated block copolymer/homopolymer blend templates VR Tirumala, RA Pai, S Agarwal, JJ Testa, G Bhatnagar, AH Romang, ... Chemistry of Materials 19 (24), 5868-5874, 2007 | 63 | 2007 |
| Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching RJ Gasvoda, Z Zhang, S Wang, EA Hudson, S Agarwal Journal of Vacuum Science & Technology A 38 (5), 2020 | 60 | 2020 |
| Mechanism of self-catalytic atomic layer deposition of silicon dioxide using 3-aminopropyl triethoxysilane, water, and ozone VR Rai, S Agarwal Chemistry of Materials 23 (9), 2312-2316, 2011 | 57 | 2011 |
Paul StradinsNational Renewable Energy Laboratory在 nrel.gov 的電子郵件地址已通過驗證