New generation electron beam resists: a review
The semiconductor industry has already entered the sub-10 nm region, which has led to the
development of cutting-edge fabrication tools. However, there are other factors that hinder …
development of cutting-edge fabrication tools. However, there are other factors that hinder …
Organotin in nonchemically amplified polymeric hybrid resist imparts better resolution with sensitivity for next-generation lithography
Given the need for a next-generation technology node in the area of integrated circuits (ICs),
improvement in the properties of resist materials, particularly sensitivity (ED), resolution …
improvement in the properties of resist materials, particularly sensitivity (ED), resolution …
Fabricating a high-resolution mask with improved line-edge roughness by using a nonchemically amplified resist and a postexposure bake
H Miyoshi, J Taniguchi - Journal of Vacuum Science & Technology B, 2015 - pubs.aip.org
The authors have developed a high-resolution technique for fabricating photomasks at the
10-nm half-pitch logic nodes and beyond. Current mask-manufacturing techniques use a …
10-nm half-pitch logic nodes and beyond. Current mask-manufacturing techniques use a …
7.4 nm linewidth Pt nanowires by electron-beam lithography using non-chemically amplified positive-tone resist and post-exposure bake
4 nm linewidth Pt nanowires were demonstrated on SiO 2/Si substrates via electron-beam
lithography using a non-chemically amplified positive resist ZEP520A and post-exposure …
lithography using a non-chemically amplified positive resist ZEP520A and post-exposure …
Characterization for the photomask fabrication based on a high-resolution technique with a non-chemically amplified resist and a post-exposure bake
H Miyoshi, J Taniguchi - Microelectronic Engineering, 2016 - Elsevier
A high-resolution technique has been developed for the fabrication of photomasks for 10 nm
logic nodes and beyond. Current mask manufacturing techniques use a chemically …
logic nodes and beyond. Current mask manufacturing techniques use a chemically …
[PDF][PDF] Oxidation lithography in transition metal dichalcogenides towards scalable quantum emitters
PWH Wevers - pure.tue.nl
The advent of two-dimensional (2D) materials has brought with it a vast library of new
metals, insulators and semiconductors with unique physical properties. Transition metal …
metals, insulators and semiconductors with unique physical properties. Transition metal …
[PDF][PDF] 電子線リソグラフィを用いた半導体フォトマスクの超解像技術に関する研究
三好秀龍 - 2017 - tus.repo.nii.ac.jp
学位申請論文 電子線リソグラフィを用いた半導体 フォトマスクの超解像技術に関する研究 ** Page
1 学位申請論文 電子線リソグラフィを用いた半導体 フォトマスクの超解像技術に関する研究 **成 …
1 学位申請論文 電子線リソグラフィを用いた半導体 フォトマスクの超解像技術に関する研究 **成 …