Defect-characterized phase transition kinetics

X Zhang, J Zhang, H Wang, J Rogal, HY Li… - Applied physics …, 2022 - pubs.aip.org
Phase transitions are a common phenomenon in condensed matter and act as a critical
degree of freedom that can be employed to tailor the mechanical or electronic properties of …

[HTML][HTML] Electron mean free path in elemental metals

D Gall - Journal of applied physics, 2016 - pubs.aip.org
The electron mean free path λ and carrier relaxation time τ of the twenty most conductive
elemental metals are determined by numerical integration over the Fermi surface obtained …

[HTML][HTML] The search for the most conductive metal for narrow interconnect lines

D Gall - Journal of Applied Physics, 2020 - pubs.aip.org
A major challenge for the continued downscaling of integrated circuits is the resistivity
increase of Cu interconnect lines with decreasing dimensions. Alternative metals have the …

Interface controlled thermal resistances of ultra-thin chalcogenide-based phase change memory devices

K Aryana, JT Gaskins, J Nag, K Medjanik, O Fedchenko, S Chernov, D Kutnyakhov… - Nature Materials, 2017 - nature.com
We performed a full map** of the bulk electronic structure including the Fermi surface and
Fermi-velocity distribution v F (k F) of tungsten. The 4D spectral function ρ (EB; k) in the …

[HTML][HTML] Resistivity size effect in epitaxial Ru (0001) layers

E Milosevic, S Kerdsongpanya, A Zangiabadi… - Journal of Applied …, 2018 - pubs.aip.org
Epitaxial Ru (0001) layers are sputter deposited onto Al 2 O 3 (0001) substrates and their
resistivity ρ measured both in situ and ex situ as a function of thickness d= 5–80 nm in order …

Impedance matched thin metamaterials make metals absorbing

N Mattiucci, MJ Bloemer, N Aközbek, G D'aguanno - Scientific reports, 2013 - nature.com
Metals are generally considered good reflectors over the entire electromagnetic spectrum up
to their plasma frequency. Here we demonstrate an approach to tailor their absorbing …

From solid solutions to fully phase separated interpenetrating networks in sputter deposited “immiscible” W–Cu thin films

FTN Vüllers, R Spolenak - Acta Materialia, 2015 - Elsevier
W–Cu alloys are typically used for heat sinks, radiation shielding or high performance
contact materials. Their immiscibility leads to interpenetrating structures, with typically …

The anisotropic size effect of the electrical resistivity of metal thin films: Tungsten

P Zheng, D Gall - Journal of Applied Physics, 2017 - pubs.aip.org
The resistivity of nanoscale metallic conductors is orientation dependent, even if the bulk
resistivity is isotropic and electron scattering cross-sections are independent of momentum …

Atomic layer etching applications in nano-semiconductor device fabrication

DS Kim, JB Kim, DW Ahn, JH Choe, JS Kim… - Electronic Materials …, 2023 - Springer
These days, the process of plasma etching is exhibited in various forms, including the
reactive ion etching (RIE) method. Not only memory device but also computing element such …