[HTML][HTML] Toward AlGaN channel HEMTs on AlN: Polarization-induced 2DEGs in AlN/AlGaN/AlN heterostructures

J Singhal, R Chaudhuri, A Hickman, V Protasenko… - APL Materials, 2022 - pubs.aip.org
Due to its high breakdown electric field, the ultra-wide bandgap semiconductor AlGaN has
garnered much attention recently as a promising channel material for next-generation high …

First RF power operation of AlN/GaN/AlN HEMTs with> 3 A/mm and 3 W/mm at 10 GHz

A Hickman, R Chaudhuri, L Li, K Nomoto… - IEEE Journal of the …, 2020 - ieeexplore.ieee.org
The AlN/GaN/AlN heterostructure is attractive for microwave and millimeter-wave power
devices due to its thin top barrier, tight carrier confinement, and improved breakdown …

A two-step in situ measurement method for temperature and thermal stress of power device based on a single Raman peak

Y Li, A Fan, X Zhang, X Zhang - International Journal of Heat and Mass …, 2023 - Elsevier
Temperature and thermal stress are primary factors leading to the performance failure of
power devices. Thus, simultaneously determining the temperature and stress variation of the …

AlN/AlGaN/AlN quantum well channel HEMTs

J Singhal, E Kim, A Hickman, R Chaudhuri… - Applied Physics …, 2023 - pubs.aip.org
We present a compositional dependence study of electrical characteristics of Al x Ga 1− x N
quantum well channel-based AlN/AlGaN/AlN high electron mobility transistors (HEMTs) with …

High conductivity coherently strained quantum well XHEMT heterostructures on AlN substrates with delta do**

YH Chen, J Encomendero, C Savant… - Applied Physics …, 2024 - pubs.aip.org
Polarization-induced two-dimensional electron gases (2DEGs) in AlN/GaN/AlN quantum
well high-electron-mobility transistors on ultrawide bandgap AlN substrates offer a promising …

In Situ Crystalline AlN Passivation for Reduced RF Dispersion in Strained‐Channel AlN/GaN/AlN High‐Electron‐Mobility Transistors

R Chaudhuri, A Hickman, J Singhal… - … status solidi (a), 2022 - Wiley Online Library
The recent demonstration of≈ 2 W mm− 1 output power at 94 GHz in AlN/GaN/AlN high‐
electron‐mobility transistors (HEMTs) has established AlN as a promising platform for …

[HTML][HTML] High-density polarization-induced 2D electron gases in N-polar pseudomorphic undoped GaN/Al0. 85Ga0. 15N heterostructures on single-crystal AlN …

Z Zhang, J Encomendero, E Kim, J Singhal… - Applied Physics …, 2022 - pubs.aip.org
The polarization difference and band offset between Al (Ga) N and GaN induce two-
dimensional (2D) free carriers in Al (Ga) N/GaN heterojunctions without any chemical …

Electron mobility enhancement by electric field engineering of AlN/GaN/AlN quantum-well HEMTs on single-crystal AlN substrates

YH Chen, J Encomendero, C Savant… - Applied Physics …, 2024 - pubs.aip.org
To enhance the electron mobility in quantum-well high-electron-mobility transistors (QW
HEMTs), we investigate the transport properties in AlN/GaN/AlN heterostructures on Al-polar …

Improved channel electron mobility through electric field reduction in GaN quantum-well double-heterostructures

J Yaita, K Fukuda, A Yamada, T Iwasaki… - IEEE Electron …, 2021 - ieeexplore.ieee.org
To improve the electron mobility of quantum well (QW) gallium nitride (GaN) high electron
mobility transistors (HEMT), we investigated QW and conventional AlGaN/GaN …

Ab initio investigations of two-dimensional carrier gas at interfaces in GaN/AlN and GaN/AlN/Al2O3 heterostructures

S Zoino, Ł Borowik, B Mohamad, E Nowak… - Journal of Applied …, 2023 - pubs.aip.org
The formation of a two-dimensional electron gas (2DEG) at the GaN (0001)/AlN interface
holds significant implications for GaN-based high-voltage and high-frequency (RF) devices …