[HTML][HTML] Resistivity scaling of porous MoP narrow lines

H Wang, G **, QP Sam, SD Funni, RR Panepucci… - APL Materials, 2024 - pubs.aip.org
The resistivity scaling of copper (Cu) interconnects with decreasing dimensions remains a
major challenge in the downscaling of integrated circuits. Molybdenum phosphide (MoP) is …