[HTML][HTML] Perspectives on oblique angle deposition of thin films: From fundamentals to devices
The oblique angle configuration has emerged as an invaluable tool for the deposition of
nanostructured thin films. This review develops an up to date description of its principles …
nanostructured thin films. This review develops an up to date description of its principles …
Research progress in rare earth-doped perovskite manganite oxide nanostructures
W **a, Z Pei, K Leng, X Zhu - Nanoscale Research Letters, 2020 - Springer
Perovskite manganites exhibit a broad range of structural, electronic, and magnetic
properties, which are widely investigated since the discovery of the colossal …
properties, which are widely investigated since the discovery of the colossal …
Assembling the puzzle of superconducting elements: a review
C Buzea, K Robbie - Superconductor Science and Technology, 2004 - iopscience.iop.org
Superconductivity in the simple elements is of both technological relevance and
fundamental scientific interest in the investigation of superconductivity phenomena. Recent …
fundamental scientific interest in the investigation of superconductivity phenomena. Recent …
Thin-film growth dynamics with shadowing and re-emission effects
T Karabacak - Journal of Nanophotonics, 2011 - spiedigitallibrary.org
Growth dynamics of thin-films involves both shadowing and re-emission effects. Shadowing
can originate from obliquely incident atoms being preferentially deposited on hills of the …
can originate from obliquely incident atoms being preferentially deposited on hills of the …
Glancing angle deposition
MT Taschuk, MM Hawkeye, MJ Brett - Handbook of deposition technologies …, 2010 - Elsevier
Publisher Summary This chapter focuses on experimental aspects of the Glancing angle
deposition (GLAD) technique–its methods and possibilities. It introduces the basic theory …
deposition (GLAD) technique–its methods and possibilities. It introduces the basic theory …
Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films
Sputter-deposited W films with nominal thicknesses between 5 and 180 nm were prepared
by varying the base pressure prior to film deposition and by including or not including …
by varying the base pressure prior to film deposition and by including or not including …
[КНИГА][B] Sputtering materials for VLSI and thin film devices
J Sarkar - 2010 - books.google.com
An important resource for students, engineers and researchers working in the area of thin
film deposition using physical vapor deposition (eg sputtering) for semiconductor, liquid …
film deposition using physical vapor deposition (eg sputtering) for semiconductor, liquid …
Glad Pt–Ni alloy nanorods for oxygen reduction reaction
Vertically aligned platinum–nickel (Pt–Ni) alloy nanorod arrays were grown on glassy
carbon electrodes using a magnetron sputtering glancing angle deposition (GLAD) …
carbon electrodes using a magnetron sputtering glancing angle deposition (GLAD) …
Nanostructured tungsten and tungsten trioxide films prepared by glancing angle deposition
D Deniz, DJ Frankel, RJ Lad - Thin Solid Films, 2010 - Elsevier
Nanostructured tungsten (W) and tungsten trioxide (WO3) films were prepared by glancing
angle deposition using pulsed direct current magnetron sputtering at room temperature with …
angle deposition using pulsed direct current magnetron sputtering at room temperature with …
Enhanced step coverage by oblique angle physical vapor deposition
We present the use of an oblique angle physical vapor deposition (OAPVD) technique with
substrate rotation to obtain conformal thin films with enhanced step coverage on patterned …
substrate rotation to obtain conformal thin films with enhanced step coverage on patterned …