Defect-characterized phase transition kinetics
Phase transitions are a common phenomenon in condensed matter and act as a critical
degree of freedom that can be employed to tailor the mechanical or electronic properties of …
degree of freedom that can be employed to tailor the mechanical or electronic properties of …
[HTML][HTML] Electron mean free path in elemental metals
D Gall - Journal of applied physics, 2016 - pubs.aip.org
The electron mean free path λ and carrier relaxation time τ of the twenty most conductive
elemental metals are determined by numerical integration over the Fermi surface obtained …
elemental metals are determined by numerical integration over the Fermi surface obtained …
[HTML][HTML] The search for the most conductive metal for narrow interconnect lines
D Gall - Journal of Applied Physics, 2020 - pubs.aip.org
A major challenge for the continued downscaling of integrated circuits is the resistivity
increase of Cu interconnect lines with decreasing dimensions. Alternative metals have the …
increase of Cu interconnect lines with decreasing dimensions. Alternative metals have the …
Interface controlled thermal resistances of ultra-thin chalcogenide-based phase change memory devices
K Aryana, JT Gaskins, J Nag, K Medjanik, O Fedchenko, S Chernov, D Kutnyakhov… - Nature Materials, 2017 - nature.com
We performed a full map** of the bulk electronic structure including the Fermi surface and
Fermi-velocity distribution v F (k F) of tungsten. The 4D spectral function ρ (EB; k) in the …
Fermi-velocity distribution v F (k F) of tungsten. The 4D spectral function ρ (EB; k) in the …
[HTML][HTML] Resistivity size effect in epitaxial Ru (0001) layers
Epitaxial Ru (0001) layers are sputter deposited onto Al 2 O 3 (0001) substrates and their
resistivity ρ measured both in situ and ex situ as a function of thickness d= 5–80 nm in order …
resistivity ρ measured both in situ and ex situ as a function of thickness d= 5–80 nm in order …
Impedance matched thin metamaterials make metals absorbing
Metals are generally considered good reflectors over the entire electromagnetic spectrum up
to their plasma frequency. Here we demonstrate an approach to tailor their absorbing …
to their plasma frequency. Here we demonstrate an approach to tailor their absorbing …
From solid solutions to fully phase separated interpenetrating networks in sputter deposited “immiscible” W–Cu thin films
FTN Vüllers, R Spolenak - Acta Materialia, 2015 - Elsevier
W–Cu alloys are typically used for heat sinks, radiation shielding or high performance
contact materials. Their immiscibility leads to interpenetrating structures, with typically …
contact materials. Their immiscibility leads to interpenetrating structures, with typically …
The anisotropic size effect of the electrical resistivity of metal thin films: Tungsten
The resistivity of nanoscale metallic conductors is orientation dependent, even if the bulk
resistivity is isotropic and electron scattering cross-sections are independent of momentum …
resistivity is isotropic and electron scattering cross-sections are independent of momentum …
Atomic layer etching applications in nano-semiconductor device fabrication
DS Kim, JB Kim, DW Ahn, JH Choe, JS Kim… - Electronic Materials …, 2023 - Springer
These days, the process of plasma etching is exhibited in various forms, including the
reactive ion etching (RIE) method. Not only memory device but also computing element such …
reactive ion etching (RIE) method. Not only memory device but also computing element such …