Dramatic Reduction of Silicon Surface Recombination by ALD TiOx Cap** Layer from TiCl4 and H2O: The Role of Chlorine

MM Shehata, DH Macdonald… - ACS Applied Materials & …, 2023 - ACS Publications
Amorphous thin-film TiO x prepared via atomic layer deposition (ALD) has been identified as
one of the most promising materials for use in transparent passivating contacts in high …

Engineering Silicon Interfaces with Transparent AlyTiOx/ZnO/TiO2 Stack Exhibiting Exceptional Passivating Contact Performance

MM Shehata, G Bartholazzi… - Advanced Energy …, 2023 - Wiley Online Library
Passivating contact technologies are essential for fabricating high‐efficiency crystalline
silicon (c‐Si) solar cells, and their application and incorporation into manufacturing lines has …

Process temperature-dependent interface quality and Maxwell–Wagner interfacial polarization in atomic layer deposited Al 2 O 3/TiO 2 nanolaminates for energy …

PS Padhi, RS Ajimsha, SK Rai, UK Goutam, A Bose… - Nanoscale, 2023 - pubs.rsc.org
Considering the excellent tunability of electrical and dielectric properties in binary metal
oxide based multi-layered nanolaminate structures, a thermal atomic layer deposition …

Tailoring crystallisation of anatase TiO2 ultra-thin films grown by atomic layer deposition using 2D oxides as growth template

A Grishin, B Bérini, M Vallet, S Hurand, F Maudet… - Applied Surface …, 2023 - Elsevier
TiO 2 ultrathin films are required in many material research areas. The anatase phase was
found to be more stable in case of atomic layer deposition growth, nevertheless a critical …

Atomic Layer Deposited TiO2 and Al2O3 Thin Films as Coatings for Aluminum Food Packaging Application

V Dias, H Maciel, M Fraga, AO Lobo, R Pessoa… - Materials, 2019 - mdpi.com
Titanium dioxide (TiO2) and aluminum oxide (Al2O3) coatings have been investigated in a
wide range of bio-applications due to their biodegradation and biocompatibility properties …

TiO2 coatings via atomic layer deposition on polyurethane and polydimethylsiloxane substrates: Properties and effects on C. albicans growth and inactivation process

RS Pessoa, VP Dos Santos, SB Cardoso, A Doria… - Applied Surface …, 2017 - Elsevier
Atomic layer deposition (ALD) surges as an attractive technology to deposit thin films on
different substrates for many advanced biomedical applications. Herein titanium dioxide (TiO …

Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times

PS Padhi, RS Ajimsha, SK Rai, S Bhartiya… - Journal of Vacuum …, 2023 - pubs.aip.org
Considering the potential applications of Al 2 O 3/TiO 2 nanolaminates (ATA NLs) in storage
capacitors, device-grade ATA NLs are fabricated using an ALD system, wherein the effect of …

Composition-sensitive growth kinetics and dispersive optical properties of thin HfxTi1−xO2 (0 ≤ x ≤ 1) films prepared by the ALD method

VV Atuchin, MS Lebedev, IV Korolkov… - Journal of Materials …, 2019 - Springer
The optical quality Hf x Ti 1− x O 2 films with a wide range of the Hf/Ti ratio were prepared on
Si (100) substrates by the ALD method with the use of tetrakis (ethylmethylamido) hafnium …

Atomic layer deposition of TiO2 and Al2O3 thin films for the electrochemical study of corrosion protection in aluminum alloy cans used in beverage

VM Dias, W Chiappim, MA Fraga… - Materials Research …, 2020 - iopscience.iop.org
Titanium dioxide (TiO 2) and aluminum oxide (Al 2 O 3) thin films, with thicknesses around
100 nm, were grown on commercial pure-and resin-coated Al substrates using the atomic …

Influence of the Al2O3 partial-monolayer number on the crystallization mechanism of TiO2 in ALD TiO2/Al2O3 nanolaminates and its impact on the material properties

GE Testoni, W Chiappim, RS Pessoa… - Journal of Physics D …, 2016 - iopscience.iop.org
Abstract TiO 2/Al 2 O 3 nanolaminates are being investigated to obtain unique materials with
chemical, physical, optical, electrical and mechanical properties for a broad range of …