Computing the properties of materials from first principles with SIESTA

N Kaltsoyannis, JE McGrady, D Sánchez-Portal… - … and applications of …, 2004 - Springer
SIESTA was developed as an approach to compute the electronic properties and perform
atomistic simulations of complex materials from first principles. Very large systems, with an …

Modeling of defect generation during plasma etching and its impact on electronic device performance—plasma-induced damage

K Eriguchi - Journal of Physics D: Applied Physics, 2017 - iopscience.iop.org
The increasing demand for the higher performance of ultra-large-scale integration (ULSI)
circuits requires the aggressive shrinkage of device feature sizes in accordance with the …

Stability of defects in crystalline silicon and their role in amorphization

LA Marqués, L Pelaz, J Hernández, J Barbolla… - Physical Review B, 2001 - APS
Using molecular-dynamics simulation techniques, we have investigated the role that point
defects and interstitial-vacancy complexes have on the silicon amorphization process. We …

Defect generation in electronic devices under plasma exposure: Plasma-induced damage

K Eriguchi - Japanese Journal of Applied Physics, 2017 - iopscience.iop.org
The increasing demand for higher performance of ULSI circuits requires aggressive
shrinkage of device feature sizes in accordance with Moore's law. Plasma processing plays …

Radiation damage in silicon exposed to high-energy protons

G Davies, S Hayama, L Murin, R Krause-Rehberg… - Physical Review B …, 2006 - APS
Photoluminescence, infrared absorption, positron annihilation, and deep-level transient
spectroscopy (DLTS) have been used to investigate the radiation damage produced by 24 …

Photoluminescence signature of silicon interstitial cluster evolution from compact to extended structures in ion-implanted silicon

PK Giri - Semiconductor science and technology, 2005 - iopscience.iop.org
Low temperature photoluminescence (PL) studies have been carried out on ion-implanted
silicon in order to elucidate upon the structure evolution of the self-interstitial (I) clusters as a …

Density-functional study of small interstitial clusters in Si: Comparison with experiments

A Carvalho, R Jones, J Coutinho, PR Briddon - Physical Review B …, 2005 - APS
Local density functional calculations are carried out on models of tri-and tetra-self-interstitial
clusters in Si. Electrical levels and local vibrational modes (LVMs) of the defects are found …

Complexity of small silicon self-interstitial defects

DA Richie, J Kim, SA Barr, KRA Hazzard, R Hennig… - Physical review …, 2004 - APS
The combination of long-time, tight-binding molecular dynamics and real-time
multiresolution analysis techniques reveals the complexity of small silicon interstitial defects …

Iron in silicon: Interactions with radiation defects, carbon, and oxygen

SK Estreicher, M Sanati, N Gonzalez Szwacki - Physical Review B …, 2008 - APS
First-principles theory is used to calculate the interactions between interstitial iron or the iron-
boron pair and a vacancy, between interstitial iron and a divacancy, oxygen-vacancy pair …

[КНИГА][B] Silicon, germanium, and their alloys: growth, defects, impurities, and nanocrystals

G Kissinger, S Pizzini - 2014 - books.google.com
Despite the vast knowledge accumulated on silicon, germanium, and their alloys, these
materials still demand research, eminently in view of the improvement of knowledge on …